JP4465644B2 - 転写方法及びデバイス製造方法 - Google Patents

転写方法及びデバイス製造方法 Download PDF

Info

Publication number
JP4465644B2
JP4465644B2 JP2000553986A JP2000553986A JP4465644B2 JP 4465644 B2 JP4465644 B2 JP 4465644B2 JP 2000553986 A JP2000553986 A JP 2000553986A JP 2000553986 A JP2000553986 A JP 2000553986A JP 4465644 B2 JP4465644 B2 JP 4465644B2
Authority
JP
Japan
Prior art keywords
pattern
linear
illumination
patterns
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000553986A
Other languages
English (en)
Japanese (ja)
Inventor
直正 白石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of JP4465644B2 publication Critical patent/JP4465644B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000553986A 1998-06-10 1999-06-02 転写方法及びデバイス製造方法 Expired - Fee Related JP4465644B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16189698 1998-06-10
PCT/JP1999/002941 WO1999065066A1 (fr) 1998-06-10 1999-06-02 Procede de transfert et aligneur

Publications (1)

Publication Number Publication Date
JP4465644B2 true JP4465644B2 (ja) 2010-05-19

Family

ID=15744079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000553986A Expired - Fee Related JP4465644B2 (ja) 1998-06-10 1999-06-02 転写方法及びデバイス製造方法

Country Status (4)

Country Link
JP (1) JP4465644B2 (fr)
AU (1) AU4058599A (fr)
TW (1) TW417164B (fr)
WO (1) WO1999065066A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5106747B2 (ja) 2004-10-27 2012-12-26 ルネサスエレクトロニクス株式会社 パターン形成方法、半導体装置の製造方法及び露光用マスクセット

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3084761B2 (ja) * 1991-02-28 2000-09-04 株式会社ニコン 露光方法及びマスク
JPH07211619A (ja) * 1994-01-25 1995-08-11 Hitachi Ltd 回路パターンの形成方法及びそれに用いられるレチクル
JPH07226362A (ja) * 1994-02-10 1995-08-22 Ricoh Co Ltd フォトレジストパターン形成方法
JPH11176726A (ja) * 1997-12-09 1999-07-02 Nikon Corp 露光方法、該方法を使用するリソグラフィシステム、及び前記方法を用いるデバイスの製造方法
JPH11233429A (ja) * 1998-02-13 1999-08-27 Canon Inc 露光方法及び露光装置

Also Published As

Publication number Publication date
WO1999065066A1 (fr) 1999-12-16
AU4058599A (en) 1999-12-30
TW417164B (en) 2001-01-01

Similar Documents

Publication Publication Date Title
US6677088B2 (en) Photomask producing method and apparatus and device manufacturing method
US6841323B2 (en) Mask producing method
KR100554887B1 (ko) 리소그래피 장치
JP3862347B2 (ja) Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
JP2001319871A (ja) 露光方法、濃度フィルタの製造方法、及び露光装置
WO2000028380A1 (fr) Procede et dispositif d'exposition
JPWO2003065427A1 (ja) 露光装置及び露光方法
JP2001358062A (ja) 露光方法及び露光装置
JPWO2007100081A1 (ja) 露光方法及び装置、並びにデバイス製造方法
WO2000011706A1 (fr) Illuminateur et appareil d'exposition a la projection
JP2000029202A (ja) マスクの製造方法
JP2004200701A (ja) リソグラフィ投影マスク、リソグラフィ投影マスクによるデバイス製造方法、およびこの方法により製造したデバイス
US6335786B1 (en) Exposure apparatus
US6265137B1 (en) Exposure method and device producing method using the same
WO1999036832A1 (fr) Dispositif d'eclairement et appareil de sensibilisation
JP4465644B2 (ja) 転写方法及びデバイス製造方法
JP3262074B2 (ja) 露光方法及び露光装置
JPWO2004066371A1 (ja) 露光装置
JP2004311897A (ja) 露光方法及び装置、デバイス製造方法、並びにマスク
JP2004311896A (ja) 露光方法及び装置、デバイス製造方法、並びにマスク
US20040032576A1 (en) Exposure method and apparatus
JP2005079470A (ja) 照明光学系の調整方法、露光装置及び方法、並びにデバイス製造方法
JP2000021715A (ja) 露光装置およびデバイス製造方法
JP3278802B2 (ja) マスク及びそれを用いた露光方法
JP3337983B2 (ja) 露光方法及び露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060411

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090609

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090730

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100129

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100211

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130305

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130305

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130305

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140305

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees