JP4505946B2 - 荷電粒子線装置およびプローブ制御方法 - Google Patents

荷電粒子線装置およびプローブ制御方法 Download PDF

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Publication number
JP4505946B2
JP4505946B2 JP2000148583A JP2000148583A JP4505946B2 JP 4505946 B2 JP4505946 B2 JP 4505946B2 JP 2000148583 A JP2000148583 A JP 2000148583A JP 2000148583 A JP2000148583 A JP 2000148583A JP 4505946 B2 JP4505946 B2 JP 4505946B2
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probe
sample
charged particle
particle beam
image
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Japanese (ja)
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JP2001324459A5 (enExample
JP2001324459A (ja
Inventor
宗行 福田
聡 富松
広康 志知
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Hitachi Ltd
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Hitachi Ltd
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  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2000148583A 2000-05-16 2000-05-16 荷電粒子線装置およびプローブ制御方法 Expired - Lifetime JP4505946B2 (ja)

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JP2000148583A JP4505946B2 (ja) 2000-05-16 2000-05-16 荷電粒子線装置およびプローブ制御方法

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JP2000148583A JP4505946B2 (ja) 2000-05-16 2000-05-16 荷電粒子線装置およびプローブ制御方法

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JP2001324459A JP2001324459A (ja) 2001-11-22
JP2001324459A5 JP2001324459A5 (enExample) 2006-09-07
JP4505946B2 true JP4505946B2 (ja) 2010-07-21

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009277953A (ja) * 2008-05-16 2009-11-26 Hitachi High-Technologies Corp 測定方法および検査装置
DE102010010937A1 (de) 2009-10-26 2011-04-28 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtung zur Herstellung einer Fresnel-Zonenplatte
WO2013132024A2 (en) 2012-03-08 2013-09-12 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Method of producing a fresnel zone plate for applications in high energy radiation
KR102383571B1 (ko) 2014-06-30 2022-04-06 가부시키가이샤 히다치 하이테크 사이언스 자동 시료 제작 장치
JP7507838B2 (ja) 2021-11-30 2024-06-28 イノヴェータム・インストゥルメンツ・インコーポレイテッド 荷電粒子ビームを使用するプローブ先端のｘ－ｙロケーションの識別
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2708547B2 (ja) * 1989-05-10 1998-02-04 株式会社日立製作所 デバイス移植方法
JP3577839B2 (ja) * 1996-06-04 2004-10-20 株式会社日立製作所 不良検査方法および装置
JP3547143B2 (ja) * 1997-07-22 2004-07-28 株式会社日立製作所 試料作製方法

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JP2001324459A (ja) 2001-11-22

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