HK1071385A1 - Polymeric compositions and uses therefor - Google Patents

Polymeric compositions and uses therefor

Info

Publication number
HK1071385A1
HK1071385A1 HK05104015A HK05104015A HK1071385A1 HK 1071385 A1 HK1071385 A1 HK 1071385A1 HK 05104015 A HK05104015 A HK 05104015A HK 05104015 A HK05104015 A HK 05104015A HK 1071385 A1 HK1071385 A1 HK 1071385A1
Authority
HK
Hong Kong
Prior art keywords
polycyclic
polymeric compositions
uses therefor
monomer
relates
Prior art date
Application number
HK05104015A
Other languages
English (en)
Inventor
Larry F Rhodes
Richard Vicari
Leah J Langsdorf
Andrew A Sobek
Edwin P Boyd
Brian Bennett
Original Assignee
Sumitomo Bakelite Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co filed Critical Sumitomo Bakelite Co
Publication of HK1071385A1 publication Critical patent/HK1071385A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
HK05104015A 2001-12-12 2005-05-13 Polymeric compositions and uses therefor HK1071385A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34052601P 2001-12-12 2001-12-12
PCT/IB2002/005795 WO2003050158A1 (en) 2001-12-12 2002-12-12 Polymeric compositions and uses therefor

Publications (1)

Publication Number Publication Date
HK1071385A1 true HK1071385A1 (en) 2005-07-15

Family

ID=23333763

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05104015A HK1071385A1 (en) 2001-12-12 2005-05-13 Polymeric compositions and uses therefor

Country Status (10)

Country Link
US (2) US6949609B2 (xx)
EP (1) EP1461373B1 (xx)
JP (1) JP4389158B2 (xx)
KR (1) KR100880313B1 (xx)
CN (2) CN1253485C (xx)
AT (1) ATE354599T1 (xx)
AU (1) AU2002358247A1 (xx)
DE (1) DE60218342T2 (xx)
HK (1) HK1071385A1 (xx)
WO (1) WO2003050158A1 (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442487B2 (en) * 2003-12-30 2008-10-28 Intel Corporation Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
US7101654B2 (en) * 2004-01-14 2006-09-05 Promerus Llc Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US20050192409A1 (en) * 2004-02-13 2005-09-01 Rhodes Larry F. Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
ATE414118T1 (de) * 2004-07-07 2008-11-15 Promerus Llc Lichtempfindliche dielektrische harzzusammensetzungen und ihre verwendungen
JP2006100563A (ja) * 2004-09-29 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
JP5017793B2 (ja) * 2005-04-06 2012-09-05 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
JP2006321912A (ja) * 2005-05-19 2006-11-30 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007002082A (ja) * 2005-06-23 2007-01-11 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007009044A (ja) * 2005-06-30 2007-01-18 Jsr Corp 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体
JP4956956B2 (ja) * 2005-10-12 2012-06-20 Ｊｓｒ株式会社 水素化触媒および水素化重合体の製造方法
JP4826242B2 (ja) * 2005-12-12 2011-11-30 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
JP5543338B2 (ja) * 2007-06-07 2014-07-09 アルベマール・コーポレーシヨン 付加物、または付加物とオリゴマー、または付加物とオリゴマーと低分子量ポリマー、ならびにそれらの調製
EP2072536A1 (en) * 2007-12-17 2009-06-24 Lanxess Inc. Hydrogenation of diene-based polymers
JP2009256468A (ja) * 2008-04-16 2009-11-05 Asahi Glass Co Ltd 含フッ素重合体の製造方法
JP5051185B2 (ja) * 2009-06-16 2012-10-17 住友ベークライト株式会社 半導体装置および樹脂組成物
US11635688B2 (en) * 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US8846295B2 (en) 2012-04-27 2014-09-30 International Business Machines Corporation Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
KR102373812B1 (ko) * 2014-03-12 2022-03-11 메르크 파텐트 게엠베하 유기 전자 조성물 및 이의 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
GB9120773D0 (en) * 1991-10-01 1991-11-13 Ici Plc Modified olefin polymers
US5372912A (en) 1992-12-31 1994-12-13 International Business Machines Corporation Radiation-sensitive resist composition and process for its use
US5468819A (en) 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
US6294616B1 (en) 1995-05-25 2001-09-25 B. F. Goodrich Company Blends and alloys of polycyclic polymers
JP3804138B2 (ja) * 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
EP0885405B1 (en) * 1996-03-07 2005-06-08 Sumitomo Bakelite Co., Ltd. Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
US6294615B1 (en) 1997-12-08 2001-09-25 Tosch Corporation Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer

Also Published As

Publication number Publication date
US7612146B2 (en) 2009-11-03
CN100413898C (zh) 2008-08-27
JP4389158B2 (ja) 2009-12-24
CN1561355A (zh) 2005-01-05
DE60218342D1 (de) 2007-04-05
EP1461373B1 (en) 2007-02-21
WO2003050158A1 (en) 2003-06-19
JP2005511833A (ja) 2005-04-28
EP1461373A1 (en) 2004-09-29
KR20040065209A (ko) 2004-07-21
CN1253485C (zh) 2006-04-26
KR100880313B1 (ko) 2009-01-28
US6949609B2 (en) 2005-09-27
US20030176583A1 (en) 2003-09-18
DE60218342T2 (de) 2007-10-31
US20060025540A1 (en) 2006-02-02
ATE354599T1 (de) 2007-03-15
AU2002358247A1 (en) 2003-06-23
CN1789300A (zh) 2006-06-21

Similar Documents

Publication Publication Date Title
HK1071385A1 (en) Polymeric compositions and uses therefor
TW200603338A (en) Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
WO2004067577A3 (en) Polymerization processes
TW200502699A (en) Novel positive photosensitive resin compositions
WO2002010231A3 (en) Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
DE60222415D1 (de) Resorbierbare polymerzusammensetzungen
ATE396207T1 (de) Hydriertes modifiziertes polymer, verfahren zu seiner herstellung und dieses enthaltende zusammensetzung
BR0014446A (pt) Composições catalisadoras organometais
CA2407602A1 (en) Polymerization catalyst compositions and processes to produce polymers and bimodal polymers
TW200631604A (en) Ophthalmic compositions comprising polyether substituted polymers
BR0214136A (pt) Polìmeros de enxerto, processo para a preparação e uso dos mesmos
ATE521373T1 (de) Knochenzementzusammensetzung
TW200743908A (en) Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
WO2008043529A3 (de) Netz- und dispergiermittel basierend auf mischungen von strukturierten copolymeren
BR0108603A (pt) Composições polìmeras com aperfeiçoada constância de propriedades
ITRM20020529A1 (it) Polimeri sterilizzanti, processo di loro preparazione ed uso.
SG98066A1 (en) Solid catalyst component for olefin polymerization, process for producing the same, process for producing catalyst for olefin polymerization, and process for producing olefin polymer
EP1655319A4 (en) POLYMERIZABLE COMPOSITION AND BODY FORMED OF SAME
PL366468A1 (en) Stabilizer compositions for halogenated polymers, the use thereof and polymers containing said compositions
WO2004077160A3 (en) Method of controlling the differential dissolution rate of photoresist compositions
TW200604740A (en) Cyanoadamantyl compounds and polymers and photoresists comprising same
WO2004014960A3 (en) Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
AU2003259727A1 (en) Photoresists, fluorinated polymers and processes for 157 nm microlithography
FR2812879B1 (fr) Copolyamides et compositions a base de ces copolyamides
EP1246013A3 (en) Photoresists, polymers and processes for microlithography

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20131212