JP4543069B2 - マスクレス露光装置 - Google Patents
マスクレス露光装置 Download PDFInfo
- Publication number
- JP4543069B2 JP4543069B2 JP2007249885A JP2007249885A JP4543069B2 JP 4543069 B2 JP4543069 B2 JP 4543069B2 JP 2007249885 A JP2007249885 A JP 2007249885A JP 2007249885 A JP2007249885 A JP 2007249885A JP 4543069 B2 JP4543069 B2 JP 4543069B2
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- exposure
- substrate
- wedge glass
- optical axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims description 56
- 239000011521 glass Substances 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000005286 illumination Methods 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 13
- 241000023320 Luma <angiosperm> Species 0.000 claims 1
- OSWPMRLSEDHDFF-UHFFFAOYSA-N methyl salicylate Chemical compound COC(=O)C1=CC=CC=C1O OSWPMRLSEDHDFF-UHFFFAOYSA-N 0.000 claims 1
- 238000003384 imaging method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007249885A JP4543069B2 (ja) | 2007-09-26 | 2007-09-26 | マスクレス露光装置 |
TW097128953A TWI443473B (zh) | 2007-09-26 | 2008-07-31 | No mask exposure device |
KR1020080078837A KR101516607B1 (ko) | 2007-09-26 | 2008-08-12 | 마스크레스 노광 장치 |
CN2008101449489A CN101398631B (zh) | 2007-09-26 | 2008-08-13 | 无掩模曝光装置 |
DE102008038443.7A DE102008038443B4 (de) | 2007-09-26 | 2008-08-20 | Maskenloser Belichtungsapparat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007249885A JP4543069B2 (ja) | 2007-09-26 | 2007-09-26 | マスクレス露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009080324A JP2009080324A (ja) | 2009-04-16 |
JP4543069B2 true JP4543069B2 (ja) | 2010-09-15 |
Family
ID=40384579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007249885A Active JP4543069B2 (ja) | 2007-09-26 | 2007-09-26 | マスクレス露光装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4543069B2 (ko) |
KR (1) | KR101516607B1 (ko) |
CN (1) | CN101398631B (ko) |
DE (1) | DE102008038443B4 (ko) |
TW (1) | TWI443473B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5354803B2 (ja) * | 2010-06-28 | 2013-11-27 | 株式会社ブイ・テクノロジー | 露光装置 |
CN105549337A (zh) * | 2016-02-03 | 2016-05-04 | 京东方科技集团股份有限公司 | 一种光刻装置及光刻方法、显示基板的制作方法 |
KR102197572B1 (ko) * | 2016-07-13 | 2020-12-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 조명 소스로서의 마이크로 led 어레이 |
JP2019045836A (ja) * | 2017-09-01 | 2019-03-22 | 株式会社アドテックエンジニアリング | 直接描画露光装置 |
KR20190054815A (ko) | 2017-11-14 | 2019-05-22 | 삼성전자주식회사 | 마스크리스 노광 방법, 마스크리스 노광 장치 및 이를 이용한 반도체 장치의 제조 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004163798A (ja) * | 2002-11-15 | 2004-06-10 | Fuji Photo Film Co Ltd | 露光装置 |
JP2005266779A (ja) * | 2004-02-18 | 2005-09-29 | Fuji Photo Film Co Ltd | 露光装置及び方法 |
JP2006030791A (ja) * | 2004-07-20 | 2006-02-02 | Fuji Photo Film Co Ltd | 光学装置 |
JP2007025005A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | セル内構造の製造方法及びセル内構造並びに表示装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3139023B2 (ja) * | 1991-01-30 | 2001-02-26 | 株式会社日立製作所 | 電子線装置及び電子線装置の焦点調整方法 |
US5209813A (en) | 1990-10-24 | 1993-05-11 | Hitachi, Ltd. | Lithographic apparatus and method |
JP4546019B2 (ja) | 2002-07-03 | 2010-09-15 | 株式会社日立製作所 | 露光装置 |
JP4244156B2 (ja) | 2003-05-07 | 2009-03-25 | 富士フイルム株式会社 | 投影露光装置 |
US7061591B2 (en) * | 2003-05-30 | 2006-06-13 | Asml Holding N.V. | Maskless lithography systems and methods utilizing spatial light modulator arrays |
US7197828B2 (en) | 2005-05-31 | 2007-04-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing FPD chuck Z position measurement |
-
2007
- 2007-09-26 JP JP2007249885A patent/JP4543069B2/ja active Active
-
2008
- 2008-07-31 TW TW097128953A patent/TWI443473B/zh active
- 2008-08-12 KR KR1020080078837A patent/KR101516607B1/ko active IP Right Grant
- 2008-08-13 CN CN2008101449489A patent/CN101398631B/zh active Active
- 2008-08-20 DE DE102008038443.7A patent/DE102008038443B4/de active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004163798A (ja) * | 2002-11-15 | 2004-06-10 | Fuji Photo Film Co Ltd | 露光装置 |
JP2005266779A (ja) * | 2004-02-18 | 2005-09-29 | Fuji Photo Film Co Ltd | 露光装置及び方法 |
JP2006030791A (ja) * | 2004-07-20 | 2006-02-02 | Fuji Photo Film Co Ltd | 光学装置 |
JP2007025005A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | セル内構造の製造方法及びセル内構造並びに表示装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101398631B (zh) | 2012-09-26 |
TW200915016A (en) | 2009-04-01 |
TWI443473B (zh) | 2014-07-01 |
DE102008038443B4 (de) | 2023-07-27 |
KR101516607B1 (ko) | 2015-04-30 |
JP2009080324A (ja) | 2009-04-16 |
KR20090031977A (ko) | 2009-03-31 |
DE102008038443A1 (de) | 2009-04-02 |
CN101398631A (zh) | 2009-04-01 |
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