JP4427792B2 - 磁気記録媒体用Ｃｏ合金ターゲット材 - Google Patents
磁気記録媒体用Ｃｏ合金ターゲット材 Download PDFInfo
- Publication number
- JP4427792B2 JP4427792B2 JP2004221649A JP2004221649A JP4427792B2 JP 4427792 B2 JP4427792 B2 JP 4427792B2 JP 2004221649 A JP2004221649 A JP 2004221649A JP 2004221649 A JP2004221649 A JP 2004221649A JP 4427792 B2 JP4427792 B2 JP 4427792B2
- Authority
- JP
- Japan
- Prior art keywords
- phase
- target material
- alloy
- magnetic recording
- εco
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013077 target material Substances 0.000 title claims description 50
- 229910000531 Co alloy Inorganic materials 0.000 title claims description 39
- 229910052758 niobium Inorganic materials 0.000 claims description 12
- 229910052721 tungsten Inorganic materials 0.000 claims description 12
- 229910052750 molybdenum Inorganic materials 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000012535 impurity Substances 0.000 claims description 2
- 239000012071 phase Substances 0.000 description 73
- 239000000843 powder Substances 0.000 description 18
- 229910000765 intermetallic Inorganic materials 0.000 description 16
- 239000000203 mixture Substances 0.000 description 13
- 239000002994 raw material Substances 0.000 description 13
- 239000003870 refractory metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 239000002184 metal Substances 0.000 description 9
- 229910052715 tantalum Inorganic materials 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 229910000943 NiAl Inorganic materials 0.000 description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000001513 hot isostatic pressing Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000013081 microcrystal Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910004356 Ti Raw Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004221649A JP4427792B2 (ja) | 2004-07-29 | 2004-07-29 | 磁気記録媒体用Ｃｏ合金ターゲット材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004221649A JP4427792B2 (ja) | 2004-07-29 | 2004-07-29 | 磁気記録媒体用Ｃｏ合金ターゲット材 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006037192A JP2006037192A (ja) | 2006-02-09 |
| JP2006037192A5 JP2006037192A5 (enExample) | 2007-07-26 |
| JP4427792B2 true JP4427792B2 (ja) | 2010-03-10 |
Family
ID=35902499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004221649A Expired - Lifetime JP4427792B2 (ja) | 2004-07-29 | 2004-07-29 | 磁気記録媒体用Ｃｏ合金ターゲット材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4427792B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5248000B2 (ja) * | 2006-09-11 | 2013-07-24 | 山陽特殊製鋼株式会社 | ＣｏＷ系ターゲット材およびその製造方法 |
| US20080170959A1 (en) * | 2007-01-11 | 2008-07-17 | Heraeus Incorporated | Full density Co-W magnetic sputter targets |
| JP2015193909A (ja) * | 2014-03-25 | 2015-11-05 | Jx日鉱日石金属株式会社 | スパッタリングターゲット及びその製造方法並びにスパッタリング法で形成した膜 |
| WO2025229801A1 (ja) * | 2024-04-30 | 2025-11-06 | Ｊｘ金属株式会社 | スパッタ用部材 |
-
2004
- 2004-07-29 JP JP2004221649A patent/JP4427792B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006037192A (ja) | 2006-02-09 |
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