JP4424030B2 - 希土類磁石、その製造方法、及び多層体の製造方法 - Google Patents
希土類磁石、その製造方法、及び多層体の製造方法 Download PDFInfo
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Description
さらに、本発明の希土類磁石の製造方法は、希土類元素を含有する磁石素体の表面に固体粒子又は粒子ビームを衝突させる衝突工程と、磁石素体の衝突工程後の表面上に樹脂を構成材料とする保護層を形成する保護層形成工程とを備え、衝突工程において、磁石素体の表面付近を変形させて非晶質層を形成するように、固体粒子又は粒子ビームを衝突させ、保護層を、ウェットプロセスにより形成することを特徴としてもよい。
磁石素体10は、R、鉄(Fe)及びホウ素(B)を含有するものである。Rは1種以上の希土類元素を示すものであり、具体的には、長周期型周期表の3族に属するスカンジウム(Sc)、イットリウム(Y)及びランタノイドからなる群より選ばれる1種以上の元素を示す。ここで、ランタノイドは、ランタン(La)、セリウム(Ce)、プラセオジム(Pr)、ネオジム(Nd)、サマリウム(Sm)、ユウロピウム(Eu)、ガドリニウム(Gd)、テルビウム(Tb)、ジスプロシウム(Dy)、ホルミウム(Ho)、エルビウム(Er)、ツリウム(Tm)、イッテルビウム(Yb)及びルテチウム(Lu)を指す。
非晶質層20は、R、鉄(Fe)及びホウ素(B)を含有するものであり、磁石素体10の構成材料と同様のものを挙げることができる。ただし、磁石素体10は結晶構造で構成されるのに対し、非晶質層20は非晶質構造で構成されている。特に、非晶質層20は上述の磁石素体10について説明した組成比と実質的に同様であると好ましい。そのような非晶質層20は磁石素体10と強固に結合し、境界面での歪み等を防止することができる。すなわち、非晶質層20は、磁石素体10の結晶構造を非晶質構造に変換したものであると好ましい。
保護層30は、非晶質層20の表面上に形成されたものであり、その構成材料としては、一般の希土類磁石の保護層として用いることができる材料であれば、特に限定されない。
まず、粉末冶金法によって作製した14Nd−1Dy−7B−78Fe(数字は原子比を表す。)の組成をもつ焼結体に対し、Arガス雰囲気中で600℃、2時間熱処理を施した。次いで、熱処理後の焼結体を56×40×8(mm)の大きさに切断加工し、さらにバレル研磨処理により面取りを行って磁石素体を得た。
磁石素体を十分に水洗するまでは実施例1と同様にして、磁石素体の作製及びその表面の洗浄を行った。
プラズマ処理室にAr+N2(Ar=15scc/分、N2=20scc/分)ガスを導入した。また、高周波電源の高周波数は13.56MHzにし、高周波電源による出力を400Wとした。これにより、200Vのセルフバイアスが発生した。
磁石素体を十分に水洗するまでは実施例1と同様にして、磁石素体の作製及びその表面の洗浄を行った。
磁石素体を十分に水洗するまでは実施例1と同様にして、磁石素体の作製及びその表面の洗浄を行った。
まず、実施例1〜3及び比較例1の希土類磁石を、各層の積層方向に切断した。そして、この切断により露出した断面について、TEM観察を行った。その結果、実施例1〜3の希土類磁石について、希土類磁石の表面側から中心付近までの間に、3つの層(表面側から第1層、第2層、第3層とする)が確認された。また、そのうちの第3層では、粒子の存在が確認された。
得られた実施例1〜3及び比較例1の希土類磁石について、JIS−C−0023−1989による24時間の塩水噴霧試験を行い、耐食性を評価した。
Claims (5)
- 希土類元素を含有する磁石素体と、
その磁石素体の表面上に形成された実質的な非晶質層と、
その非晶質層の表面上に形成された保護層と、を備え、
前記非晶質層は、前記磁石素体に含有される磁石材料の主成分元素と同一の元素を含有し、
前記非晶質層の前記保護層側の表面の算術平均粗さRaが、0.3〜1.5μmであり、
前記保護層が、アルミニウム層であることを特徴とする希土類磁石。 - 前記非晶質層に含有される前記元素の組成比が、前記磁石素体に含有される前記主成分元素の組成比と実質的に同一であることを特徴とする請求項1に記載の希土類磁石。
- 希土類元素を含有する磁石素体と、
前記磁石素体の表面に粒子ビームを衝突させて、前記磁石素体の前記表面付近を変質させて得られる実質的な非晶質層と、
その非晶質層の表面上に形成された保護層と、を備え、
前記非晶質層の前記保護層側の表面の算術平均粗さRaが、0.3〜1.5μmであり、
前記保護層が、アルミニウム層であることを特徴とする希土類磁石。 - 前記非晶質層が、前記磁石素体の表面に固体粒子又は粒子ビームを衝突させて、前記磁石素体の前記表面付近を変質させて得られるものであることを特徴とする請求項1又は2記載の希土類磁石。
- 希土類元素を含有する磁石素体の表面に粒子ビームを衝突させる衝突工程と、
前記磁石素体の前記衝突工程後の表面上に、保護層を形成する保護層形成工程と、を備え、
前記保護層が、アルミニウム層であり、
前記衝突工程において、前記磁石素体の表面付近を変形させて前記保護層側の表面の算術平均粗さRaが、0.3〜1.5μmである非晶質層を形成するように、粒子ビームを衝突させることを特徴とする希土類磁石の製造方法。
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