JP4421980B2 - 連続成膜装置 - Google Patents

連続成膜装置 Download PDF

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Publication number
JP4421980B2
JP4421980B2 JP2004261880A JP2004261880A JP4421980B2 JP 4421980 B2 JP4421980 B2 JP 4421980B2 JP 2004261880 A JP2004261880 A JP 2004261880A JP 2004261880 A JP2004261880 A JP 2004261880A JP 4421980 B2 JP4421980 B2 JP 4421980B2
Authority
JP
Japan
Prior art keywords
film forming
chamber
roll
end wall
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004261880A
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English (en)
Japanese (ja)
Other versions
JP2006077284A (ja
JP2006077284A5 (enExample
Inventor
利規 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP2004261880A priority Critical patent/JP4421980B2/ja
Priority to DE102005042762.6A priority patent/DE102005042762B4/de
Publication of JP2006077284A publication Critical patent/JP2006077284A/ja
Publication of JP2006077284A5 publication Critical patent/JP2006077284A5/ja
Application granted granted Critical
Publication of JP4421980B2 publication Critical patent/JP4421980B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2004261880A 2004-09-09 2004-09-09 連続成膜装置 Expired - Fee Related JP4421980B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004261880A JP4421980B2 (ja) 2004-09-09 2004-09-09 連続成膜装置
DE102005042762.6A DE102005042762B4 (de) 2004-09-09 2005-09-08 Vorrichtung zur kontinuierlichen Beschichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004261880A JP4421980B2 (ja) 2004-09-09 2004-09-09 連続成膜装置

Publications (3)

Publication Number Publication Date
JP2006077284A JP2006077284A (ja) 2006-03-23
JP2006077284A5 JP2006077284A5 (enExample) 2006-10-05
JP4421980B2 true JP4421980B2 (ja) 2010-02-24

Family

ID=36062337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004261880A Expired - Fee Related JP4421980B2 (ja) 2004-09-09 2004-09-09 連続成膜装置

Country Status (2)

Country Link
JP (1) JP4421980B2 (enExample)
DE (1) DE102005042762B4 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4573272B2 (ja) * 2006-07-26 2010-11-04 株式会社神戸製鋼所 連続成膜装置
DE102007009615A1 (de) 2007-02-26 2008-08-28 Leybold Optics Gmbh Anlage und Verfahren zur Vakuumbehandlung von bandförmigen Substraten
DE102008018396A1 (de) 2008-04-10 2009-10-15 Leybold Optics Gmbh Vakuum-Beschichtungsanlage
JP2010018828A (ja) * 2008-07-09 2010-01-28 Asahi Kasei E-Materials Corp 真空蒸着装置
JP5241383B2 (ja) 2008-08-27 2013-07-17 株式会社神戸製鋼所 連続成膜装置
JP5794519B2 (ja) * 2010-06-30 2015-10-14 国立大学法人富山大学 複合膜の成膜装置及び成膜方法
DE102012104013A1 (de) 2012-05-08 2013-11-14 Schmid Vacuum Technology Gmbh Hochvakuumanlage und Verfahren zum Evakuieren
JP5969953B2 (ja) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 成膜装置
DE102013105824B4 (de) * 2013-06-06 2017-07-13 Von Ardenne Gmbh Prozessanordnung und Verfahren zum Betreiben einer Prozessanordnung
JP2016191127A (ja) * 2015-03-31 2016-11-10 株式会社神戸製鋼所 隔壁構造体およびそれを備えた成膜装置
JP6408949B2 (ja) * 2015-03-31 2018-10-17 株式会社神戸製鋼所 成膜装置
CN110643969A (zh) * 2018-06-27 2020-01-03 北京铂阳顶荣光伏科技有限公司 一种真空蒸镀设备
DE102019007935B4 (de) 2019-11-14 2023-06-29 Elfolion Gmbh Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens
CN116770258A (zh) * 2021-07-29 2023-09-19 苏州道一至诚纳米材料技术有限公司 双面往复镀膜装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4223568C1 (de) * 1992-07-17 1993-11-18 Leybold Ag Verfahren zum Herstellen einer eine Al-Zn-Schicht aufweisenden Folienbahn, Vorrichtung zu seiner Durchführung und Folienbahn
JPH1036967A (ja) * 1996-07-24 1998-02-10 Teijin Ltd スパッタ装置
DE19832571A1 (de) * 1998-07-20 2000-01-27 Hauzer Ind Bv Mehrlagenschicht und Verfahren zu deren Herstellung
JP2001003168A (ja) * 1999-06-18 2001-01-09 Sony Corp 真空成膜装置
JP4568994B2 (ja) * 2000-12-04 2010-10-27 東洋紡績株式会社 ロールコーター式連続スパッタリング装置
JP2002339055A (ja) * 2001-03-15 2002-11-27 Sony Corp 薄膜形成装置

Also Published As

Publication number Publication date
DE102005042762A1 (de) 2006-04-06
DE102005042762B4 (de) 2016-10-20
JP2006077284A (ja) 2006-03-23

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