DE10159959A1 - Quarzglasrohling für ein optisches Bauteil und Verwendung desselben - Google Patents
Quarzglasrohling für ein optisches Bauteil und Verwendung desselbenInfo
- Publication number
- DE10159959A1 DE10159959A1 DE10159959A DE10159959A DE10159959A1 DE 10159959 A1 DE10159959 A1 DE 10159959A1 DE 10159959 A DE10159959 A DE 10159959A DE 10159959 A DE10159959 A DE 10159959A DE 10159959 A1 DE10159959 A1 DE 10159959A1
- Authority
- DE
- Germany
- Prior art keywords
- quartz glass
- ppm
- content
- weight
- molecules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 80
- 230000007547 defect Effects 0.000 title claims abstract description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 9
- 239000011521 glass Substances 0.000 title claims abstract description 9
- 239000001301 oxygen Substances 0.000 title claims abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 9
- 230000005855 radiation Effects 0.000 title claims description 43
- 230000003287 optical effect Effects 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000001393 microlithography Methods 0.000 title claims description 7
- 239000001257 hydrogen Substances 0.000 claims abstract description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 25
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000000460 chlorine Substances 0.000 claims abstract description 18
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 16
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000013461 design Methods 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 description 24
- 238000000034 method Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 7
- 239000004071 soot Substances 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005056 compaction Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- 206010021143 Hypoxia Diseases 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000035876 healing Effects 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000007847 structural defect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 238000003841 Raman measurement Methods 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000004335 scaling law Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- -1 siloxanes Chemical class 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10159959A DE10159959A1 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| AT02027127T ATE278642T1 (de) | 2001-12-06 | 2002-12-04 | Quarzglasrohling für ein optisches bauteil und verwendung desselben |
| KR1020020076621A KR20030047751A (ko) | 2001-12-06 | 2002-12-04 | 광학 부재용 석영 유리 블랭크 및 그 이용 방법 |
| DE50201208T DE50201208D1 (de) | 2001-12-06 | 2002-12-04 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| EP02027127A EP1327613B1 (de) | 2001-12-06 | 2002-12-04 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| JP2002353980A JP4437886B2 (ja) | 2001-12-06 | 2002-12-05 | 光学部材用石英ガラスブランクおよびその使用 |
| US10/310,276 US7064093B2 (en) | 2001-12-06 | 2002-12-05 | Quartz glass blank for an optical component and its utilization |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10159959A DE10159959A1 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10159959A1 true DE10159959A1 (de) | 2003-06-26 |
Family
ID=7708264
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10159959A Withdrawn DE10159959A1 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| DE50201208T Expired - Lifetime DE50201208D1 (de) | 2001-12-06 | 2002-12-04 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE50201208T Expired - Lifetime DE50201208D1 (de) | 2001-12-06 | 2002-12-04 | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7064093B2 (https=) |
| EP (1) | EP1327613B1 (https=) |
| JP (1) | JP4437886B2 (https=) |
| KR (1) | KR20030047751A (https=) |
| AT (1) | ATE278642T1 (https=) |
| DE (2) | DE10159959A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
| US7501367B2 (en) | 2005-04-15 | 2009-03-10 | Heraeus Quarzglas Gmbh & Co. Kg | Optical component of quartz glass, method for producing said component, and method for exposing a substrate |
| DE102011120412A1 (de) * | 2011-12-08 | 2013-06-13 | Heraeus Quarzglas Gmbh & Co. Kg | Excimerlampe mit einer Emissionswellenlänge von 172 nm |
| DE102012109209B4 (de) * | 2012-09-28 | 2017-05-11 | Osram Oled Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4403082B2 (ja) * | 2002-11-29 | 2010-01-20 | 信越石英株式会社 | 合成石英ガラスの製造方法及び合成石英ガラス体 |
| DE102004017031B4 (de) * | 2004-04-02 | 2008-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| DE102004018887B4 (de) * | 2004-04-15 | 2009-04-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils |
| KR100677382B1 (ko) * | 2004-11-09 | 2007-02-02 | 엘지전자 주식회사 | 휴대단말기에서의 화면전환 방법 |
| US8176752B2 (en) * | 2009-07-23 | 2012-05-15 | Corning Incorporated | Silica glass with saturated induced absorption and method of making |
| JP6250920B2 (ja) * | 2012-08-21 | 2017-12-20 | 岩崎電気株式会社 | 水処理方法 |
| DE102013215292A1 (de) | 2013-08-02 | 2015-02-05 | Carl Zeiss Smt Gmbh | Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0401845A2 (en) * | 1989-06-09 | 1990-12-12 | Heraeus Quarzglas GmbH | Optical members and blanks of synthetic silica glass and method for their production |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5364433A (en) * | 1991-06-29 | 1994-11-15 | Shin-Etsu Quartz Products Company Limited | Optical member of synthetic quartz glass for excimer lasers and method for producing same |
