ATE354599T1 - Polymerzusammensetzungen und deren verwendungen - Google Patents
Polymerzusammensetzungen und deren verwendungenInfo
- Publication number
- ATE354599T1 ATE354599T1 AT02791946T AT02791946T ATE354599T1 AT E354599 T1 ATE354599 T1 AT E354599T1 AT 02791946 T AT02791946 T AT 02791946T AT 02791946 T AT02791946 T AT 02791946T AT E354599 T1 ATE354599 T1 AT E354599T1
- Authority
- AT
- Austria
- Prior art keywords
- polycyclic
- monomer
- relates
- present
- halogenated
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
- C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34052601P | 2001-12-12 | 2001-12-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE354599T1 true ATE354599T1 (de) | 2007-03-15 |
Family
ID=23333763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02791946T ATE354599T1 (de) | 2001-12-12 | 2002-12-12 | Polymerzusammensetzungen und deren verwendungen |
Country Status (10)
Country | Link |
---|---|
US (2) | US6949609B2 (de) |
EP (1) | EP1461373B1 (de) |
JP (1) | JP4389158B2 (de) |
KR (1) | KR100880313B1 (de) |
CN (2) | CN1253485C (de) |
AT (1) | ATE354599T1 (de) |
AU (1) | AU2002358247A1 (de) |
DE (1) | DE60218342T2 (de) |
HK (1) | HK1071385A1 (de) |
WO (1) | WO2003050158A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7442487B2 (en) * | 2003-12-30 | 2008-10-28 | Intel Corporation | Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
US7101654B2 (en) * | 2004-01-14 | 2006-09-05 | Promerus Llc | Norbornene-type monomers and polymers containing pendent lactone or sultone groups |
US20050192409A1 (en) * | 2004-02-13 | 2005-09-01 | Rhodes Larry F. | Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
DE602005011017D1 (de) * | 2004-07-07 | 2008-12-24 | Promerus Llc | Lichtempfindliche dielektrische harzzusammensetzungen und ihre verwendungen |
JP2006100563A (ja) * | 2004-09-29 | 2006-04-13 | Sumitomo Bakelite Co Ltd | 半導体装置 |
JP5017793B2 (ja) * | 2005-04-06 | 2012-09-05 | Jsr株式会社 | 環状オレフィン系付加重合体の製造方法 |
JP2006321912A (ja) * | 2005-05-19 | 2006-11-30 | Jsr Corp | 環状オレフィン系付加重合体の製造方法 |
JP2007002082A (ja) * | 2005-06-23 | 2007-01-11 | Jsr Corp | 環状オレフィン系付加重合体の製造方法 |
JP2007009044A (ja) * | 2005-06-30 | 2007-01-18 | Jsr Corp | 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体 |
JP4956956B2 (ja) * | 2005-10-12 | 2012-06-20 | Jsr株式会社 | 水素化触媒および水素化重合体の製造方法 |
JP4826242B2 (ja) * | 2005-12-12 | 2011-11-30 | Jsr株式会社 | 環状オレフィン系付加重合体の製造方法 |
ES2694728T3 (es) * | 2007-06-07 | 2018-12-26 | Albemarle Corporation | Polímeros bromados de bajo peso molecular y su uso en formulaciones termoplásticas |
EP2072536A1 (de) * | 2007-12-17 | 2009-06-24 | Lanxess Inc. | Hydrierung von Dienpolymeren |
JP2009256468A (ja) * | 2008-04-16 | 2009-11-05 | Asahi Glass Co Ltd | 含フッ素重合体の製造方法 |
JP5051185B2 (ja) * | 2009-06-16 | 2012-10-17 | 住友ベークライト株式会社 | 半導体装置および樹脂組成物 |
US11635688B2 (en) * | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
US8846295B2 (en) | 2012-04-27 | 2014-09-30 | International Business Machines Corporation | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof |
US9978944B2 (en) * | 2014-03-12 | 2018-05-22 | Promerus, Llc | Organic electronic compositions and device thereof |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
GB9120773D0 (en) * | 1991-10-01 | 1991-11-13 | Ici Plc | Modified olefin polymers |
US5372912A (en) | 1992-12-31 | 1994-12-13 | International Business Machines Corporation | Radiation-sensitive resist composition and process for its use |
US5468819A (en) | 1993-11-16 | 1995-11-21 | The B.F. Goodrich Company | Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex |
US6294616B1 (en) | 1995-05-25 | 2001-09-25 | B. F. Goodrich Company | Blends and alloys of polycyclic polymers |
JP3804138B2 (ja) * | 1996-02-09 | 2006-08-02 | Jsr株式会社 | ArFエキシマレーザー照射用感放射線性樹脂組成物 |
KR100536824B1 (ko) * | 1996-03-07 | 2006-03-09 | 스미토모 베이클라이트 가부시키가이샤 | 산불안정성펜던트기를지닌다중고리중합체를포함하는포토레지스트조성물 |
US6294615B1 (en) | 1997-12-08 | 2001-09-25 | Tosch Corporation | Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer |
-
2002
- 2002-12-12 WO PCT/IB2002/005795 patent/WO2003050158A1/en active IP Right Grant
- 2002-12-12 KR KR1020047005844A patent/KR100880313B1/ko not_active IP Right Cessation
- 2002-12-12 EP EP02791946A patent/EP1461373B1/de not_active Expired - Lifetime
- 2002-12-12 CN CNB028190815A patent/CN1253485C/zh not_active Expired - Fee Related
- 2002-12-12 US US10/317,366 patent/US6949609B2/en not_active Expired - Fee Related
- 2002-12-12 AT AT02791946T patent/ATE354599T1/de not_active IP Right Cessation
- 2002-12-12 CN CNB2005101269054A patent/CN100413898C/zh not_active Expired - Fee Related
- 2002-12-12 DE DE60218342T patent/DE60218342T2/de not_active Expired - Lifetime
- 2002-12-12 AU AU2002358247A patent/AU2002358247A1/en not_active Abandoned
- 2002-12-12 JP JP2003551180A patent/JP4389158B2/ja not_active Expired - Fee Related
-
2005
- 2005-05-13 HK HK05104015A patent/HK1071385A1/xx not_active IP Right Cessation
- 2005-09-07 US US11/220,814 patent/US7612146B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1789300A (zh) | 2006-06-21 |
US20030176583A1 (en) | 2003-09-18 |
CN1253485C (zh) | 2006-04-26 |
DE60218342D1 (de) | 2007-04-05 |
KR20040065209A (ko) | 2004-07-21 |
US7612146B2 (en) | 2009-11-03 |
EP1461373A1 (de) | 2004-09-29 |
US20060025540A1 (en) | 2006-02-02 |
CN1561355A (zh) | 2005-01-05 |
JP2005511833A (ja) | 2005-04-28 |
EP1461373B1 (de) | 2007-02-21 |
DE60218342T2 (de) | 2007-10-31 |
CN100413898C (zh) | 2008-08-27 |
HK1071385A1 (en) | 2005-07-15 |
KR100880313B1 (ko) | 2009-01-28 |
WO2003050158A1 (en) | 2003-06-19 |
US6949609B2 (en) | 2005-09-27 |
JP4389158B2 (ja) | 2009-12-24 |
AU2002358247A1 (en) | 2003-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |