JP2001324459A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001324459A5 JP2001324459A5 JP2000148583A JP2000148583A JP2001324459A5 JP 2001324459 A5 JP2001324459 A5 JP 2001324459A5 JP 2000148583 A JP2000148583 A JP 2000148583A JP 2000148583 A JP2000148583 A JP 2000148583A JP 2001324459 A5 JP2001324459 A5 JP 2001324459A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000148583A JP4505946B2 (ja) | 2000-05-16 | 2000-05-16 | 荷電粒子線装置およびプローブ制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000148583A JP4505946B2 (ja) | 2000-05-16 | 2000-05-16 | 荷電粒子線装置およびプローブ制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001324459A JP2001324459A (ja) | 2001-11-22 |
| JP2001324459A5 true JP2001324459A5 (enExample) | 2006-09-07 |
| JP4505946B2 JP4505946B2 (ja) | 2010-07-21 |
Family
ID=18654586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000148583A Expired - Lifetime JP4505946B2 (ja) | 2000-05-16 | 2000-05-16 | 荷電粒子線装置およびプローブ制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4505946B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009277953A (ja) * | 2008-05-16 | 2009-11-26 | Hitachi High-Technologies Corp | 測定方法および検査装置 |
| DE102010010937A1 (de) | 2009-10-26 | 2011-04-28 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Verfahren und Vorrichtung zur Herstellung einer Fresnel-Zonenplatte |
| EP2823489A2 (en) | 2012-03-08 | 2015-01-14 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften | Method of producing a fresnel zone plate for applications in high energy radiation |
| WO2016002719A1 (ja) | 2014-06-30 | 2016-01-07 | 株式会社日立ハイテクサイエンス | 自動試料作製装置 |
| JP7507838B2 (ja) * | 2021-11-30 | 2024-06-28 | イノヴェータム・インストゥルメンツ・インコーポレイテッド | 荷電粒子ビームを使用するプローブ先端のｘ－ｙロケーションの識別 |
| US12306241B2 (en) | 2022-02-14 | 2025-05-20 | Innovatum Instruments Inc. | Automated probe landing |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2708547B2 (ja) * | 1989-05-10 | 1998-02-04 | 株式会社日立製作所 | デバイス移植方法 |
| JP3577839B2 (ja) * | 1996-06-04 | 2004-10-20 | 株式会社日立製作所 | 不良検査方法および装置 |
| JP3547143B2 (ja) * | 1997-07-22 | 2004-07-28 | 株式会社日立製作所 | 試料作製方法 |
-
2000
- 2000-05-16 JP JP2000148583A patent/JP4505946B2/ja not_active Expired - Lifetime