JP2021529328A5 - - Google Patents

Info

Publication number
JP2021529328A5
JP2021529328A5 JP2021520898A JP2021520898A JP2021529328A5 JP 2021529328 A5 JP2021529328 A5 JP 2021529328A5 JP 2021520898 A JP2021520898 A JP 2021520898A JP 2021520898 A JP2021520898 A JP 2021520898A JP 2021529328 A5 JP2021529328 A5 JP 2021529328A5
Authority
JP
Japan
Prior art keywords
constant
polarizer
incidence ellipsometer
specimen
velocity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021520898A
Other languages
English (en)
Japanese (ja)
Other versions
JP7316355B2 (ja
JP2021529328A (ja
Filing date
Publication date
Priority claimed from KR1020180081169A external-priority patent/KR102139988B1/ko
Application filed filed Critical
Publication of JP2021529328A publication Critical patent/JP2021529328A/ja
Publication of JP2021529328A5 publication Critical patent/JP2021529328A5/ja
Application granted granted Critical
Publication of JP7316355B2 publication Critical patent/JP7316355B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021520898A 2018-07-12 2019-07-03 垂直入射エリプソメータおよびこれを用いた試験片の光物性の測定方法 Active JP7316355B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2018-0081169 2018-07-12
KR1020180081169A KR102139988B1 (ko) 2018-07-12 2018-07-12 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법
PCT/KR2019/008147 WO2020013517A1 (ko) 2018-07-12 2019-07-03 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법

Publications (3)

Publication Number Publication Date
JP2021529328A JP2021529328A (ja) 2021-10-28
JP2021529328A5 true JP2021529328A5 (enExample) 2022-07-22
JP7316355B2 JP7316355B2 (ja) 2023-07-27

Family

ID=69142874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021520898A Active JP7316355B2 (ja) 2018-07-12 2019-07-03 垂直入射エリプソメータおよびこれを用いた試験片の光物性の測定方法

Country Status (6)

Country Link
US (1) US11493433B2 (enExample)
EP (1) EP3798608A4 (enExample)
JP (1) JP7316355B2 (enExample)
KR (1) KR102139988B1 (enExample)
CN (1) CN112469987B (enExample)
WO (1) WO2020013517A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7460080B2 (ja) * 2020-10-19 2024-04-02 浜松ホトニクス株式会社 光学特性評価装置および光学特性評価方法
CN113218635B (zh) * 2021-04-30 2023-02-28 重庆大学 一种非接触式矢量偏振光场测试系统
CN113588216B (zh) * 2021-08-02 2023-09-19 中国科学院光电技术研究所 一种偏振片光学零位快速高精度定标装置和方法
EP4141415A1 (en) * 2021-08-26 2023-03-01 Université de Strasbourg Device and method for polarimetric imaging
KR20230174618A (ko) * 2022-06-21 2023-12-28 삼성전자주식회사 영상 타원편광기 및 이를 이용한 정렬 오차 측정 방법
CN115265812A (zh) * 2022-07-22 2022-11-01 上海如海光电科技有限公司 一种基于Zynq的高通量光谱数据采集与传输装置及方法
KR102734584B1 (ko) * 2022-12-27 2024-11-25 중앙대학교 산학협력단 외부환경 차단을 위한 경통형 분광분석 시스템
US20250086358A1 (en) * 2023-09-12 2025-03-13 Google Llc Optical critical dimension metrology aided by deep learning
CN117889754B (zh) * 2024-03-15 2024-06-04 苏州大学 一种二维薄膜静态位移的测量装置及方法
CN118500338B (zh) * 2024-07-19 2024-09-17 江苏双奇地板有限公司 一种地板外形检测装置
CN119413729B (zh) * 2024-10-31 2025-11-21 华中科技大学 一种四光弹调制器型穆勒矩阵偏振系统的参数校准方法及系统
KR102944184B1 (ko) 2025-05-30 2026-03-27 동신공영주식회사 안전점검 및 진단을 위한 슈미트 해머 수직도 조절장치

