JP4360293B2 - 半田バンプ電極構造 - Google Patents
半田バンプ電極構造 Download PDFInfo
- Publication number
- JP4360293B2 JP4360293B2 JP2004196457A JP2004196457A JP4360293B2 JP 4360293 B2 JP4360293 B2 JP 4360293B2 JP 2004196457 A JP2004196457 A JP 2004196457A JP 2004196457 A JP2004196457 A JP 2004196457A JP 4360293 B2 JP4360293 B2 JP 4360293B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- opening
- solder bump
- electrode structure
- ubm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910000679 solder Inorganic materials 0.000 title claims description 71
- 230000004888 barrier function Effects 0.000 claims description 15
- 230000002093 peripheral effect Effects 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 13
- 229910010272 inorganic material Inorganic materials 0.000 claims description 11
- 239000011147 inorganic material Substances 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000011368 organic material Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 8
- 239000004642 Polyimide Substances 0.000 claims description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 18
- 239000010931 gold Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 11
- 238000005530 etching Methods 0.000 description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- -1 Mo is used Substances 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05571—Disposition the external layer being disposed in a recess of the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Description
22 基板
23 電極パッド
24 第1絶縁膜
25 第1開口部
26 第2絶縁膜
27 第2開口部
28 UBM
29 半田バンプ
30,31 端縁部
Claims (6)
- 基板上に形成された電極パッドと、
前記電極パッドの一部を露出させる第1開口部を形成した状態で前記電極パッド上に形成された第1絶縁膜と、
前記第1開口部を取り囲む第2開口部を形成した状態で前記第1絶縁膜上に形成された第2絶縁膜と、
前記第1開口部内および前記第2開口部内において前記電極パッドおよび前記第1絶縁膜を覆いかつ前記第2絶縁膜上に周縁部を位置させた状態で形成されたアンダーバリアメタルと、
前記アンダーバリアメタル上に形成された半田バンプと
を備え、
前記第1絶縁膜の前記第1開口部を規定する端縁部および前記第2絶縁膜の前記第2開口部を規定する端縁部には、スロープが付与されていて、
前記アンダーバリアメタルの前記周縁部は、前記第2絶縁膜の前記第2開口部を規定する端縁部に付与された前記スロープ上に位置している、
半田バンプ電極構造。 - 前記第1絶縁膜は、SiNx、SiONおよびSiO2から選ばれた1種からなる無機材料膜を含み、かつ、前記第2絶縁膜は、ポリイミド、BCBおよびフッ素樹脂から選ばれた1種からなる有機材料膜を含む、請求項1に記載の半田バンプ電極構造。
- 前記基板は化合物半導体からなり、前記電極パッドはAuを含み、かつ、前記半田バンプはSnを主成分とする、請求項1または2に記載の半田バンプ電極構造。
- 前記第1絶縁膜は、厚みが100〜600nmの範囲にあり、前記第2絶縁膜は、厚みが3〜10μmの範囲にある、請求項1ないし3のいずれかに記載の半田バンプ電極構造。
- 前記第1絶縁膜の前記第1開口部を規定する端縁部に付与された前記スロープは、前記電極パッドの主面に対して45度以下の角度をもって傾斜している、請求項1ないし4のいずれかに記載の半田バンプ電極構造。
- 前記第1開口部の開口端と前記第2開口部の開口端との距離が、3μm以上である、請求項1ないし5のいずれかに記載の半田バンプ電極構造。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004196457A JP4360293B2 (ja) | 2004-07-02 | 2004-07-02 | 半田バンプ電極構造 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004196457A JP4360293B2 (ja) | 2004-07-02 | 2004-07-02 | 半田バンプ電極構造 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006019550A JP2006019550A (ja) | 2006-01-19 |
JP4360293B2 true JP4360293B2 (ja) | 2009-11-11 |
Family
ID=35793515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004196457A Expired - Lifetime JP4360293B2 (ja) | 2004-07-02 | 2004-07-02 | 半田バンプ電極構造 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4360293B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8492896B2 (en) | 2010-05-21 | 2013-07-23 | Panasonic Corporation | Semiconductor apparatus and semiconductor apparatus unit |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4354469B2 (ja) | 2006-08-11 | 2009-10-28 | シャープ株式会社 | 半導体装置および半導体装置の製造方法 |
WO2008153128A1 (ja) | 2007-06-15 | 2008-12-18 | Rohm Co., Ltd. | 半導体装置 |
JP4873321B2 (ja) * | 2007-08-17 | 2012-02-08 | 株式会社アルバック | はんだバンプの形成方法 |
JP2009064812A (ja) | 2007-09-04 | 2009-03-26 | Panasonic Corp | 半導体装置の電極構造およびその関連技術 |
JP2009124099A (ja) * | 2007-10-24 | 2009-06-04 | Panasonic Corp | 半導体チップの電極構造 |
US8089156B2 (en) | 2007-10-24 | 2012-01-03 | Panasonic Corporation | Electrode structure for semiconductor chip with crack suppressing dummy metal patterns |
WO2009069421A1 (ja) | 2007-11-28 | 2009-06-04 | Murata Manufacturing Co., Ltd. | 弾性波装置 |
DE102009013921B3 (de) * | 2009-03-19 | 2010-09-30 | Forschungsverbund Berlin E.V. | Verfahren zur Herstellung einer Metallisierung für mindestens ein Kontaktpad und Halbleiterwafer mit Metallisierung für mindestens ein Kontaktpad |
JP6225414B2 (ja) * | 2012-11-16 | 2017-11-08 | セイコーエプソン株式会社 | 半導体装置 |
JP5656301B2 (ja) * | 2013-05-23 | 2015-01-21 | ローム株式会社 | 半導体装置 |
-
2004
- 2004-07-02 JP JP2004196457A patent/JP4360293B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8492896B2 (en) | 2010-05-21 | 2013-07-23 | Panasonic Corporation | Semiconductor apparatus and semiconductor apparatus unit |
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Publication number | Publication date |
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JP2006019550A (ja) | 2006-01-19 |
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