JP4455024B2 - 複屈折測定装置 - Google Patents

複屈折測定装置 Download PDF

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Publication number
JP4455024B2
JP4455024B2 JP2003389419A JP2003389419A JP4455024B2 JP 4455024 B2 JP4455024 B2 JP 4455024B2 JP 2003389419 A JP2003389419 A JP 2003389419A JP 2003389419 A JP2003389419 A JP 2003389419A JP 4455024 B2 JP4455024 B2 JP 4455024B2
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JP
Japan
Prior art keywords
light beam
light
polarized light
birefringence
sample
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Expired - Fee Related
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JP2003389419A
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English (en)
Japanese (ja)
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JP2004205500A5 (enExample
JP2004205500A (ja
Inventor
誠二 竹内
康宏 岸川
晃宏 畑田
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003389419A priority Critical patent/JP4455024B2/ja
Priority to EP03028433A priority patent/EP1429128A1/en
Priority to US10/733,359 priority patent/US7286226B2/en
Publication of JP2004205500A publication Critical patent/JP2004205500A/ja
Publication of JP2004205500A5 publication Critical patent/JP2004205500A5/ja
Application granted granted Critical
Publication of JP4455024B2 publication Critical patent/JP4455024B2/ja
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Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/23—Bi-refringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2003389419A 2002-12-13 2003-11-19 複屈折測定装置 Expired - Fee Related JP4455024B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003389419A JP4455024B2 (ja) 2002-12-13 2003-11-19 複屈折測定装置
EP03028433A EP1429128A1 (en) 2002-12-13 2003-12-11 Method and apparatus for measuring birefringence
US10/733,359 US7286226B2 (en) 2002-12-13 2003-12-12 Method and apparatus for measuring birefringence

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002362251 2002-12-13
JP2003389419A JP4455024B2 (ja) 2002-12-13 2003-11-19 複屈折測定装置

Publications (3)

Publication Number Publication Date
JP2004205500A JP2004205500A (ja) 2004-07-22
JP2004205500A5 JP2004205500A5 (enExample) 2006-12-28
JP4455024B2 true JP4455024B2 (ja) 2010-04-21

Family

ID=32328399

Family Applications (1)

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JP2003389419A Expired - Fee Related JP4455024B2 (ja) 2002-12-13 2003-11-19 複屈折測定装置

Country Status (3)

Country Link
US (1) US7286226B2 (enExample)
EP (1) EP1429128A1 (enExample)
JP (1) JP4455024B2 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
KR20040015251A (ko) 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
US7667829B2 (en) 2004-08-09 2010-02-23 Nikon Corporation Optical property measurement apparatus and optical property measurement method, exposure apparatus and exposure method, and device manufacturing method
TWI254128B (en) * 2004-12-29 2006-05-01 Optimax Tech Corp Apparatus and method for measuring phase retardation
JP2006214856A (ja) * 2005-02-03 2006-08-17 Canon Inc 測定装置及び方法
JP4891261B2 (ja) * 2005-12-07 2012-03-07 株式会社トプコン 光画像計測装置
JP5118311B2 (ja) * 2006-03-27 2013-01-16 株式会社フォトニックラティス 位相差および光軸方位の測定装置
CN101449134B (zh) 2006-05-01 2011-08-03 海因兹仪器公司 光学元件中线性和圆形双衰减的测量
JP2008045981A (ja) * 2006-08-15 2008-02-28 Yokogawa Electric Corp 光学特性測定方法及び光学特性測定装置
JP5370155B2 (ja) * 2007-10-12 2013-12-18 株式会社ニコン 表面検査装置及び表面検査方法
US8072599B2 (en) * 2008-03-14 2011-12-06 Teledyne Scientific & Imaging, Llc Real-time, hybrid amplitude-time division polarimetric imaging camera
TWI399529B (zh) * 2009-09-10 2013-06-21 Ind Tech Res Inst 線掃瞄式量測系統
KR20130072535A (ko) * 2011-12-22 2013-07-02 삼성전기주식회사 비파괴적 결함검사장치 및 이를 이용한 결함검사방법
JP6195777B2 (ja) * 2013-10-22 2017-09-13 Hoya株式会社 複屈折の測定方法、マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法および半導体デバイスの製造方法
KR20170039232A (ko) * 2014-08-26 2017-04-10 학교법인 도시샤 복굴절 측정장치 및 복굴절 측정방법
KR102659810B1 (ko) 2015-09-11 2024-04-23 삼성디스플레이 주식회사 결정화도 측정 장치 및 그 측정 방법
JP7045663B2 (ja) * 2017-12-04 2022-04-01 学校法人同志社 複屈折測定装置および複屈折測定方法
CN112345078A (zh) * 2020-10-27 2021-02-09 衡阳市智谷科技发展有限公司 一种基于光波偏振态的偏振测量系统
CN112557344B (zh) * 2020-11-30 2022-04-08 华中科技大学 一种双折射率的测定装置和测定方法
CN113340424B (zh) * 2021-06-18 2022-09-27 上海国科航星量子科技有限公司 偏振光性能的检测装置及检测方法
CN116295136B (zh) * 2022-12-02 2025-11-21 西安工业大学 用于双折射材料晶轴和表面粗糙度表征的装置和方法
CN116147893A (zh) * 2023-01-19 2023-05-23 南京邮电大学 一种在线测量afoct系统的传感光纤双折射率的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681450A (en) 1985-06-21 1987-07-21 Research Corporation Photodetector arrangement for measuring the state of polarization of light
US5298972A (en) 1990-01-22 1994-03-29 Hewlett-Packard Company Method and apparatus for measuring polarization sensitivity of optical devices
JPH06147986A (ja) 1992-11-12 1994-05-27 Sadao Nakai 複屈折分布測定方法
JPH0720329A (ja) 1993-06-23 1995-01-24 Canon Inc 光合分波器
US5784202A (en) * 1993-07-08 1998-07-21 Asahi Kogaku Kogyo Kabushika Kaisha Apparatus for isometrically splitting beams
JPH08201175A (ja) 1995-01-26 1996-08-09 Ando Electric Co Ltd 偏光解析装置および偏波モード分散測定装置
EP1060369A4 (en) 1998-02-20 2005-01-19 Hinds Instruments Inc BIREFRINGENCE MEASUREMENT SYSTEM
CN1272622C (zh) 1998-04-22 2006-08-30 株式会社理光 双折射测定方法及其装置
KR100389482B1 (ko) * 2000-07-26 2003-06-27 커미넷 주식회사 실시간 편광상태 파악 및 제어장치 및 그 방법
JP3689681B2 (ja) * 2002-05-10 2005-08-31 キヤノン株式会社 測定装置及びそれを有する装置群

Also Published As

Publication number Publication date
US20040156051A1 (en) 2004-08-12
EP1429128A1 (en) 2004-06-16
US7286226B2 (en) 2007-10-23
JP2004205500A (ja) 2004-07-22

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