JP4411158B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4411158B2
JP4411158B2 JP2004221127A JP2004221127A JP4411158B2 JP 4411158 B2 JP4411158 B2 JP 4411158B2 JP 2004221127 A JP2004221127 A JP 2004221127A JP 2004221127 A JP2004221127 A JP 2004221127A JP 4411158 B2 JP4411158 B2 JP 4411158B2
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JP
Japan
Prior art keywords
original
reticle
holding
original holding
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004221127A
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English (en)
Japanese (ja)
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JP2006041302A5 (enExample
JP2006041302A (ja
Inventor
義一 宮島
康裕 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004221127A priority Critical patent/JP4411158B2/ja
Publication of JP2006041302A publication Critical patent/JP2006041302A/ja
Publication of JP2006041302A5 publication Critical patent/JP2006041302A5/ja
Application granted granted Critical
Publication of JP4411158B2 publication Critical patent/JP4411158B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004221127A 2004-07-29 2004-07-29 露光装置 Expired - Fee Related JP4411158B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004221127A JP4411158B2 (ja) 2004-07-29 2004-07-29 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004221127A JP4411158B2 (ja) 2004-07-29 2004-07-29 露光装置

Publications (3)

Publication Number Publication Date
JP2006041302A JP2006041302A (ja) 2006-02-09
JP2006041302A5 JP2006041302A5 (enExample) 2007-09-13
JP4411158B2 true JP4411158B2 (ja) 2010-02-10

Family

ID=35905956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004221127A Expired - Fee Related JP4411158B2 (ja) 2004-07-29 2004-07-29 露光装置

Country Status (1)

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JP (1) JP4411158B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101484435B1 (ko) 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI628698B (zh) 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7352438B2 (en) * 2006-02-14 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7733463B2 (en) * 2006-05-05 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2007135998A1 (ja) * 2006-05-24 2009-10-01 株式会社ニコン 保持装置及び露光装置
JP5013941B2 (ja) * 2007-04-19 2012-08-29 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL2020281A (en) 2017-02-10 2018-08-22 Asml Holding Nv Reticle clamping device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100753A (ja) * 1985-10-29 1987-05-11 Canon Inc 多点支持レチクルチヤツク
JP2750554B2 (ja) * 1992-03-31 1998-05-13 日本電信電話株式会社 真空吸着装置
JPH07136885A (ja) * 1993-06-30 1995-05-30 Toshiba Corp 真空チャック
JP3372127B2 (ja) * 1994-11-18 2003-01-27 日本電信電話株式会社 真空吸着装置
JP2001332480A (ja) * 2000-05-24 2001-11-30 Canon Inc 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法
JP4196675B2 (ja) * 2001-02-13 2008-12-17 株式会社ニコン 保持装置、保持方法、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
JP2006041302A (ja) 2006-02-09

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