DE60218342D1 - Polymerzusammensetzungen und deren verwendungen - Google Patents

Polymerzusammensetzungen und deren verwendungen

Info

Publication number
DE60218342D1
DE60218342D1 DE60218342T DE60218342T DE60218342D1 DE 60218342 D1 DE60218342 D1 DE 60218342D1 DE 60218342 T DE60218342 T DE 60218342T DE 60218342 T DE60218342 T DE 60218342T DE 60218342 D1 DE60218342 D1 DE 60218342D1
Authority
DE
Germany
Prior art keywords
polycyclic
monomer
relates
present
halogenated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60218342T
Other languages
English (en)
Other versions
DE60218342T2 (de
Inventor
Larry F Rhodes
Richard Vicari
Leah J Langsdorf
Andrew A Sobek
Edwin P Boyd
Brian Bennett
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of DE60218342D1 publication Critical patent/DE60218342D1/de
Application granted granted Critical
Publication of DE60218342T2 publication Critical patent/DE60218342T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE60218342T 2001-12-12 2002-12-12 Polymerzusammensetzungen und deren verwendungen Expired - Lifetime DE60218342T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US34052601P 2001-12-12 2001-12-12
US340526P 2001-12-12
PCT/IB2002/005795 WO2003050158A1 (en) 2001-12-12 2002-12-12 Polymeric compositions and uses therefor

Publications (2)

Publication Number Publication Date
DE60218342D1 true DE60218342D1 (de) 2007-04-05
DE60218342T2 DE60218342T2 (de) 2007-10-31

Family

ID=23333763

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60218342T Expired - Lifetime DE60218342T2 (de) 2001-12-12 2002-12-12 Polymerzusammensetzungen und deren verwendungen

Country Status (10)

Country Link
US (2) US6949609B2 (de)
EP (1) EP1461373B1 (de)
JP (1) JP4389158B2 (de)
KR (1) KR100880313B1 (de)
CN (2) CN1253485C (de)
AT (1) ATE354599T1 (de)
AU (1) AU2002358247A1 (de)
DE (1) DE60218342T2 (de)
HK (1) HK1071385A1 (de)
WO (1) WO2003050158A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442487B2 (en) * 2003-12-30 2008-10-28 Intel Corporation Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
US7101654B2 (en) * 2004-01-14 2006-09-05 Promerus Llc Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US20050192409A1 (en) * 2004-02-13 2005-09-01 Rhodes Larry F. Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
WO2006017035A1 (en) * 2004-07-07 2006-02-16 Promerus Llc Photosensitive dielectric resin compositions and their uses
JP2006100563A (ja) * 2004-09-29 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
JP5017793B2 (ja) * 2005-04-06 2012-09-05 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
JP2006321912A (ja) * 2005-05-19 2006-11-30 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007002082A (ja) * 2005-06-23 2007-01-11 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007009044A (ja) * 2005-06-30 2007-01-18 Jsr Corp 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体
JP4956956B2 (ja) * 2005-10-12 2012-06-20 Ｊｓｒ株式会社 水素化触媒および水素化重合体の製造方法
JP4826242B2 (ja) * 2005-12-12 2011-11-30 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
MX2009013178A (es) * 2007-06-07 2010-02-17 Albemarle Corp Aductos, aductos y oligomeros o aductos, oligomeros y polimeros de bajo peso molecular asi como su preparacion.
EP2072536A1 (de) * 2007-12-17 2009-06-24 Lanxess Inc. Hydrierung von Dienpolymeren
JP2009256468A (ja) * 2008-04-16 2009-11-05 Asahi Glass Co Ltd 含フッ素重合体の製造方法
JP5051185B2 (ja) * 2009-06-16 2012-10-17 住友ベークライト株式会社 半導体装置および樹脂組成物
WO2013134104A2 (en) * 2012-03-08 2013-09-12 Microchem Corp. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US8846295B2 (en) 2012-04-27 2014-09-30 International Business Machines Corporation Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
WO2015135622A1 (en) * 2014-03-12 2015-09-17 Merck Patent Gmbh Organic electronic compositions and device thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
GB9120773D0 (en) * 1991-10-01 1991-11-13 Ici Plc Modified olefin polymers
US5372912A (en) * 1992-12-31 1994-12-13 International Business Machines Corporation Radiation-sensitive resist composition and process for its use
US5468819A (en) * 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
US6294616B1 (en) 1995-05-25 2001-09-25 B. F. Goodrich Company Blends and alloys of polycyclic polymers
JP3804138B2 (ja) * 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
JP3962432B2 (ja) 1996-03-07 2007-08-22 住友ベークライト株式会社 酸不安定ペンダント基を持つ多環式ポリマーからなるフォトレジスト組成物
US6294615B1 (en) * 1997-12-08 2001-09-25 Tosch Corporation Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer

Also Published As

Publication number Publication date
AU2002358247A1 (en) 2003-06-23
EP1461373A1 (de) 2004-09-29
CN100413898C (zh) 2008-08-27
KR20040065209A (ko) 2004-07-21
EP1461373B1 (de) 2007-02-21
CN1561355A (zh) 2005-01-05
KR100880313B1 (ko) 2009-01-28
HK1071385A1 (en) 2005-07-15
US20060025540A1 (en) 2006-02-02
JP4389158B2 (ja) 2009-12-24
ATE354599T1 (de) 2007-03-15
WO2003050158A1 (en) 2003-06-19
DE60218342T2 (de) 2007-10-31
CN1253485C (zh) 2006-04-26
CN1789300A (zh) 2006-06-21
US7612146B2 (en) 2009-11-03
US20030176583A1 (en) 2003-09-18
US6949609B2 (en) 2005-09-27
JP2005511833A (ja) 2005-04-28

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: RHODES, LARRY, F., SILVER LAKE, OH 44224, US

Inventor name: VICARI, RICHARD, PASADENA, TX 77507, US

Inventor name: LANGSDORF, LEAH, J., AKRON, OH 44333, US

Inventor name: SOBEK, ANDREW, A., FAIRLAWN, OH 44333, US

Inventor name: BOYD, EDWIN, P., CLINTON, OH 44216, US

Inventor name: BENNETT, BRIAN, BRECKSVILLE, OH 44141, US

8364 No opposition during term of opposition