TWI363704B - Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations - Google Patents
Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations Download PDFInfo
- Publication number
- TWI363704B TWI363704B TW094104461A TW94104461A TWI363704B TW I363704 B TWI363704 B TW I363704B TW 094104461 A TW094104461 A TW 094104461A TW 94104461 A TW94104461 A TW 94104461A TW I363704 B TWI363704 B TW I363704B
- Authority
- TW
- Taiwan
- Prior art keywords
- data
- speed line
- calculating
- heads
- generating
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 41
- 238000013461 design Methods 0.000 claims description 37
- 238000004364 calculation method Methods 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 15
- 230000002123 temporal effect Effects 0.000 claims description 4
- 230000008859 change Effects 0.000 claims description 3
- 238000013507 mapping Methods 0.000 claims 3
- 230000001934 delay Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 31
- 238000004519 manufacturing process Methods 0.000 description 23
- 238000012545 processing Methods 0.000 description 23
- 238000010586 diagram Methods 0.000 description 17
- 238000012937 correction Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Accessory Devices And Overall Control Thereof (AREA)
- Record Information Processing For Printing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004049821A JP4413036B2 (ja) | 2004-02-25 | 2004-02-25 | 描画装置、描画データ生成装置、描画方法、および描画データ生成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200532752A TW200532752A (en) | 2005-10-01 |
| TWI363704B true TWI363704B (en) | 2012-05-11 |
Family
ID=34858274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094104461A TWI363704B (en) | 2004-02-25 | 2005-02-16 | Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7605941B2 (enExample) |
| JP (1) | JP4413036B2 (enExample) |
| TW (1) | TWI363704B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102641407B1 (ko) * | 2015-12-17 | 2024-02-28 | 가부시키가이샤 니콘 | 패턴 묘화 장치 |
| JP6900284B2 (ja) * | 2017-09-27 | 2021-07-07 | 株式会社Ｓｃｒｅｅｎホールディングス | 描画装置および描画方法 |
| JP2024119436A (ja) * | 2023-02-22 | 2024-09-03 | 株式会社Ｓｃｒｅｅｎホールディングス | 描画装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4722064A (en) * | 1984-11-27 | 1988-01-26 | Fuji Xerox Co., Ltd. | Drawing output unit |
| US5138561A (en) * | 1989-11-01 | 1992-08-11 | Xerox Corporation | Computer graphics plotter control |
| EP0919909B1 (en) * | 1996-03-04 | 2007-05-09 | Canon Finetech Inc. | Image processor |
| JPH10112579A (ja) | 1996-10-07 | 1998-04-28 | M S Tec:Kk | レジスト露光方法及びその露光装置 |
| JP2003050774A (ja) * | 2001-08-08 | 2003-02-21 | Matsushita Electric Ind Co Ltd | データ処理装置およびデータ転送方法 |
-
2004
- 2004-02-25 JP JP2004049821A patent/JP4413036B2/ja not_active Expired - Lifetime
-
2005
- 2005-02-16 TW TW094104461A patent/TWI363704B/zh not_active IP Right Cessation
- 2005-02-24 US US11/064,087 patent/US7605941B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US7605941B2 (en) | 2009-10-20 |
| JP4413036B2 (ja) | 2010-02-10 |
| US20050184990A1 (en) | 2005-08-25 |
| JP2005241834A (ja) | 2005-09-08 |
| TW200532752A (en) | 2005-10-01 |
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|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |