JP4334429B2 - 光学的測定方法及び光学的測定装置 - Google Patents

光学的測定方法及び光学的測定装置 Download PDF

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Publication number
JP4334429B2
JP4334429B2 JP2004210448A JP2004210448A JP4334429B2 JP 4334429 B2 JP4334429 B2 JP 4334429B2 JP 2004210448 A JP2004210448 A JP 2004210448A JP 2004210448 A JP2004210448 A JP 2004210448A JP 4334429 B2 JP4334429 B2 JP 4334429B2
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JP
Japan
Prior art keywords
signal
pixel
light intensity
interest
target pixel
Prior art date
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Expired - Lifetime
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JP2004210448A
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English (en)
Japanese (ja)
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JP2006030024A (ja
Inventor
淳一 松村
憲治 大久保
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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Publication date
Application filed by Toray Engineering Co Ltd filed Critical Toray Engineering Co Ltd
Priority to JP2004210448A priority Critical patent/JP4334429B2/ja
Priority to KR1020050051696A priority patent/KR100871634B1/ko
Priority to TW094121363A priority patent/TWI328673B/zh
Priority to CN2005100860244A priority patent/CN1721841B/zh
Publication of JP2006030024A publication Critical patent/JP2006030024A/ja
Application granted granted Critical
Publication of JP4334429B2 publication Critical patent/JP4334429B2/ja
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Expired - Lifetime legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/10Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/68Noise processing, e.g. detecting, correcting, reducing or removing noise applied to defects

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Multimedia (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2004210448A 2004-07-16 2004-07-16 光学的測定方法及び光学的測定装置 Expired - Lifetime JP4334429B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004210448A JP4334429B2 (ja) 2004-07-16 2004-07-16 光学的測定方法及び光学的測定装置
KR1020050051696A KR100871634B1 (ko) 2004-07-16 2005-06-16 광학적 측정방법 및 그 장치
TW094121363A TWI328673B (en) 2004-07-16 2005-06-27 Optical measuring method and optical measuring device
CN2005100860244A CN1721841B (zh) 2004-07-16 2005-07-18 光学测量方法及光学测量装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004210448A JP4334429B2 (ja) 2004-07-16 2004-07-16 光学的測定方法及び光学的測定装置

Publications (2)

Publication Number Publication Date
JP2006030024A JP2006030024A (ja) 2006-02-02
JP4334429B2 true JP4334429B2 (ja) 2009-09-30

Family

ID=35896562

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JP2004210448A Expired - Lifetime JP4334429B2 (ja) 2004-07-16 2004-07-16 光学的測定方法及び光学的測定装置

Country Status (4)

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JP (1) JP4334429B2 (ko)
KR (1) KR100871634B1 (ko)
CN (1) CN1721841B (ko)
TW (1) TWI328673B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010210527A (ja) * 2009-03-11 2010-09-24 Horiba Ltd 異物検査除去装置及び異物検査除去プログラム
JP5276525B2 (ja) * 2009-06-12 2013-08-28 東レエンジニアリング株式会社 光学的測定方法及び光学的測定装置
CN103548035B (zh) * 2010-10-08 2018-01-02 苹果公司 包括差分测量电路的手指感测设备和相关方法
CN109405735B (zh) * 2017-08-18 2020-11-27 阿里巴巴集团控股有限公司 三维扫描系统和三维扫描方法

Also Published As

Publication number Publication date
KR100871634B1 (ko) 2008-12-02
KR20060046459A (ko) 2006-05-17
TW200606394A (en) 2006-02-16
TWI328673B (en) 2010-08-11
CN1721841A (zh) 2006-01-18
JP2006030024A (ja) 2006-02-02
CN1721841B (zh) 2010-08-04

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