KR102139988B1 - 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법 - Google Patents

수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법 Download PDF

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KR102139988B1
KR102139988B1 KR1020180081169A KR20180081169A KR102139988B1 KR 102139988 B1 KR102139988 B1 KR 102139988B1 KR 1020180081169 A KR1020180081169 A KR 1020180081169A KR 20180081169 A KR20180081169 A KR 20180081169A KR 102139988 B1 KR102139988 B1 KR 102139988B1
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specimen
ellipsometer
constant
polarizer
incident
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KR20200007267A (ko
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조용재
제갈원
조현모
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한국표준과학연구원
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Priority to KR1020180081169A priority Critical patent/KR102139988B1/ko
Priority to JP2021520898A priority patent/JP7316355B2/ja
Priority to US17/256,966 priority patent/US11493433B2/en
Priority to CN201980046133.3A priority patent/CN112469987B/zh
Priority to EP19833613.3A priority patent/EP3798608A4/en
Priority to PCT/KR2019/008147 priority patent/WO2020013517A1/ko
Publication of KR20200007267A publication Critical patent/KR20200007267A/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/13—Moving of cuvettes or solid samples to or from the investigating station
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/023—Controlling conditions in casing
    • G01N2201/0231—Thermostating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G01N2201/0612—Laser diodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0633—Directed, collimated illumination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0636—Reflectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G01N2201/0683—Brewster plate; polarisation controlling elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
KR1020180081169A 2018-07-12 2018-07-12 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법 Active KR102139988B1 (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020180081169A KR102139988B1 (ko) 2018-07-12 2018-07-12 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법
JP2021520898A JP7316355B2 (ja) 2018-07-12 2019-07-03 垂直入射エリプソメータおよびこれを用いた試験片の光物性の測定方法
US17/256,966 US11493433B2 (en) 2018-07-12 2019-07-03 Normal incidence ellipsometer and method for measuring optical properties of sample by using same
CN201980046133.3A CN112469987B (zh) 2018-07-12 2019-07-03 正交入射椭圆仪以及使用其测量样本的光学性质的方法
EP19833613.3A EP3798608A4 (en) 2018-07-12 2019-07-03 NORMAL INCIDENCE ELLIPSOMETER AND METHOD OF MEASUREMENT OF OPTICAL PROPERTIES OF A SAMPLE USING THE SAME
PCT/KR2019/008147 WO2020013517A1 (ko) 2018-07-12 2019-07-03 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020180081169A KR102139988B1 (ko) 2018-07-12 2018-07-12 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법

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KR20200007267A KR20200007267A (ko) 2020-01-22
KR102139988B1 true KR102139988B1 (ko) 2020-07-31

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US (1) US11493433B2 (enExample)
EP (1) EP3798608A4 (enExample)
JP (1) JP7316355B2 (enExample)
KR (1) KR102139988B1 (enExample)
CN (1) CN112469987B (enExample)
WO (1) WO2020013517A1 (enExample)

Families Citing this family (12)

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Publication number Priority date Publication date Assignee Title
JP7460080B2 (ja) * 2020-10-19 2024-04-02 浜松ホトニクス株式会社 光学特性評価装置および光学特性評価方法
CN113218635B (zh) * 2021-04-30 2023-02-28 重庆大学 一种非接触式矢量偏振光场测试系统
CN113588216B (zh) * 2021-08-02 2023-09-19 中国科学院光电技术研究所 一种偏振片光学零位快速高精度定标装置和方法
EP4141415A1 (en) * 2021-08-26 2023-03-01 Université de Strasbourg Device and method for polarimetric imaging
KR20230174618A (ko) * 2022-06-21 2023-12-28 삼성전자주식회사 영상 타원편광기 및 이를 이용한 정렬 오차 측정 방법
CN115265812A (zh) * 2022-07-22 2022-11-01 上海如海光电科技有限公司 一种基于Zynq的高通量光谱数据采集与传输装置及方法
KR102734584B1 (ko) * 2022-12-27 2024-11-25 중앙대학교 산학협력단 외부환경 차단을 위한 경통형 분광분석 시스템
US20250086358A1 (en) * 2023-09-12 2025-03-13 Google Llc Optical critical dimension metrology aided by deep learning
CN117889754B (zh) * 2024-03-15 2024-06-04 苏州大学 一种二维薄膜静态位移的测量装置及方法
CN118500338B (zh) * 2024-07-19 2024-09-17 江苏双奇地板有限公司 一种地板外形检测装置
CN119413729B (zh) * 2024-10-31 2025-11-21 华中科技大学 一种四光弹调制器型穆勒矩阵偏振系统的参数校准方法及系统
KR102944184B1 (ko) 2025-05-30 2026-03-27 동신공영주식회사 안전점검 및 진단을 위한 슈미트 해머 수직도 조절장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070091311A1 (en) 2004-05-06 2007-04-26 Aspnes David E Normal incidence rotating compensator ellipsometer
KR101590389B1 (ko) 2014-12-16 2016-02-02 한국표준과학연구원 광소자 회전형 분광타원계측기 및 광소자 회전형 분광타원계측기의 측정 정밀도 예측 방법, 이를 구현하기 위한 프로그램이 저장된 기록매체 및 이를 구현하기 위해 매체에 저장된 컴퓨터프로그램

