JP4437886B2 - 光学部材用石英ガラスブランクおよびその使用 - Google Patents

光学部材用石英ガラスブランクおよびその使用 Download PDF

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Publication number
JP4437886B2
JP4437886B2 JP2002353980A JP2002353980A JP4437886B2 JP 4437886 B2 JP4437886 B2 JP 4437886B2 JP 2002353980 A JP2002353980 A JP 2002353980A JP 2002353980 A JP2002353980 A JP 2002353980A JP 4437886 B2 JP4437886 B2 JP 4437886B2
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Japan
Prior art keywords
quartz glass
ppm
content
glass blank
molecules
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002353980A
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English (en)
Japanese (ja)
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JP2003183037A5 (https=
JP2003183037A (ja
Inventor
ブルーノ・イェビング
ボド・キューン
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Heraeus Quarzglas GmbH and Co KG
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Heraeus Quarzglas GmbH and Co KG
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Publication of JP2003183037A5 publication Critical patent/JP2003183037A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2002353980A 2001-12-06 2002-12-05 光学部材用石英ガラスブランクおよびその使用 Expired - Lifetime JP4437886B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10159959A DE10159959A1 (de) 2001-12-06 2001-12-06 Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10159959.5 2001-12-06

Publications (3)

Publication Number Publication Date
JP2003183037A JP2003183037A (ja) 2003-07-03
JP2003183037A5 JP2003183037A5 (https=) 2005-10-27
JP4437886B2 true JP4437886B2 (ja) 2010-03-24

Family

ID=7708264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002353980A Expired - Lifetime JP4437886B2 (ja) 2001-12-06 2002-12-05 光学部材用石英ガラスブランクおよびその使用

Country Status (6)

Country Link
US (1) US7064093B2 (https=)
EP (1) EP1327613B1 (https=)
JP (1) JP4437886B2 (https=)
KR (1) KR20030047751A (https=)
AT (1) ATE278642T1 (https=)
DE (2) DE10159959A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4403082B2 (ja) * 2002-11-29 2010-01-20 信越石英株式会社 合成石英ガラスの製造方法及び合成石英ガラス体
US6992753B2 (en) 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
DE102004018887B4 (de) * 2004-04-15 2009-04-16 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils
KR100677382B1 (ko) * 2004-11-09 2007-02-02 엘지전자 주식회사 휴대단말기에서의 화면전환 방법
DE102005017752B4 (de) 2005-04-15 2016-08-04 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US8176752B2 (en) * 2009-07-23 2012-05-15 Corning Incorporated Silica glass with saturated induced absorption and method of making
DE102011120412B4 (de) * 2011-12-08 2018-03-08 Heraeus Quarzglas Gmbh & Co. Kg Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor
JP6250920B2 (ja) * 2012-08-21 2017-12-20 岩崎電気株式会社 水処理方法
DE102012109209B4 (de) * 2012-09-28 2017-05-11 Osram Oled Gmbh Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement
DE102013215292A1 (de) 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
US5364433A (en) * 1991-06-29 1994-11-15 Shin-Etsu Quartz Products Company Limited Optical member of synthetic quartz glass for excimer lasers and method for producing same
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JP2879500B2 (ja) * 1992-06-29 1999-04-05 信越石英株式会社 エキシマレーザー用合成石英ガラス光学部材及びその製造方法
JP3194667B2 (ja) 1994-03-26 2001-07-30 信越石英株式会社 光学用合成石英ガラス成形体及びその製造方法
US6087283A (en) * 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
ATE246154T1 (de) 1998-01-30 2003-08-15 Asahi Glass Co Ltd Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben
DE19962451C1 (de) * 1999-12-22 2001-08-30 Heraeus Quarzglas Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat
DE10159961C2 (de) * 2001-12-06 2003-12-24 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben

Also Published As

Publication number Publication date
EP1327613A1 (de) 2003-07-16
ATE278642T1 (de) 2004-10-15
DE10159959A1 (de) 2003-06-26
US20030119652A1 (en) 2003-06-26
US7064093B2 (en) 2006-06-20
KR20030047751A (ko) 2003-06-18
JP2003183037A (ja) 2003-07-03
EP1327613B1 (de) 2004-10-06
DE50201208D1 (de) 2004-11-11

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