JP4498309B2 - レーザー干渉による加工方法及び該加工方法で加工された回折格子、反射防止構造 - Google Patents
レーザー干渉による加工方法及び該加工方法で加工された回折格子、反射防止構造 Download PDFInfo
- Publication number
- JP4498309B2 JP4498309B2 JP2006137088A JP2006137088A JP4498309B2 JP 4498309 B2 JP4498309 B2 JP 4498309B2 JP 2006137088 A JP2006137088 A JP 2006137088A JP 2006137088 A JP2006137088 A JP 2006137088A JP 4498309 B2 JP4498309 B2 JP 4498309B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- interference
- processing method
- processing
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Laser Beam Processing (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006137088A JP4498309B2 (ja) | 2005-05-18 | 2006-05-16 | レーザー干渉による加工方法及び該加工方法で加工された回折格子、反射防止構造 |
| US11/914,674 US7796317B2 (en) | 2005-05-18 | 2006-05-18 | Processing method and processing apparatus using interfered laser beams |
| DE112006001230T DE112006001230B4 (de) | 2005-05-18 | 2006-05-18 | Bearbeitungsverfahren und Bearbeitungsvorrichtung, die interferierende Laserstrahlen verwenden, sowie Beugungsgitter und Miktrostruktur, hergestellt mit dem Barbeiungsverfahren |
| PCT/JP2006/310415 WO2006123835A1 (en) | 2005-05-18 | 2006-05-18 | Processing method and processing apparatus using interfered laser beams |
| CN2006800170970A CN101175599B (zh) | 2005-05-18 | 2006-05-18 | 使用干涉激光光束的处理方法和处理装置 |
| US12/790,665 US7939782B2 (en) | 2005-05-18 | 2010-05-28 | Processing method and processing apparatus using interfered laser beams |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005144937 | 2005-05-18 | ||
| JP2006137088A JP4498309B2 (ja) | 2005-05-18 | 2006-05-16 | レーザー干渉による加工方法及び該加工方法で加工された回折格子、反射防止構造 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006346748A JP2006346748A (ja) | 2006-12-28 |
| JP2006346748A5 JP2006346748A5 (https=) | 2007-02-15 |
| JP4498309B2 true JP4498309B2 (ja) | 2010-07-07 |
Family
ID=37431394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006137088A Expired - Fee Related JP4498309B2 (ja) | 2005-05-18 | 2006-05-16 | レーザー干渉による加工方法及び該加工方法で加工された回折格子、反射防止構造 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7796317B2 (https=) |
| JP (1) | JP4498309B2 (https=) |
| CN (1) | CN101175599B (https=) |
| DE (1) | DE112006001230B4 (https=) |
| WO (1) | WO2006123835A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4054330B2 (ja) * | 2002-09-27 | 2008-02-27 | キヤノンマシナリー株式会社 | 周期構造作成方法および表面処理方法 |
| JP5439738B2 (ja) * | 2008-05-07 | 2014-03-12 | 東洋製罐株式会社 | 構造体、レーザ加工方法及び真贋判定方法 |
| PT2414131E (pt) * | 2009-03-30 | 2015-09-04 | Boegli Gravures Sa | Método e dispositivo para a estruturação de uma superfície de um corpo sólido com um revestimento duro com o auxílio de um laser utilizando máscara e diafragma |
| JP5414884B2 (ja) | 2009-03-30 | 2014-02-12 | ボエグリ − グラビュル ソシエテ アノニム | 硬質材料をコーティングした物体の表面をレーザーによって構造化する方法及び装置 |
| EP2532470A1 (en) * | 2010-02-05 | 2012-12-12 | Fujikura Ltd. | Formation method for microstructure, and substrate having microstructure |
| US9455105B2 (en) * | 2010-09-27 | 2016-09-27 | Kulite Semiconductor Products, Inc. | Carbon nanotube or graphene based pressure switch |
| CN102566057B (zh) * | 2012-01-15 | 2013-06-12 | 中国人民解放军国防科学技术大学 | 具有光程调节能力的多光束合束器 |
| US11242284B2 (en) | 2012-07-26 | 2022-02-08 | Dexerials Corporation | Microfabrication method |
| EP3759529B8 (en) | 2018-02-28 | 2023-10-11 | Biomimetic Private Company | Using lasers to reduce reflection of transparent solids, coatings and devices employing transparent solids |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1179063B (it) * | 1984-08-20 | 1987-09-16 | Fiat Auto Spa | Apparecchiatura per effettuare trattamenti su pezzi metallici mediante laser di potenza |
| JPS62220919A (ja) * | 1986-03-24 | 1987-09-29 | Toshiba Corp | 光量制御装置 |
| CN1034530C (zh) * | 1992-05-16 | 1997-04-09 | 中国科学院长春光学精密机械研究所 | 激光外差共路干涉光学系统 |
| JPH11170073A (ja) * | 1997-12-09 | 1999-06-29 | Fuji Elelctrochem Co Ltd | レーザビーム描画装置 |
