JP4510419B2 - ステージ装置、露光装置およびデバイス製造方法 - Google Patents

ステージ装置、露光装置およびデバイス製造方法 Download PDF

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Publication number
JP4510419B2
JP4510419B2 JP2003343229A JP2003343229A JP4510419B2 JP 4510419 B2 JP4510419 B2 JP 4510419B2 JP 2003343229 A JP2003343229 A JP 2003343229A JP 2003343229 A JP2003343229 A JP 2003343229A JP 4510419 B2 JP4510419 B2 JP 4510419B2
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Japan
Prior art keywords
temperature
stage
top plate
guide
reticle
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Expired - Fee Related
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JP2003343229A
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Japanese (ja)
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JP2005109331A5 (enExample
JP2005109331A (ja
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謙一郎 田地
和徳 岩本
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Canon Inc
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Canon Inc
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2003343229A 2003-10-01 2003-10-01 ステージ装置、露光装置およびデバイス製造方法 Expired - Fee Related JP4510419B2 (ja)

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JP2003343229A JP4510419B2 (ja) 2003-10-01 2003-10-01 ステージ装置、露光装置およびデバイス製造方法

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JP2003343229A JP4510419B2 (ja) 2003-10-01 2003-10-01 ステージ装置、露光装置およびデバイス製造方法

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JP2005109331A JP2005109331A (ja) 2005-04-21
JP2005109331A5 JP2005109331A5 (enExample) 2006-11-16
JP4510419B2 true JP4510419B2 (ja) 2010-07-21

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JP2003343229A Expired - Fee Related JP4510419B2 (ja) 2003-10-01 2003-10-01 ステージ装置、露光装置およびデバイス製造方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4546881B2 (ja) * 2005-06-15 2010-09-22 住友重機械工業株式会社 温調機能付きステージ
JP2012032666A (ja) * 2010-07-30 2012-02-16 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP7227834B2 (ja) * 2019-04-16 2023-02-22 キヤノン株式会社 基板処理装置及び物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2510874B2 (ja) * 1988-01-29 1996-06-26 キヤノン株式会社 精密移動テ―ブル
JPH05203773A (ja) * 1991-07-09 1993-08-10 Nikon Corp ステ−ジ装置の調整方法、およびステ−ジ装置
JPH10127035A (ja) * 1996-10-16 1998-05-15 Canon Inc リニアモータおよびこれを用いたステージ装置ならびに露光装置
JP4088728B2 (ja) * 1998-07-09 2008-05-21 株式会社ニコン 平面モータ装置、駆動装置及び露光装置
TW439116B (en) * 1998-12-16 2001-06-07 Nippon Kogaku Kk Platen motor device and assembly method thereof, platen motor device driving method, stage device and driving method thereof, exposure device and method thereof, and device and production method thereof
JP2002118050A (ja) * 2000-10-10 2002-04-19 Canon Inc ステージ装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法
JP2002217082A (ja) * 2001-01-12 2002-08-02 Nikon Corp ステージ装置及び露光装置

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