JP4547445B2 - 液体処理装置 - Google Patents

液体処理装置 Download PDF

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Publication number
JP4547445B2
JP4547445B2 JP2008174078A JP2008174078A JP4547445B2 JP 4547445 B2 JP4547445 B2 JP 4547445B2 JP 2008174078 A JP2008174078 A JP 2008174078A JP 2008174078 A JP2008174078 A JP 2008174078A JP 4547445 B2 JP4547445 B2 JP 4547445B2
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gas
water
pump
mixer
pressure
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JP2008174078A
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Japanese (ja)
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JP2010012399A (ja
Inventor
政隆 日高
みさき 隅倉
一郎 山野井
直樹 原
秀之 田所
義弘 信友
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP2008174078A priority Critical patent/JP4547445B2/ja
Priority to CN200910142592XA priority patent/CN101618296B/zh
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  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP2008174078A 2008-07-03 2008-07-03 液体処理装置 Active JP4547445B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008174078A JP4547445B2 (ja) 2008-07-03 2008-07-03 液体処理装置
CN200910142592XA CN101618296B (zh) 2008-07-03 2009-07-03 液体处理装置

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JP2008174078A JP4547445B2 (ja) 2008-07-03 2008-07-03 液体処理装置

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JP2010012399A JP2010012399A (ja) 2010-01-21
JP4547445B2 true JP4547445B2 (ja) 2010-09-22

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JP (1) JP4547445B2 (zh)
CN (1) CN101618296B (zh)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5737551B2 (ja) * 2009-08-07 2015-06-17 清水建設株式会社 汚染土壌または地下水の浄化方法および装置
JP5228011B2 (ja) * 2010-09-06 2013-07-03 株式会社日立製作所 水処理装置
DE102011017739A1 (de) * 2011-04-28 2012-10-31 Uwe Würdig Verfahren und Vorrichtung zur Anreicherung einer Flüssigkeit mit Gas
JP5762210B2 (ja) * 2011-08-11 2015-08-12 Idec株式会社 気体溶解装置および微細気泡生成装置
JP5575720B2 (ja) * 2011-09-19 2014-08-20 株式会社日立製作所 液体処理装置
JP6243778B2 (ja) * 2014-03-28 2017-12-06 三相電機株式会社 微細気泡発生装置
CN104888636A (zh) * 2015-05-28 2015-09-09 中国石油化工股份有限公司 微纳米气泡发生装置和污水净化系统
CN108314169A (zh) * 2017-05-18 2018-07-24 崔真豪 微细气泡水生成装置控制系统
TWI648098B (zh) * 2017-11-14 2019-01-21 亞智科技股份有限公司 氣液混合機構、製程設備及氣液混合方法
KR102559147B1 (ko) * 2018-05-30 2023-07-24 가부시키가이샤 아쿠아솔루션 액체 공급 설비
BR112020023543A2 (pt) * 2018-05-30 2021-02-09 Aquasolution Corporation dispositivo de geração de bolhas ultrafinas
CN109046056B (zh) * 2018-08-23 2024-02-27 芜湖美的厨卫电器制造有限公司 微气泡装置及热水器
CN110963557B (zh) * 2018-09-28 2023-12-12 中国石油化工股份有限公司 一种含盐废水处理系统以及处理方法
CN109382011A (zh) * 2018-11-29 2019-02-26 深圳康诚博信科技有限公司 高效气水混溶装置及其气水混溶方法
CN111302453A (zh) * 2018-12-12 2020-06-19 四季洋圃生物机电股份有限公司 电解氢氧超微细气泡装置
CN113365721B (zh) * 2018-12-25 2023-05-12 株式会社御池铁工所 超微气泡制造器和超微气泡水制造装置
JP7365617B2 (ja) * 2019-03-27 2023-10-20 パナソニックＩｐマネジメント株式会社 イオン除去システム
CN110479125B (zh) * 2019-09-03 2022-05-10 梁荷 一种超压曝气装置及用途
CN110776158A (zh) * 2019-12-02 2020-02-11 杭州老板电器股份有限公司 净水装置及其使用方法
CN110773013A (zh) * 2019-12-02 2020-02-11 杭州老板电器股份有限公司 微纳米气泡制备装置及其制备方法
CN110773012A (zh) * 2019-12-02 2020-02-11 杭州老板电器股份有限公司 微纳米气泡制备装置及其制备方法
CN111151206B (zh) * 2019-12-31 2022-06-17 苏州市奥普斯等离子体科技有限公司 一种处理液体的等离子体装置
CN114904412B (zh) * 2021-02-07 2024-03-22 佛山市顺德区美的洗涤电器制造有限公司 一种微气泡产生装置及烟机
KR102564803B1 (ko) * 2021-05-20 2023-08-07 홍승훈 가스 용해 시스템

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51754A (ja) * 1974-06-24 1976-01-06 Mitsubishi Electric Corp Ozonmizushorisochi
JPH11285691A (ja) * 1998-04-02 1999-10-19 Eiwa Chosa Sekkei Kk 排水処理装置
JP2004188246A (ja) * 2002-12-06 2004-07-08 Toshiba Plant Systems & Services Corp オゾン水製造システム
JP2006272232A (ja) * 2005-03-30 2006-10-12 Hitachi Ltd 超微細気泡の生成方法、生成装置及びそれを利用した殺菌・消毒設備
JP2007021392A (ja) * 2005-07-19 2007-02-01 Hitachi Ltd 微細気泡生成装置及びその方法
JP2008036481A (ja) * 2006-08-02 2008-02-21 Osaka Gas Co Ltd 微細気泡発生装置
JP2008114214A (ja) * 2006-10-12 2008-05-22 Matsushita Electric Works Ltd 洗浄装置
JP2008155156A (ja) * 2006-12-26 2008-07-10 Hitachi Ltd 液体処理方法および装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51754A (ja) * 1974-06-24 1976-01-06 Mitsubishi Electric Corp Ozonmizushorisochi
JPH11285691A (ja) * 1998-04-02 1999-10-19 Eiwa Chosa Sekkei Kk 排水処理装置
JP2004188246A (ja) * 2002-12-06 2004-07-08 Toshiba Plant Systems & Services Corp オゾン水製造システム
JP2006272232A (ja) * 2005-03-30 2006-10-12 Hitachi Ltd 超微細気泡の生成方法、生成装置及びそれを利用した殺菌・消毒設備
JP2007021392A (ja) * 2005-07-19 2007-02-01 Hitachi Ltd 微細気泡生成装置及びその方法
JP2008036481A (ja) * 2006-08-02 2008-02-21 Osaka Gas Co Ltd 微細気泡発生装置
JP2008114214A (ja) * 2006-10-12 2008-05-22 Matsushita Electric Works Ltd 洗浄装置
JP2008155156A (ja) * 2006-12-26 2008-07-10 Hitachi Ltd 液体処理方法および装置

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CN101618296A (zh) 2010-01-06
JP2010012399A (ja) 2010-01-21
CN101618296B (zh) 2012-04-25

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