| US6169631B1 (en) * | 1998-05-19 | 2001-01-02 | Seagate Technology Llc | Laser-texturing data zone on a magnetic disk surface by using degenerative two wave mixing |
| JP3468152B2 (ja) * | 1999-03-03 | 2003-11-17 | 株式会社トッパンエヌイーシー・サーキットソリューションズ | 印刷配線板の製造方法および基板表面粗化装置 |
| JP4124396B2 (ja) | 1999-12-17 | 2008-07-23 | 独立行政法人科学技術振興機構 | ホログラムの製造方法および装置 |
| CN2432001Y (zh) | 2000-06-21 | 2001-05-30 | 中国科学院光电技术研究所 | 一种激光干涉光刻系统 |
| TW523791B (en) * | 2000-09-01 | 2003-03-11 | Semiconductor Energy Lab | Method of processing beam, laser irradiation apparatus, and method of manufacturing semiconductor device |
| JP4190812B2 (ja) * | 2002-07-05 | 2008-12-03 | 古河電気工業株式会社 | ファイバグレーティングの製造方法及びその製造装置 |
| CN1228663C (zh) * | 2003-02-27 | 2005-11-23 | 上海交通大学 | 基于导波共振的偏振方法 |
-
2006
- 2006-05-16 JP JP2006137088A patent/JP4498309B2/ja not_active Expired - Fee Related
- 2006-05-18 CN CN2006800170970A patent/CN101175599B/zh not_active Expired - Fee Related
- 2006-05-18 WO PCT/JP2006/310415 patent/WO2006123835A1/en not_active Ceased
- 2006-05-18 US US11/914,674 patent/US7796317B2/en not_active Expired - Fee Related
- 2006-05-18 DE DE112006001230T patent/DE112006001230B4/de not_active Expired - Fee Related
-
2010
- 2010-05-28 US US12/790,665 patent/US7939782B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20090103181A1 (en) | 2009-04-23 |
| CN101175599B (zh) | 2010-09-01 |
| JP2006346748A (ja) | 2006-12-28 |
| US7939782B2 (en) | 2011-05-10 |
| DE112006001230B4 (de) | 2010-11-04 |
| US20100301025A1 (en) | 2010-12-02 |
| CN101175599A (zh) | 2008-05-07 |
| US7796317B2 (en) | 2010-09-14 |
| DE112006001230T5 (de) | 2008-04-17 |
| WO2006123835A1 (en) | 2006-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7939782B2 (en) | Processing method and processing apparatus using interfered laser beams | |
| CN102000912B (zh) | 一种激光微纳加工系统及方法 | |
| US9636777B2 (en) | Laser micro/nano processing system and method | |
| JP3293136B2 (ja) | レーザ加工装置及びレーザ加工方法 | |
| Rekstyte et al. | Nanoscale precision of 3D polymerisation via polarisation control | |
| JPWO1994029069A1 (ja) | レーザ加工装置及びレーザ加工方法並びに液晶パネル | |
| Yamada et al. | Volume grating induced by a self-trapped long filament of femtosecond laser pulses in silica glass | |
| JP2010142862A (ja) | 誘電体材料表面のナノ周期構造形成方法 | |
| JP5098229B2 (ja) | 表面改質方法 | |
| Kolacek et al. | Nano-structuring of solid surface by extreme ultraviolet Ar8+ laser | |
| Anghel et al. | Femtosecond laser ablation of TiO2 films for two-dimensional photonic crystals | |
| JP2005161372A (ja) | レーザ加工装置、構造体、光学素子、及びレーザ加工法 | |
| JP7335473B2 (ja) | 空間変調波長板の製造方法 | |
| JP2004310009A (ja) | 光学用構造体及びその製造方法並びに光学素子 | |
| Kim et al. | Fabrication of uniform nanogrooves on 6H-SiC by femtosecond laser ablation | |
| JP2002263876A (ja) | レーザ加工装置及びレーザ加工方法 | |
| JP2002196347A (ja) | 液晶パネルおよび液晶パネルの製造方法 | |
| Ganeev et al. | Nanostructuring of semiconductor surfaces under the action of femtosecond pulses | |
| JP2011079057A (ja) | レーザ加工装置およびレーザ加工方法 | |
| JP4730591B2 (ja) | レーザ加工装置およびレーザ加工方法 | |
| KR20120091487A (ko) | 레이저 가공 시스템 및 이를 이용한 레이저 가공 방법 | |
| CA2512327C (en) | Fabrication of long-range periodic nanostructures in glass | |
| Ganeev | Nanoripples formation on the surfaces | |
| JP5057202B2 (ja) | 微細構造体の製造方法および製造装置 | |
| Kolacek et al. | Nano-Structuring of Solid Surface by EUV Ar {sup 8+} Laser |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061214 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061214 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100409 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100413 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130423 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4498309 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130423 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140423 Year of fee payment: 4 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D03 |
|
| LAPS | Cancellation because of no payment of annual fees |