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2746354B2 (ja) * 1992-07-13 1998-05-06 国際電信電話株式会社 固定検光子を用いた偏波モード分散測定方法及び装置
US6734967B1 (en) * 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
US5877859A (en) * 1996-07-24 1999-03-02 Therma-Wave, Inc. Broadband spectroscopic rotating compensator ellipsometer
JP2970585B2 (ja) * 1997-04-17 1999-11-02 日本電気株式会社 異方性薄膜評価方法及び異方性薄膜評価装置
WO1999013318A1 (en) * 1997-09-05 1999-03-18 Brown University Research Foundation Optical method for the characterization of the electrical properties of semiconductors and insulating films
US6583875B1 (en) * 2000-05-19 2003-06-24 Therma-Wave, Inc. Monitoring temperature and sample characteristics using a rotating compensator ellipsometer
US6781692B1 (en) * 2000-08-28 2004-08-24 Therma-Wave, Inc. Method of monitoring the fabrication of thin film layers forming a DWDM filter
US6753961B1 (en) * 2000-09-18 2004-06-22 Therma-Wave, Inc. Spectroscopic ellipsometer without rotating components
US6750968B2 (en) * 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
KR100574776B1 (ko) * 2004-01-15 2006-04-28 한국표준과학연구원 분광결상을 이용한 타원계측 장치 및 타원계측 방법
KR100831806B1 (ko) * 2004-04-19 2008-05-28 아리스트 인스트루먼트, 인크. 박막 및 cd 측정들을 위한 빔 프로파일 복합 반사율시스템 및 방법
US7173700B2 (en) 2004-05-06 2007-02-06 Therma-Wave, Inc. Normal incidence rotating compensator ellipsometer
US7564552B2 (en) * 2004-05-14 2009-07-21 Kla-Tencor Technologies Corp. Systems and methods for measurement of a specimen with vacuum ultraviolet light
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
KR100917912B1 (ko) 2007-11-13 2009-09-16 한국표준과학연구원 단일 편광자 초점 타원계측기
US7889340B1 (en) * 2008-03-05 2011-02-15 Kla-Tencor Corporation Normal incidence ellipsometer with complementary waveplate rotating compensators
CN102269858A (zh) * 2010-06-02 2011-12-07 北京智朗芯光科技有限公司 自动聚焦系统和自动聚焦方法
US8427645B2 (en) * 2011-01-10 2013-04-23 Nanometrics Incorporated Mueller matrix spectroscopy using chiroptic
US9404872B1 (en) * 2011-06-29 2016-08-02 Kla-Tencor Corporation Selectably configurable multiple mode spectroscopic ellipsometry
KR20130019495A (ko) * 2011-08-17 2013-02-27 한국표준과학연구원 광소자-회전형 타원계측기 및 이를 이용한 시료의 물성 측정 방법
US9116103B2 (en) * 2013-01-14 2015-08-25 Kla-Tencor Corporation Multiple angles of incidence semiconductor metrology systems and methods
CN103134592B (zh) * 2013-01-31 2015-11-04 华中科技大学 一种透射式全穆勒矩阵光谱椭偏仪及其测量方法
KR101590389B1 (ko) 2014-12-16 2016-02-02 한국표준과학연구원 광소자 회전형 분광타원계측기 및 광소자 회전형 분광타원계측기의 측정 정밀도 예측 방법, 이를 구현하기 위한 프로그램이 저장된 기록매체 및 이를 구현하기 위해 매체에 저장된 컴퓨터프로그램
DE102014119228A1 (de) 2014-12-19 2016-06-23 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Anordnung zur Erfassung von Reflexions-Anisotropie
KR101698022B1 (ko) 2015-03-13 2017-02-01 한국표준과학연구원 무색수차 광소자-회전형 타원계측기 및 이를 이용한 시편의 뮬러-행렬 측정 방법
US9860466B2 (en) * 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
CN106595521B (zh) * 2016-12-12 2019-12-13 武汉颐光科技有限公司 基于液晶调相的垂直物镜式穆勒矩阵成像椭偏仪

Similar Documents

Publication Publication Date Title
JP7316355B2 (ja) 垂直入射エリプソメータおよびこれを用いた試験片の光物性の測定方法
JP2021529328A5 (enExample)
KR101698022B1 (ko) 무색수차 광소자-회전형 타원계측기 및 이를 이용한 시편의 뮬러-행렬 측정 방법
US8830463B2 (en) Rotating-element ellipsometer and method for measuring properties of the sample using the same
KR101509054B1 (ko) 광소자-회전형 뮬러-행렬 타원계측기 및 이를 이용한 시료의 뮬러-행렬 측정 방법
US8896832B2 (en) Discrete polarization scatterometry
US9354118B2 (en) Multiple wavelength ellipsometer system and related method
JP4455024B2 (ja) 複屈折測定装置
JPS6134442A (ja) 試料表面ないしは試料の表面膜層の物理的特性を検査するためのエリプソメトリ測定法とその装置
JP2010530074A (ja) 単一偏光子焦点エリプソメータ
JPH05157521A (ja) エリプソパラメータ測定方法及びエリプソメータ
CN109990736B (zh) 一种基于斯托克斯矢量的滚转角测量方法及装置
CN113777048B (zh) 一种共轴超快光谱椭偏仪及测量方法
JP2023046399A (ja) 多層薄膜の干渉信号および偏光解析信号の同時測定のためのシステムおよび方法
CN103048047A (zh) 包含相位元件的垂直入射宽带偏振光谱仪和光学测量系统
US20130242303A1 (en) Dual angles of incidence and azimuth angles optical metrology
CN116804588A (zh) 一种光栅衍射效率测量装置
CN118533764A (zh) 一种双补偿器后焦面快照椭偏测量系统及方法
KR102139995B1 (ko) 수직입사 및 경사입사 결합형 타원계측기 및 이를 이용한 시편의 광물성 측정 방법
JP3520379B2 (ja) 光学定数測定方法およびその装置
CN109341554A (zh) 一种测量膜厚的装置及方法
JP2006071458A (ja) 複屈折位相差測定装置及び複屈折位相差測定方法
US20260056059A1 (en) Method and apparatus for characterizing thin films
Zheng et al. Research on Calibration Techniques for Polarization Detection with Metagratings
KR101270260B1 (ko) 광소자-회전형 타원계측기 및 이를 이용한 시료의 물성 측정 방법