JP4384022B2 - 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 - Google Patents

詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 Download PDF

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JP4384022B2
JP4384022B2 JP2004376827A JP2004376827A JP4384022B2 JP 4384022 B2 JP4384022 B2 JP 4384022B2 JP 2004376827 A JP2004376827 A JP 2004376827A JP 2004376827 A JP2004376827 A JP 2004376827A JP 4384022 B2 JP4384022 B2 JP 4384022B2
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electron beam
sample
inspection
wafer
image
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JP2005209645A5 (enExample
JP2005209645A (ja
Inventor
賢治 渡辺
徹 佐竹
伸治 野路
武司 村上
努 狩俣
裕一郎 山崎
一郎太 長濱
篤志 大西
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Ebara Corp
Toshiba Corp
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Ebara Corp
Toshiba Corp
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JP2004376827A 2003-12-25 2004-12-27 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 Expired - Lifetime JP4384022B2 (ja)

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JP2004376827A JP4384022B2 (ja) 2003-12-25 2004-12-27 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法

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JP2003429926 2003-12-25
JP2004376827A JP4384022B2 (ja) 2003-12-25 2004-12-27 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法

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JP2005209645A JP2005209645A (ja) 2005-08-04
JP2005209645A5 JP2005209645A5 (enExample) 2007-04-26
JP4384022B2 true JP4384022B2 (ja) 2009-12-16

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4603448B2 (ja) * 2005-08-31 2010-12-22 株式会社日立ハイテクノロジーズ 回路パターンの検査装置
JP2007087639A (ja) * 2005-09-20 2007-04-05 Ebara Corp 電子線装置及びパターン評価方法
JP2007248360A (ja) * 2006-03-17 2007-09-27 Jeol Ltd 荷電粒子ビーム検査方法および装置
JP5525128B2 (ja) * 2007-11-29 2014-06-18 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置及び試料観察方法
JP6185693B2 (ja) * 2008-06-11 2017-08-23 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ ウェーハー上の設計欠陥および工程欠陥の検出、ウェーハー上の欠陥の精査、設計内の１つ以上の特徴を工程監視特徴として使用するための選択、またはそのいくつかの組み合わせのためのシステムおよび方法

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