AU4058599A - Transfer method and aligner - Google Patents

Transfer method and aligner

Info

Publication number
AU4058599A
AU4058599A AU40585/99A AU4058599A AU4058599A AU 4058599 A AU4058599 A AU 4058599A AU 40585/99 A AU40585/99 A AU 40585/99A AU 4058599 A AU4058599 A AU 4058599A AU 4058599 A AU4058599 A AU 4058599A
Authority
AU
Australia
Prior art keywords
aligner
transfer method
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU40585/99A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU4058599A publication Critical patent/AU4058599A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU40585/99A 1998-06-10 1999-06-02 Transfer method and aligner Abandoned AU4058599A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/161896 1998-06-10
JP16189698 1998-06-10
PCT/JP1999/002941 WO1999065066A1 (en) 1998-06-10 1999-06-02 Transfer method and aligner

Publications (1)

Publication Number Publication Date
AU4058599A true AU4058599A (en) 1999-12-30

Family

ID=15744079

Family Applications (1)

Application Number Title Priority Date Filing Date
AU40585/99A Abandoned AU4058599A (en) 1998-06-10 1999-06-02 Transfer method and aligner

Country Status (4)

Country Link
JP (1) JP4465644B2 (en)
AU (1) AU4058599A (en)
TW (1) TW417164B (en)
WO (1) WO1999065066A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5106747B2 (en) 2004-10-27 2012-12-26 ルネサスエレクトロニクス株式会社 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND EXPOSURE MASK SET

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3084761B2 (en) * 1991-02-28 2000-09-04 株式会社ニコン Exposure method and mask
JPH07211619A (en) * 1994-01-25 1995-08-11 Hitachi Ltd Formation of circuit pattern and reticle therefor
JPH07226362A (en) * 1994-02-10 1995-08-22 Ricoh Co Ltd Method of forming photoresist pattern
JPH11176726A (en) * 1997-12-09 1999-07-02 Nikon Corp Aligning method, lithographic system using the method and method for manufacturing device using the aligning method
JPH11233429A (en) * 1998-02-13 1999-08-27 Canon Inc Exposure method and aligner

Also Published As

Publication number Publication date
JP4465644B2 (en) 2010-05-19
TW417164B (en) 2001-01-01
WO1999065066A1 (en) 1999-12-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase