JP2003183037A5 - - Google Patents
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- Publication number
- JP2003183037A5 JP2003183037A5 JP2002353980A JP2002353980A JP2003183037A5 JP 2003183037 A5 JP2003183037 A5 JP 2003183037A5 JP 2002353980 A JP2002353980 A JP 2002353980A JP 2002353980 A JP2002353980 A JP 2002353980A JP 2003183037 A5 JP2003183037 A5 JP 2003183037A5
- Authority
- JP
- Japan
- Prior art keywords
- ppm
- quartz glass
- content
- glass blank
- molecules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10159959A DE10159959A1 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| DE10159959.5 | 2001-12-06 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003183037A JP2003183037A (ja) | 2003-07-03 |
| JP2003183037A5 true JP2003183037A5 (https=) | 2005-10-27 |
| JP4437886B2 JP4437886B2 (ja) | 2010-03-24 |
Family
ID=7708264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002353980A Expired - Lifetime JP4437886B2 (ja) | 2001-12-06 | 2002-12-05 | 光学部材用石英ガラスブランクおよびその使用 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7064093B2 (https=) |
| EP (1) | EP1327613B1 (https=) |
| JP (1) | JP4437886B2 (https=) |
| KR (1) | KR20030047751A (https=) |
| AT (1) | ATE278642T1 (https=) |
| DE (2) | DE10159959A1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4403082B2 (ja) * | 2002-11-29 | 2010-01-20 | 信越石英株式会社 | 合成石英ガラスの製造方法及び合成石英ガラス体 |
| US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
| DE102004017031B4 (de) * | 2004-04-02 | 2008-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| DE102004018887B4 (de) * | 2004-04-15 | 2009-04-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils |
| KR100677382B1 (ko) * | 2004-11-09 | 2007-02-02 | 엘지전자 주식회사 | 휴대단말기에서의 화면전환 방법 |
| DE102005017752B4 (de) | 2005-04-15 | 2016-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| US8176752B2 (en) * | 2009-07-23 | 2012-05-15 | Corning Incorporated | Silica glass with saturated induced absorption and method of making |
| DE102011120412B4 (de) * | 2011-12-08 | 2018-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor |
| JP6250920B2 (ja) * | 2012-08-21 | 2017-12-20 | 岩崎電気株式会社 | 水処理方法 |
| DE102012109209B4 (de) * | 2012-09-28 | 2017-05-11 | Osram Oled Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
| DE102013215292A1 (de) | 2013-08-02 | 2015-02-05 | Carl Zeiss Smt Gmbh | Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0401845B2 (en) * | 1989-06-09 | 2001-04-11 | Heraeus Quarzglas GmbH & Co. KG | Optical members and blanks of synthetic silica glass and method for their production |
| US5364433A (en) * | 1991-06-29 | 1994-11-15 | Shin-Etsu Quartz Products Company Limited | Optical member of synthetic quartz glass for excimer lasers and method for producing same |
| US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| JP2879500B2 (ja) * | 1992-06-29 | 1999-04-05 | 信越石英株式会社 | エキシマレーザー用合成石英ガラス光学部材及びその製造方法 |
| JP3194667B2 (ja) | 1994-03-26 | 2001-07-30 | 信越石英株式会社 | 光学用合成石英ガラス成形体及びその製造方法 |
| US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
| US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
| DE69816758T2 (de) * | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| ATE246154T1 (de) | 1998-01-30 | 2003-08-15 | Asahi Glass Co Ltd | Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben |
| DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE10159961C2 (de) * | 2001-12-06 | 2003-12-24 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
-
2001
- 2001-12-06 DE DE10159959A patent/DE10159959A1/de not_active Withdrawn
-
2002
- 2002-12-04 AT AT02027127T patent/ATE278642T1/de not_active IP Right Cessation
- 2002-12-04 EP EP02027127A patent/EP1327613B1/de not_active Expired - Lifetime
- 2002-12-04 DE DE50201208T patent/DE50201208D1/de not_active Expired - Lifetime
- 2002-12-04 KR KR1020020076621A patent/KR20030047751A/ko not_active Withdrawn
- 2002-12-05 JP JP2002353980A patent/JP4437886B2/ja not_active Expired - Lifetime
- 2002-12-05 US US10/310,276 patent/US7064093B2/en not_active Expired - Lifetime
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