KR20030047751A - 광학 부재용 석영 유리 블랭크 및 그 이용 방법 - Google Patents

광학 부재용 석영 유리 블랭크 및 그 이용 방법 Download PDF

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Publication number
KR20030047751A
KR20030047751A KR1020020076621A KR20020076621A KR20030047751A KR 20030047751 A KR20030047751 A KR 20030047751A KR 1020020076621 A KR1020020076621 A KR 1020020076621A KR 20020076621 A KR20020076621 A KR 20020076621A KR 20030047751 A KR20030047751 A KR 20030047751A
Authority
KR
South Korea
Prior art keywords
quartz glass
ppm
content
glass blank
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020020076621A
Other languages
English (en)
Korean (ko)
Inventor
위빙브르노
큔보도
Original Assignee
신에쯔 세끼에이 가부시키가이샤
헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신에쯔 세끼에이 가부시키가이샤, 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 filed Critical 신에쯔 세끼에이 가부시키가이샤
Publication of KR20030047751A publication Critical patent/KR20030047751A/ko
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/07Impurity concentration specified
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/08Doped silica-based glasses containing boron or halide
    • C03C2201/11Doped silica-based glasses containing boron or halide containing chlorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/20Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/20Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/40Gas-phase processes
    • C03C2203/42Gas-phase processes using silicon halides as starting materials
    • C03C2203/44Gas-phase processes using silicon halides as starting materials chlorine containing
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/50After-treatment
    • C03C2203/52Heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
KR1020020076621A 2001-12-06 2002-12-04 광학 부재용 석영 유리 블랭크 및 그 이용 방법 Withdrawn KR20030047751A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10159959A DE10159959A1 (de) 2001-12-06 2001-12-06 Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10159959.5 2001-12-06

Publications (1)

Publication Number Publication Date
KR20030047751A true KR20030047751A (ko) 2003-06-18

Family

ID=7708264

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020076621A Withdrawn KR20030047751A (ko) 2001-12-06 2002-12-04 광학 부재용 석영 유리 블랭크 및 그 이용 방법

Country Status (6)

Country Link
US (1) US7064093B2 (https=)
EP (1) EP1327613B1 (https=)
JP (1) JP4437886B2 (https=)
KR (1) KR20030047751A (https=)
AT (1) ATE278642T1 (https=)
DE (2) DE10159959A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4403082B2 (ja) * 2002-11-29 2010-01-20 信越石英株式会社 合成石英ガラスの製造方法及び合成石英ガラス体
US6992753B2 (en) 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
DE102004018887B4 (de) * 2004-04-15 2009-04-16 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils
KR100677382B1 (ko) * 2004-11-09 2007-02-02 엘지전자 주식회사 휴대단말기에서의 화면전환 방법
DE102005017752B4 (de) 2005-04-15 2016-08-04 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US8176752B2 (en) * 2009-07-23 2012-05-15 Corning Incorporated Silica glass with saturated induced absorption and method of making
DE102011120412B4 (de) * 2011-12-08 2018-03-08 Heraeus Quarzglas Gmbh & Co. Kg Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor
JP6250920B2 (ja) * 2012-08-21 2017-12-20 岩崎電気株式会社 水処理方法
DE102012109209B4 (de) * 2012-09-28 2017-05-11 Osram Oled Gmbh Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement
DE102013215292A1 (de) 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
US5364433A (en) * 1991-06-29 1994-11-15 Shin-Etsu Quartz Products Company Limited Optical member of synthetic quartz glass for excimer lasers and method for producing same
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JP2879500B2 (ja) * 1992-06-29 1999-04-05 信越石英株式会社 エキシマレーザー用合成石英ガラス光学部材及びその製造方法
JP3194667B2 (ja) 1994-03-26 2001-07-30 信越石英株式会社 光学用合成石英ガラス成形体及びその製造方法
US6087283A (en) * 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
ATE246154T1 (de) 1998-01-30 2003-08-15 Asahi Glass Co Ltd Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben
DE19962451C1 (de) * 1999-12-22 2001-08-30 Heraeus Quarzglas Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat
DE10159961C2 (de) * 2001-12-06 2003-12-24 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben

Also Published As

Publication number Publication date
EP1327613A1 (de) 2003-07-16
ATE278642T1 (de) 2004-10-15
DE10159959A1 (de) 2003-06-26
US20030119652A1 (en) 2003-06-26
JP4437886B2 (ja) 2010-03-24
US7064093B2 (en) 2006-06-20
JP2003183037A (ja) 2003-07-03
EP1327613B1 (de) 2004-10-06
DE50201208D1 (de) 2004-11-11

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20021204

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid