JP4529236B2 - 基板依存性改善剤 - Google Patents

基板依存性改善剤 Download PDF

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Publication number
JP4529236B2
JP4529236B2 JP2000161501A JP2000161501A JP4529236B2 JP 4529236 B2 JP4529236 B2 JP 4529236B2 JP 2000161501 A JP2000161501 A JP 2000161501A JP 2000161501 A JP2000161501 A JP 2000161501A JP 4529236 B2 JP4529236 B2 JP 4529236B2
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Japan
Prior art keywords
group
substrate
acid
methyl
compound
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Expired - Fee Related
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JP2000161501A
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English (en)
Japanese (ja)
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JP2001174982A5 (enExample
JP2001174982A (ja
Inventor
文良 浦野
直樹 片野
知子 桐生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Fujifilm Wako Pure Chemical Corp
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Application filed by Wako Pure Chemical Industries Ltd, Fujifilm Wako Pure Chemical Corp filed Critical Wako Pure Chemical Industries Ltd
Priority to JP2000161501A priority Critical patent/JP4529236B2/ja
Publication of JP2001174982A publication Critical patent/JP2001174982A/ja
Publication of JP2001174982A5 publication Critical patent/JP2001174982A5/ja
Application granted granted Critical
Publication of JP4529236B2 publication Critical patent/JP4529236B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2000161501A 1999-06-10 2000-05-31 基板依存性改善剤 Expired - Fee Related JP4529236B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000161501A JP4529236B2 (ja) 1999-06-10 2000-05-31 基板依存性改善剤

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP16319199 1999-06-10
JP11-285662 1999-10-06
JP11-163191 1999-10-06
JP28566299 1999-10-06
JP2000161501A JP4529236B2 (ja) 1999-06-10 2000-05-31 基板依存性改善剤

Publications (3)

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JP2001174982A JP2001174982A (ja) 2001-06-29
JP2001174982A5 JP2001174982A5 (enExample) 2007-06-28
JP4529236B2 true JP4529236B2 (ja) 2010-08-25

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Family Applications (1)

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JP2000161501A Expired - Fee Related JP4529236B2 (ja) 1999-06-10 2000-05-31 基板依存性改善剤

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JP (1) JP4529236B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4789599B2 (ja) * 2004-12-06 2011-10-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトレジスト組成物
JP5047030B2 (ja) 2008-03-26 2012-10-10 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP7507048B2 (ja) * 2020-09-17 2024-06-27 旭化成株式会社 ネガ型感光性樹脂組成物、硬化膜および化合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3271393B2 (ja) * 1993-09-16 2002-04-02 ジェイエスアール株式会社 感放射線性樹脂組成物
JP3360267B2 (ja) * 1996-04-24 2002-12-24 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
JP3944979B2 (ja) * 1997-11-14 2007-07-18 Ｊｓｒ株式会社 感放射線性樹脂組成物

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JP2001174982A (ja) 2001-06-29

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