JP4413036B2 - 描画装置、描画データ生成装置、描画方法、および描画データ生成方法 - Google Patents

描画装置、描画データ生成装置、描画方法、および描画データ生成方法 Download PDF

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Publication number
JP4413036B2
JP4413036B2 JP2004049821A JP2004049821A JP4413036B2 JP 4413036 B2 JP4413036 B2 JP 4413036B2 JP 2004049821 A JP2004049821 A JP 2004049821A JP 2004049821 A JP2004049821 A JP 2004049821A JP 4413036 B2 JP4413036 B2 JP 4413036B2
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JP
Japan
Prior art keywords
data
head
relative movement
data generation
target surface
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Expired - Lifetime
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JP2004049821A
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English (en)
Japanese (ja)
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JP2005241834A5 (enExample
JP2005241834A (ja
Inventor
和成 関川
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Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
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Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2004049821A priority Critical patent/JP4413036B2/ja
Priority to TW094104461A priority patent/TWI363704B/zh
Priority to US11/064,087 priority patent/US7605941B2/en
Publication of JP2005241834A publication Critical patent/JP2005241834A/ja
Publication of JP2005241834A5 publication Critical patent/JP2005241834A5/ja
Application granted granted Critical
Publication of JP4413036B2 publication Critical patent/JP4413036B2/ja
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Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Accessory Devices And Overall Control Thereof (AREA)
  • Record Information Processing For Printing (AREA)
JP2004049821A 2004-02-25 2004-02-25 描画装置、描画データ生成装置、描画方法、および描画データ生成方法 Expired - Lifetime JP4413036B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004049821A JP4413036B2 (ja) 2004-02-25 2004-02-25 描画装置、描画データ生成装置、描画方法、および描画データ生成方法
TW094104461A TWI363704B (en) 2004-02-25 2005-02-16 Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations
US11/064,087 US7605941B2 (en) 2004-02-25 2005-02-24 Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004049821A JP4413036B2 (ja) 2004-02-25 2004-02-25 描画装置、描画データ生成装置、描画方法、および描画データ生成方法

Publications (3)

Publication Number Publication Date
JP2005241834A JP2005241834A (ja) 2005-09-08
JP2005241834A5 JP2005241834A5 (enExample) 2007-02-08
JP4413036B2 true JP4413036B2 (ja) 2010-02-10

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ID=34858274

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JP2004049821A Expired - Lifetime JP4413036B2 (ja) 2004-02-25 2004-02-25 描画装置、描画データ生成装置、描画方法、および描画データ生成方法

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US (1) US7605941B2 (enExample)
JP (1) JP4413036B2 (enExample)
TW (1) TWI363704B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102641407B1 (ko) * 2015-12-17 2024-02-28 가부시키가이샤 니콘 패턴 묘화 장치
JP6900284B2 (ja) * 2017-09-27 2021-07-07 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
JP2024119436A (ja) * 2023-02-22 2024-09-03 株式会社Ｓｃｒｅｅｎホールディングス 描画装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722064A (en) * 1984-11-27 1988-01-26 Fuji Xerox Co., Ltd. Drawing output unit
US5138561A (en) * 1989-11-01 1992-08-11 Xerox Corporation Computer graphics plotter control
EP0919909B1 (en) * 1996-03-04 2007-05-09 Canon Finetech Inc. Image processor
JPH10112579A (ja) 1996-10-07 1998-04-28 M S Tec:Kk レジスト露光方法及びその露光装置
JP2003050774A (ja) * 2001-08-08 2003-02-21 Matsushita Electric Ind Co Ltd データ処理装置およびデータ転送方法

Also Published As

Publication number Publication date
TWI363704B (en) 2012-05-11
US7605941B2 (en) 2009-10-20
US20050184990A1 (en) 2005-08-25
JP2005241834A (ja) 2005-09-08
TW200532752A (en) 2005-10-01

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