| US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| JP2879500B2 (ja) * | 1992-06-29 | 1999-04-05 | 信越石英株式会社 | エキシマレーザー用合成石英ガラス光学部材及びその製造方法 |
| JP3194667B2 (ja) | 1994-03-26 | 2001-07-30 | 信越石英株式会社 | 光学用合成石英ガラス成形体及びその製造方法 |
| US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
| US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
| DE69816758T2 (de) * | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| ATE246154T1 (de) | 1998-01-30 | 2003-08-15 | Asahi Glass Co Ltd | Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben |
| DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE10159961C2 (de) * | 2001-12-06 | 2003-12-24 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
-
2001
- 2001-12-06 DE DE10159959A patent/DE10159959A1/de not_active Withdrawn
-
2002
- 2002-12-04 AT AT02027127T patent/ATE278642T1/de not_active IP Right Cessation
- 2002-12-04 EP EP02027127A patent/EP1327613B1/de not_active Expired - Lifetime
- 2002-12-04 DE DE50201208T patent/DE50201208D1/de not_active Expired - Lifetime
- 2002-12-04 KR KR1020020076621A patent/KR20030047751A/ko not_active Withdrawn
- 2002-12-05 JP JP2002353980A patent/JP4437886B2/ja not_active Expired - Lifetime
- 2002-12-05 US US10/310,276 patent/US7064093B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0401845A2 (en) * | 1989-06-09 | 1990-12-12 | Heraeus Quarzglas GmbH | Optical members and blanks of synthetic silica glass and method for their production |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
| US7501367B2 (en) | 2005-04-15 | 2009-03-10 | Heraeus Quarzglas Gmbh & Co. Kg | Optical component of quartz glass, method for producing said component, and method for exposing a substrate |
| DE102011120412A1 (de) * | 2011-12-08 | 2013-06-13 | Heraeus Quarzglas Gmbh & Co. Kg | Excimerlampe mit einer Emissionswellenlänge von 172 nm |
| DE102011120412B4 (de) | 2011-12-08 | 2018-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor |
| DE102012109209B4 (de) * | 2012-09-28 | 2017-05-11 | Osram Oled Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1327613A1 (de) | 2003-07-16 |
| ATE278642T1 (de) | 2004-10-15 |
| US20030119652A1 (en) | 2003-06-26 |
| JP4437886B2 (ja) | 2010-03-24 |
| US7064093B2 (en) | 2006-06-20 |
| KR20030047751A (ko) | 2003-06-18 |
| JP2003183037A (ja) | 2003-07-03 |
| EP1327613B1 (de) | 2004-10-06 |
| DE50201208D1 (de) | 2004-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69501523T2 (de) | Verfahren zur Herstellung von Silikaglas für die Anwendung mit Licht in einem Vakuum-Ultraviolett-Wellenlangebereich, und mit diesem Verfahren hergestelltes Silikaglas und optisches Element | |
| DE602004007637T3 (de) | TiO2-enthaltendes Siliciumdioxidglas und Verfahren zu dessen Herstellung | |
| DE60015684T2 (de) | Optisches Element aus Quarzglas zum Durchlassen von Fluor-Excimer-Laserstrahlung und Verfahren zu seiner Herstellung | |
| DE102013101687B3 (de) | Optisches Bauteil aus Quarzglas zur Verwendung in der ArF-Excimerlaser-Lithographie sowie Verfahren zur Herstellung des Bauteils | |
| DE69118101T2 (de) | Optisches Bauteil aus hochreinem und transparentem, synthetischem Quarzglas und Verfahren zu seiner Herstellung und sein Rohling | |
| DE69015453T3 (de) | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung. | |
| DE60033481T2 (de) | Optischer Werkstoff aus Quarzglas für Excimer Laser und Excimer Lampe, und Verfahren zu dessen Herstellung | |
| DE112005003308B4 (de) | Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben | |
| EP1327612B1 (de) | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben | |
| DE10159961C2 (de) | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben | |
| EP1982963B1 (de) | Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Rohling zur Herstellung des Bauteils | |
| EP1586544B1 (de) | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben | |
| DE102005062916A1 (de) | Synthetisches Kieselglas mit hoher Transmission und Verfahren zu seiner Herstellung | |
| DE102005017752B4 (de) | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben | |
| EP1327613B1 (de) | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben | |
| DE102007041151A1 (de) | F-dotiertes Quarzglas und Verfahren zur Herstellung desselben | |
| EP1101741B1 (de) | Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung | |
| EP1590303A1 (de) | Verfahren zur herstellung von synthetischem quarzglas | |
| DE69909983T2 (de) | Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben | |
| DE10138046A1 (de) | Fluorhaltiges Glas | |
| DE19850736A1 (de) | Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases und einer optischen Faser | |
| DE19841932A1 (de) | Optisches Bauteil aus Quarzglas und Verfahren für seine Herstellung | |
| DE10005051B4 (de) | Quarzglaskörper für ein optisches Bauteil, Verfahren zu seiner Herstellung und seine Verwendung | |
| DE102010052685A1 (de) | Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper | |
| DE102004061851A1 (de) | Optisches Material aus synthetischem Kieselsäureglas mit hoher Beständigkeit gegen eine optisch induzierte Brechungsindexänderung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| 8130 | Withdrawal |