JP4513425B2 - 亜鉛系めっき鋼板のプレス成形性評価方法 - Google Patents
亜鉛系めっき鋼板のプレス成形性評価方法 Download PDFInfo
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- JP4513425B2 JP4513425B2 JP2004170756A JP2004170756A JP4513425B2 JP 4513425 B2 JP4513425 B2 JP 4513425B2 JP 2004170756 A JP2004170756 A JP 2004170756A JP 2004170756 A JP2004170756 A JP 2004170756A JP 4513425 B2 JP4513425 B2 JP 4513425B2
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- 229910001335 Galvanized steel Inorganic materials 0.000 title claims description 23
- 239000008397 galvanized steel Substances 0.000 title claims description 23
- 238000011156 evaluation Methods 0.000 title description 15
- 229910000831 Steel Inorganic materials 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 37
- 239000010959 steel Substances 0.000 claims description 37
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- 229910052760 oxygen Inorganic materials 0.000 claims description 36
- 239000001301 oxygen Substances 0.000 claims description 36
- 239000011701 zinc Substances 0.000 claims description 33
- 229910052725 zinc Inorganic materials 0.000 claims description 33
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 32
- 238000005259 measurement Methods 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 12
- 239000002344 surface layer Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 9
- 238000011088 calibration curve Methods 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 4
- 238000012854 evaluation process Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 90
- 239000013078 crystal Substances 0.000 description 23
- 238000012360 testing method Methods 0.000 description 14
- 238000007747 plating Methods 0.000 description 13
- 238000004458 analytical method Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 8
- 230000003595 spectral effect Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 238000003825 pressing Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000002083 X-ray spectrum Methods 0.000 description 5
- 239000011324 bead Substances 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000001050 lubricating effect Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 238000005211 surface analysis Methods 0.000 description 3
- 238000004876 x-ray fluorescence Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000012951 Remeasurement Methods 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012417 linear regression Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- Analysing Materials By The Use Of Radiation (AREA)
- Coating With Molten Metal (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Description
(1)オージェ電子分光法やX線光電子分光法などの表面分析手法とイオンエッチングを組み合わせて深さ方向の情報を測定する方法
(2)断面試料を作製して膜厚方向から透過電子顕微鏡で観察する方法
(3)光の薄膜中での干渉効果を利用するエリプソなどの光学的手法
以下に先行技術文献情報について記載する。なお、非特許文献1については説明の都合上、発明を実施するための最良の形態の項で説明する。
前記照射工程で励起・放出された蛍光X線を酸素のKα線の一次回折線と亜鉛のLβ線の二次回折線の回折角度差が2度以上となるTAPにより分光する分光工程と、
前記分光工程で分光された主に酸素のKα線を含むX線を検出器で検出する検出工程と、
波高分析器のウィンドウ幅を調整して前記検出工程で検出した主に酸素のKα線の一次回折線を含むX線の中からエネルギーレベルが、酸素のKα線の一次回折線のエネルギーレベルを基準100%として、それに対して±25%〜±75%の範囲内にあるX線を分離する分離工程と、
前記分離工程で分離されたX線の強度を測定する測定工程と、
前記測定工程で測定したX線の強度に基いて亜鉛系めっき鋼板のプレス成形性を評価する評価工程と、
を有することを特徴とする亜鉛系めっき鋼板のプレス成形性評価方法である。
(i)酸素の特性X線の波長は、TAP、RAPの有効波長の高波長側ぎりぎりであるため反射効率が低い。
(ii)LMDを用いた方が酸素の特性X線の反射効率が高く、つまり、測定強度が高くなるために測定精度が向上する。
Claims (2)
- 被測定試料である亜鉛系めっき鋼板にX線を照射する照射工程と、
前記照射工程で励起・放出された蛍光X線を酸素のKα線の一次回折線と亜鉛のLβ線の二次回折線の回折角度差が2度以上となるTAPにより分光する分光工程と、
前記分光工程で分光された主に酸素のKα線の一次回折線を含むX線を検出器で検出する検出工程と、
波高分析器のウィンドウ幅を調整して前記検出工程で検出した主に酸素のKα線の一次回折線を含むX線の中からエネルギーレベルが、酸素のKα線の一次回折線のエネルギーレベルを基準(100%)として、それに対して±25%〜±75%の範囲内にあるX線を分離する分離工程と、
前記分離工程で分離されたX線の強度を測定する測定工程と、
前記測定工程で測定したX線の強度に基いて亜鉛系めっき鋼板のプレス成形性を評価する評価工程と、
を有することを特徴とする亜鉛系めっき鋼板のプレス成形性評価方法。 - 請求項1において、鏡面研磨されたシリコンウエハー上に形成された膜厚既知の酸化シリコン皮膜を用いて酸素のKα線の一次回折線の強度と酸化膜厚の関係を表わす検量線を作成し、この検量線を用いて、前記測定工程で測定したX線の強度から亜鉛系めっき鋼板の表層に形成された酸化膜の膜厚を算出し、算出した膜厚から亜鉛系めっき鋼板のプレス成形性を評価することを特徴とする亜鉛系めっき鋼板のプレス成形性評価方法。
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JP6232157B1 (ja) * | 2017-03-31 | 2017-11-15 | 日新製鋼株式会社 | 水蒸気処理製品の品質評価方法 |
JP6797421B2 (ja) * | 2018-08-09 | 2020-12-09 | 株式会社リガク | 蛍光x線分析装置 |
CN114166157B (zh) * | 2021-12-08 | 2023-10-20 | 国能锅炉压力容器检验有限公司 | 一种依据射线强度曲线对管内氧化皮智能定量的方法 |
KR102586135B1 (ko) * | 2021-12-28 | 2023-10-10 | 현대제철 주식회사 | 강판의 코팅 부착량 측정 방법 |
Citations (2)
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JP3367478B2 (ja) * | 1999-07-29 | 2003-01-14 | 株式会社島津製作所 | 蛍光x線分析装置 |
JP2005248262A (ja) * | 2004-03-04 | 2005-09-15 | Jfe Steel Kk | 電気亜鉛めっき鋼板、その製造方法及び製造装置 |
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JP3367478B2 (ja) * | 1999-07-29 | 2003-01-14 | 株式会社島津製作所 | 蛍光x線分析装置 |
JP2005248262A (ja) * | 2004-03-04 | 2005-09-15 | Jfe Steel Kk | 電気亜鉛めっき鋼板、その製造方法及び製造装置 |
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