JP4384899B2 - デバイスチップ位置測定方法 - Google Patents

デバイスチップ位置測定方法 Download PDF

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Publication number
JP4384899B2
JP4384899B2 JP2003407058A JP2003407058A JP4384899B2 JP 4384899 B2 JP4384899 B2 JP 4384899B2 JP 2003407058 A JP2003407058 A JP 2003407058A JP 2003407058 A JP2003407058 A JP 2003407058A JP 4384899 B2 JP4384899 B2 JP 4384899B2
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Prior art keywords
device chip
measurement
points
initial
reference measurement
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JP2003407058A
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Japanese (ja)
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JP2005164522A (ja
JP2005164522A5 (enExample
Inventor
正治 中村
知行 田中
元 三浦
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TECHNO-HOLON CORPORATION
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TECHNO-HOLON CORPORATION
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  • Length Measuring Devices By Optical Means (AREA)
JP2003407058A 2003-12-05 2003-12-05 デバイスチップ位置測定方法 Expired - Lifetime JP4384899B2 (ja)

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JP2003407058A JP4384899B2 (ja) 2003-12-05 2003-12-05 デバイスチップ位置測定方法

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Application Number Priority Date Filing Date Title
JP2003407058A JP4384899B2 (ja) 2003-12-05 2003-12-05 デバイスチップ位置測定方法

Publications (3)

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JP2005164522A JP2005164522A (ja) 2005-06-23
JP2005164522A5 JP2005164522A5 (enExample) 2006-12-28
JP4384899B2 true JP4384899B2 (ja) 2009-12-16

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4706366B2 (ja) * 2005-07-22 2011-06-22 株式会社テクノホロン 位置検出方法
WO2017210576A1 (en) * 2016-06-02 2017-12-07 Universal Instruments Corporation Semiconductor die offset compensation variation
JP6295355B1 (ja) * 2017-03-31 2018-03-14 株式会社ピーエムティー 露光装置、露光方法、半導体モジュールの製造方法、パターン形成装置、及びパターン形成方法
CN112541949B (zh) * 2020-12-25 2024-03-29 铜陵三佳山田科技股份有限公司 用于半导体芯片封装的芯片定位方法

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JP2005164522A (ja) 2005-06-23

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