AU1173499A - Exposure method and aligner - Google Patents

Exposure method and aligner

Info

Publication number
AU1173499A
AU1173499A AU11734/99A AU1173499A AU1173499A AU 1173499 A AU1173499 A AU 1173499A AU 11734/99 A AU11734/99 A AU 11734/99A AU 1173499 A AU1173499 A AU 1173499A AU 1173499 A AU1173499 A AU 1173499A
Authority
AU
Australia
Prior art keywords
aligner
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU11734/99A
Inventor
Tetsuo Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1173499A publication Critical patent/AU1173499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU11734/99A 1997-11-18 1998-11-18 Exposure method and aligner Abandoned AU1173499A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-316921 1997-11-18
JP9316921A JPH11150053A (en) 1997-11-18 1997-11-18 Exposure method and device
PCT/JP1998/005184 WO1999026279A1 (en) 1997-11-18 1998-11-18 Exposure method and aligner

Publications (1)

Publication Number Publication Date
AU1173499A true AU1173499A (en) 1999-06-07

Family

ID=18082410

Family Applications (1)

Application Number Title Priority Date Filing Date
AU11734/99A Abandoned AU1173499A (en) 1997-11-18 1998-11-18 Exposure method and aligner

Country Status (3)

Country Link
JP (1) JPH11150053A (en)
AU (1) AU1173499A (en)
WO (1) WO1999026279A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4586954B2 (en) * 2003-04-04 2010-11-24 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
JP4684563B2 (en) * 2004-02-26 2011-05-18 キヤノン株式会社 Exposure apparatus and method
US7382438B2 (en) * 2005-08-23 2008-06-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5006762B2 (en) * 2007-11-05 2012-08-22 キヤノン株式会社 Exposure apparatus and device manufacturing method
NL2003919A (en) * 2008-12-24 2010-06-28 Asml Netherlands Bv An optimization method and a lithographic cell.
DE102011113521A1 (en) * 2011-09-15 2013-01-03 Carl Zeiss Smt Gmbh Microlithographic extreme UV (EUV) projection exposure apparatus for imaging reflective mask on photosensitive layer, has drive element that is adapted to reflective switching elements to emit projection and heating light rays
JP7213757B2 (en) * 2019-05-31 2023-01-27 キヤノン株式会社 Exposure apparatus and article manufacturing method
JP2023178029A (en) 2022-06-03 2023-12-14 キヤノン株式会社 Determination method, exposure method, information processor, program, exposure device, and article manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3395280B2 (en) * 1993-09-21 2003-04-07 株式会社ニコン Projection exposure apparatus and method
JP3555233B2 (en) * 1995-04-13 2004-08-18 株式会社ニコン Projection exposure equipment

Also Published As

Publication number Publication date
WO1999026279A1 (en) 1999-05-27
JPH11150053A (en) 1999-06-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase