JP4532640B2 - 位置検出装置及びそれを用いた露光装置 - Google Patents

位置検出装置及びそれを用いた露光装置 Download PDF

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Publication number
JP4532640B2
JP4532640B2 JP2000005350A JP2000005350A JP4532640B2 JP 4532640 B2 JP4532640 B2 JP 4532640B2 JP 2000005350 A JP2000005350 A JP 2000005350A JP 2000005350 A JP2000005350 A JP 2000005350A JP 4532640 B2 JP4532640 B2 JP 4532640B2
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Japan
Prior art keywords
image
mark
position detection
edge
unit
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Expired - Fee Related
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JP2000005350A
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Japanese (ja)
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JP2001195583A (ja
JP2001195583A5 (enExample
Inventor
正基 小林
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Canon Inc
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Canon Inc
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Priority to JP2000005350A priority Critical patent/JP4532640B2/ja
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Publication of JP2001195583A5 publication Critical patent/JP2001195583A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Image Analysis (AREA)
JP2000005350A 2000-01-14 2000-01-14 位置検出装置及びそれを用いた露光装置 Expired - Fee Related JP4532640B2 (ja)

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JP2000005350A JP4532640B2 (ja) 2000-01-14 2000-01-14 位置検出装置及びそれを用いた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000005350A JP4532640B2 (ja) 2000-01-14 2000-01-14 位置検出装置及びそれを用いた露光装置

Publications (3)

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JP2001195583A JP2001195583A (ja) 2001-07-19
JP2001195583A5 JP2001195583A5 (enExample) 2007-03-08
JP4532640B2 true JP4532640B2 (ja) 2010-08-25

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JP2000005350A Expired - Fee Related JP4532640B2 (ja) 2000-01-14 2000-01-14 位置検出装置及びそれを用いた露光装置

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100479305B1 (ko) * 2002-08-20 2005-03-25 삼성전자주식회사 얼라인 마크 패턴인식방법
JP2005116626A (ja) 2003-10-03 2005-04-28 Canon Inc 位置検出装置及び位置検出方法、並びに露光装置
NL1036559A1 (nl) * 2008-03-12 2009-09-15 Asml Netherlands Bv Lithographic Apparatus and Method.
JP5895276B2 (ja) * 2011-11-02 2016-03-30 株式会社ブイ・テクノロジー アライメントマーク及び露光装置
JP5948102B2 (ja) * 2012-03-26 2016-07-06 株式会社Ｓｃｒｅｅｎホールディングス 転写装置および転写方法
JP7562999B2 (ja) * 2020-06-22 2024-10-08 オムロン株式会社 動体検出装置および動体検出方法
JP7587359B2 (ja) * 2020-06-23 2024-11-20 キヤノン株式会社 位置合わせ装置、マークの位置を求める方法、プログラム、リソグラフィ装置、および物品製造方法
CN114359378B (zh) * 2021-12-31 2024-11-15 四川省自贡运输机械集团股份有限公司 一种带式输送机巡检机器人定位方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623999B2 (ja) * 1986-07-28 1994-03-30 株式会社日立製作所 パタ−ン欠陥検出方法
JPS6354680A (ja) * 1986-08-26 1988-03-09 Canon Inc 位置検出装置
JPS63192179A (ja) * 1987-02-04 1988-08-09 Mitsubishi Electric Corp マ−ク読取装置
JPH01128523A (ja) * 1987-11-13 1989-05-22 Hitachi Ltd 位置検出装置
JP2986824B2 (ja) * 1990-01-12 1999-12-06 株式会社日立製作所 回路パターン欠陥検出方法及びその装置
JP3187827B2 (ja) * 1989-12-20 2001-07-16 株式会社日立製作所 パターン検査方法および装置
JP3198105B2 (ja) * 1990-08-29 2001-08-13 株式会社日立製作所 自動外観検査装置
JPH0512441A (ja) * 1991-05-30 1993-01-22 Omron Corp エツジ画像生成装置
JP3223384B2 (ja) * 1992-06-19 2001-10-29 オムロン株式会社 濃淡画像のパターンマッチング装置
JP3223385B2 (ja) * 1992-06-22 2001-10-29 オムロン株式会社 濃淡画像のパターンマッチング装置
JPH06151274A (ja) * 1992-11-11 1994-05-31 Hitachi Ltd 半導体集積回路パターンの位置合わせ方法および装置
JPH06259561A (ja) * 1993-03-08 1994-09-16 Mitsubishi Electric Corp 動画像中の視標速度計算装置および視標追従装置
US5990540A (en) * 1997-12-15 1999-11-23 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing the same

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Publication number Publication date
JP2001195583A (ja) 2001-07-19

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