JP4428792B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4428792B2
JP4428792B2 JP2000060269A JP2000060269A JP4428792B2 JP 4428792 B2 JP4428792 B2 JP 4428792B2 JP 2000060269 A JP2000060269 A JP 2000060269A JP 2000060269 A JP2000060269 A JP 2000060269A JP 4428792 B2 JP4428792 B2 JP 4428792B2
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JP
Japan
Prior art keywords
substrate
exposure apparatus
chuck
glass substrate
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000060269A
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English (en)
Japanese (ja)
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JP2001249462A (ja
JP2001249462A5 (enExample
Inventor
毅 滝沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000060269A priority Critical patent/JP4428792B2/ja
Publication of JP2001249462A publication Critical patent/JP2001249462A/ja
Publication of JP2001249462A5 publication Critical patent/JP2001249462A5/ja
Application granted granted Critical
Publication of JP4428792B2 publication Critical patent/JP4428792B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000060269A 2000-03-06 2000-03-06 露光装置 Expired - Fee Related JP4428792B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000060269A JP4428792B2 (ja) 2000-03-06 2000-03-06 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000060269A JP4428792B2 (ja) 2000-03-06 2000-03-06 露光装置

Publications (3)

Publication Number Publication Date
JP2001249462A JP2001249462A (ja) 2001-09-14
JP2001249462A5 JP2001249462A5 (enExample) 2007-04-05
JP4428792B2 true JP4428792B2 (ja) 2010-03-10

Family

ID=18580611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000060269A Expired - Fee Related JP4428792B2 (ja) 2000-03-06 2000-03-06 露光装置

Country Status (1)

Country Link
JP (1) JP4428792B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4594745B2 (ja) * 2005-01-14 2010-12-08 パナソニック株式会社 反射防止構造体を有する部材の製造方法
TWI452437B (zh) * 2006-11-27 2014-09-11 尼康股份有限公司 An exposure method, a pattern forming method, and an exposure apparatus, and an element manufacturing method
JP5542456B2 (ja) 2010-01-18 2014-07-09 凸版印刷株式会社 カラーフィルタ基板の露光方法
JP5549233B2 (ja) * 2010-01-18 2014-07-16 凸版印刷株式会社 カラーフィルタ基板の露光方法

Also Published As

Publication number Publication date
JP2001249462A (ja) 2001-09-14

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