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2746354B2 (ja) * 1992-07-13 1998-05-06 国際電信電話株式会社 固定検光子を用いた偏波モード分散測定方法及び装置
US6734967B1 (en) * 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
US5877859A (en) * 1996-07-24 1999-03-02 Therma-Wave, Inc. Broadband spectroscopic rotating compensator ellipsometer
JP2970585B2 (ja) * 1997-04-17 1999-11-02 日本電気株式会社 異方性薄膜評価方法及び異方性薄膜評価装置
WO1999013318A1 (en) * 1997-09-05 1999-03-18 Brown University Research Foundation Optical method for the characterization of the electrical properties of semiconductors and insulating films
US6583875B1 (en) * 2000-05-19 2003-06-24 Therma-Wave, Inc. Monitoring temperature and sample characteristics using a rotating compensator ellipsometer
US6781692B1 (en) * 2000-08-28 2004-08-24 Therma-Wave, Inc. Method of monitoring the fabrication of thin film layers forming a DWDM filter
US6753961B1 (en) * 2000-09-18 2004-06-22 Therma-Wave, Inc. Spectroscopic ellipsometer without rotating components
US6750968B2 (en) * 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
KR100574776B1 (ko) * 2004-01-15 2006-04-28 한국표준과학연구원 분광결상을 이용한 타원계측 장치 및 타원계측 방법
KR100831806B1 (ko) * 2004-04-19 2008-05-28 아리스트 인스트루먼트, 인크. 박막 및 ｃｄ 측정들을 위한 빔 프로파일 복합 반사율시스템 및 방법
US7564552B2 (en) * 2004-05-14 2009-07-21 Kla-Tencor Technologies Corp. Systems and methods for measurement of a specimen with vacuum ultraviolet light
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
KR100917912B1 (ko) 2007-11-13 2009-09-16 한국표준과학연구원 단일 편광자 초점 타원계측기
US7889340B1 (en) * 2008-03-05 2011-02-15 Kla-Tencor Corporation Normal incidence ellipsometer with complementary waveplate rotating compensators
CN102269858A (zh) * 2010-06-02 2011-12-07 北京智朗芯光科技有限公司 自动聚焦系统和自动聚焦方法
US8427645B2 (en) * 2011-01-10 2013-04-23 Nanometrics Incorporated Mueller matrix spectroscopy using chiroptic
US9404872B1 (en) * 2011-06-29 2016-08-02 Kla-Tencor Corporation Selectably configurable multiple mode spectroscopic ellipsometry
KR20130019495A (ko) * 2011-08-17 2013-02-27 한국표준과학연구원 광소자-회전형 타원계측기 및 이를 이용한 시료의 물성 측정 방법
US9116103B2 (en) * 2013-01-14 2015-08-25 Kla-Tencor Corporation Multiple angles of incidence semiconductor metrology systems and methods
CN103134592B (zh) * 2013-01-31 2015-11-04 华中科技大学 一种透射式全穆勒矩阵光谱椭偏仪及其测量方法
DE102014119228A1 (de) 2014-12-19 2016-06-23 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Anordnung zur Erfassung von Reflexions-Anisotropie
KR101698022B1 (ko) 2015-03-13 2017-02-01 한국표준과학연구원 무색수차 광소자-회전형 타원계측기 및 이를 이용한 시편의 뮬러-행렬 측정 방법
US9860466B2 (en) * 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
CN106595521B (zh) * 2016-12-12 2019-12-13 武汉颐光科技有限公司 基于液晶调相的垂直物镜式穆勒矩阵成像椭偏仪

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070091311A1 (en) 2004-05-06 2007-04-26 Aspnes David E Normal incidence rotating compensator ellipsometer
KR101590389B1 (ko) 2014-12-16 2016-02-02 한국표준과학연구원 광소자 회전형 분광타원계측기 및 광소자 회전형 분광타원계측기의 측정 정밀도 예측 방법, 이를 구현하기 위한 프로그램이 저장된 기록매체 및 이를 구현하기 위해 매체에 저장된 컴퓨터프로그램

Also Published As

Publication number Publication date
JP7316355B2 (ja) 2023-07-27
US11493433B2 (en) 2022-11-08
US20210181090A1 (en) 2021-06-17
CN112469987B (zh) 2024-09-13
KR20200007267A (ko) 2020-01-22
EP3798608A4 (en) 2022-02-09
CN112469987A (zh) 2021-03-09
JP2021529328A (ja) 2021-10-28
WO2020013517A1 (ko) 2020-01-16
EP3798608A1 (en) 2021-03-31

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