JP4389158B2 - 高分子組成物およびその使用 - Google Patents

高分子組成物およびその使用 Download PDF

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Publication number
JP4389158B2
JP4389158B2 JP2003551180A JP2003551180A JP4389158B2 JP 4389158 B2 JP4389158 B2 JP 4389158B2 JP 2003551180 A JP2003551180 A JP 2003551180A JP 2003551180 A JP2003551180 A JP 2003551180A JP 4389158 B2 JP4389158 B2 JP 4389158B2
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Japan
Prior art keywords
polymer
group
branched
catalyst
bis
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Expired - Fee Related
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JP2003551180A
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English (en)
Japanese (ja)
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JP2005511833A5 (enExample
JP2005511833A (ja
Inventor
ラリー・エフ・ローデス
リチャード・ヴィカリ
リー・ジェイ・ラングスドーフ
アンドリュー・エイ・ソベック
エドウィン・ピー・ボイド
ブライアン・ベネット
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2003551180A 2001-12-12 2002-12-12 高分子組成物およびその使用 Expired - Fee Related JP4389158B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34052601P 2001-12-12 2001-12-12
PCT/IB2002/005795 WO2003050158A1 (en) 2001-12-12 2002-12-12 Polymeric compositions and uses therefor

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008088323A Division JP2008202055A (ja) 2008-03-28 2008-03-28 高分子組成物およびその使用

Publications (3)

Publication Number Publication Date
JP2005511833A JP2005511833A (ja) 2005-04-28
JP2005511833A5 JP2005511833A5 (enExample) 2009-08-13
JP4389158B2 true JP4389158B2 (ja) 2009-12-24

Family

ID=23333763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003551180A Expired - Fee Related JP4389158B2 (ja) 2001-12-12 2002-12-12 高分子組成物およびその使用

Country Status (9)

Country Link
US (2) US6949609B2 (enExample)
EP (1) EP1461373B1 (enExample)
JP (1) JP4389158B2 (enExample)
KR (1) KR100880313B1 (enExample)
CN (2) CN100413898C (enExample)
AT (1) ATE354599T1 (enExample)
AU (1) AU2002358247A1 (enExample)
DE (1) DE60218342T2 (enExample)
WO (1) WO2003050158A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442487B2 (en) * 2003-12-30 2008-10-28 Intel Corporation Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
US7101654B2 (en) * 2004-01-14 2006-09-05 Promerus Llc Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US20050192409A1 (en) * 2004-02-13 2005-09-01 Rhodes Larry F. Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
US7524594B2 (en) * 2004-07-07 2009-04-28 Promerus Llc Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
JP2006100563A (ja) * 2004-09-29 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
JP5017793B2 (ja) * 2005-04-06 2012-09-05 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
JP2006321912A (ja) * 2005-05-19 2006-11-30 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007002082A (ja) * 2005-06-23 2007-01-11 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007009044A (ja) * 2005-06-30 2007-01-18 Jsr Corp 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体
JP4956956B2 (ja) * 2005-10-12 2012-06-20 Ｊｓｒ株式会社 水素化触媒および水素化重合体の製造方法
JP4826242B2 (ja) 2005-12-12 2011-11-30 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
HUE042388T2 (hu) * 2007-06-07 2019-06-28 Albemarle Corp Adduktok, adduktok és oligomerek, vagy adduktok, oligomerek és kis molekulatömegû polimerek, és elõállításuk
EP2072536A1 (en) * 2007-12-17 2009-06-24 Lanxess Inc. Hydrogenation of diene-based polymers
JP2009256468A (ja) * 2008-04-16 2009-11-05 Asahi Glass Co Ltd 含フッ素重合体の製造方法
JP5051185B2 (ja) * 2009-06-16 2012-10-17 住友ベークライト株式会社 半導体装置および樹脂組成物
CN103874731B (zh) 2011-09-07 2017-02-15 微量化学公司 用于在低表面能基底上制造浮雕图案的环氧制剂和方法
US11635688B2 (en) * 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US8846295B2 (en) 2012-04-27 2014-09-30 International Business Machines Corporation Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
CN106068569B (zh) * 2014-03-12 2019-03-22 默克专利股份有限公司 有机电子组合物及其器件

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
GB9120773D0 (en) * 1991-10-01 1991-11-13 Ici Plc Modified olefin polymers
US5372912A (en) 1992-12-31 1994-12-13 International Business Machines Corporation Radiation-sensitive resist composition and process for its use
US5468819A (en) 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
US6294616B1 (en) * 1995-05-25 2001-09-25 B. F. Goodrich Company Blends and alloys of polycyclic polymers
JP3804138B2 (ja) * 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
WO1997033198A1 (en) * 1996-03-07 1997-09-12 The B.F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
US6294615B1 (en) * 1997-12-08 2001-09-25 Tosch Corporation Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer

Also Published As

Publication number Publication date
US20030176583A1 (en) 2003-09-18
AU2002358247A1 (en) 2003-06-23
EP1461373A1 (en) 2004-09-29
CN1789300A (zh) 2006-06-21
CN1561355A (zh) 2005-01-05
EP1461373B1 (en) 2007-02-21
DE60218342T2 (de) 2007-10-31
HK1071385A1 (en) 2005-07-15
JP2005511833A (ja) 2005-04-28
KR100880313B1 (ko) 2009-01-28
CN100413898C (zh) 2008-08-27
US7612146B2 (en) 2009-11-03
DE60218342D1 (de) 2007-04-05
WO2003050158A1 (en) 2003-06-19
KR20040065209A (ko) 2004-07-21
US20060025540A1 (en) 2006-02-02
ATE354599T1 (de) 2007-03-15
CN1253485C (zh) 2006-04-26
US6949609B2 (en) 2005-09-27

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