JP4332409B2 - 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法 - Google Patents

基板保持機構およびそれを用いた露光装置並びにデバイス製造方法 Download PDF

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Publication number
JP4332409B2
JP4332409B2 JP2003372036A JP2003372036A JP4332409B2 JP 4332409 B2 JP4332409 B2 JP 4332409B2 JP 2003372036 A JP2003372036 A JP 2003372036A JP 2003372036 A JP2003372036 A JP 2003372036A JP 4332409 B2 JP4332409 B2 JP 4332409B2
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JP
Japan
Prior art keywords
substrate
holding
stage
holding mechanism
holding portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2003372036A
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English (en)
Japanese (ja)
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JP2005136289A (ja
JP2005136289A5 (enExample
Inventor
磨人 山本
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003372036A priority Critical patent/JP4332409B2/ja
Priority to US10/972,497 priority patent/US7295287B2/en
Publication of JP2005136289A publication Critical patent/JP2005136289A/ja
Publication of JP2005136289A5 publication Critical patent/JP2005136289A5/ja
Priority to US11/769,035 priority patent/US7834982B2/en
Application granted granted Critical
Publication of JP4332409B2 publication Critical patent/JP4332409B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manipulator (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2003372036A 2003-10-31 2003-10-31 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法 Expired - Fee Related JP4332409B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003372036A JP4332409B2 (ja) 2003-10-31 2003-10-31 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法
US10/972,497 US7295287B2 (en) 2003-10-31 2004-10-26 Substrate holder and exposure apparatus having the same
US11/769,035 US7834982B2 (en) 2003-10-31 2007-06-27 Substrate holder and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003372036A JP4332409B2 (ja) 2003-10-31 2003-10-31 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009123179A Division JP4617385B2 (ja) 2009-05-21 2009-05-21 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005136289A JP2005136289A (ja) 2005-05-26
JP2005136289A5 JP2005136289A5 (enExample) 2006-12-14
JP4332409B2 true JP4332409B2 (ja) 2009-09-16

Family

ID=34543990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003372036A Expired - Fee Related JP4332409B2 (ja) 2003-10-31 2003-10-31 基板保持機構およびそれを用いた露光装置並びにデバイス製造方法

Country Status (2)

Country Link
US (2) US7295287B2 (enExample)
JP (1) JP4332409B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273620A (ja) * 2006-03-30 2007-10-18 Tokyo Electron Ltd 基板搬送装置及び基板処理装置
JPWO2009113317A1 (ja) * 2008-03-13 2011-07-21 株式会社ニコン 基板ホルダ、基板ホルダユニット、基板搬送装置および基板貼り合わせ装置
US9859089B2 (en) 2011-05-20 2018-01-02 Hermes Microvision Inc. Method and system for inspecting and grounding an EUV mask
US9485846B2 (en) 2011-05-20 2016-11-01 Hermes Microvision Inc. Method and system for inspecting an EUV mask
US8575573B2 (en) 2011-05-20 2013-11-05 Hermes Microvision, Inc. Structure for discharging extreme ultraviolet mask
JP5565495B2 (ja) * 2013-04-12 2014-08-06 大日本印刷株式会社 基板固定装置
US9618857B2 (en) * 2015-02-28 2017-04-11 Kla-Tencor Corporation End effectors and reticle handling at a high throughput
CN107561868A (zh) * 2016-06-30 2018-01-09 上海微电子装备（集团）股份有限公司 用于掩模版传输的交换版机械手装置及具有其的光刻机
JP6402227B2 (ja) * 2017-09-20 2018-10-10 株式会社東京精密 ウェーハ受け渡し装置
NL2021006B1 (en) * 2018-05-29 2019-12-04 Suss Microtec Lithography Gmbh Holding apparatus and method for holding a substrate
JP7100556B2 (ja) * 2018-10-05 2022-07-13 株式会社荏原製作所 基板ホルダに基板を保持させるためおよび／又は基板ホルダによる基板の保持を解除するための装置、および同装置を有するめっき装置
US12399436B2 (en) * 2020-10-08 2025-08-26 Asml Netherlands B.V. Substrate holder, carrier system comprising a substrate holder and lithographic apparatus
EP4105720A1 (en) * 2021-06-16 2022-12-21 ASML Netherlands B.V. Substrate holder and method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4711438A (en) * 1986-05-08 1987-12-08 Micrion Limited Partnership Mask holding
JPH01321257A (ja) 1988-06-21 1989-12-27 Nitto Denko Corp 薄板と粘着テープの貼着方法
JP2691299B2 (ja) 1989-06-12 1997-12-17 株式会社ニコン 基板ホルダ
JP2862632B2 (ja) 1990-04-26 1999-03-03 キヤノン株式会社 基板の縦型搬送装置
JPH0555351A (ja) 1991-08-23 1993-03-05 Mitsubishi Electric Corp ワークハンドリング機構
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
KR100207451B1 (ko) * 1995-12-14 1999-07-15 윤종용 반도체 웨이퍼 고정장치
JPH09270383A (ja) 1996-03-29 1997-10-14 Nikon Corp 基板搬送装置及び基板搬送方法
US6167893B1 (en) * 1999-02-09 2001-01-02 Novellus Systems, Inc. Dynamic chuck for semiconductor wafer or other substrate
JP4309992B2 (ja) 1999-04-16 2009-08-05 キヤノン株式会社 試料保持装置およびこの保持装置を用いた露光装置
TW446858B (en) 1999-04-21 2001-07-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using such a lithographic projection apparatus, and device made by such a method of manufacturing
JP3513437B2 (ja) 1999-09-01 2004-03-31 キヤノン株式会社 基板管理方法及び半導体露光装置
JP2001156151A (ja) 1999-11-25 2001-06-08 Tokyo Seimitsu Co Ltd 落下防止機能付ウェーハ吸着搬送装置
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
WO2003073495A1 (fr) * 2002-02-27 2003-09-04 Tokyo Electron Limited Procede de support d'un substrat

Also Published As

Publication number Publication date
US20050094126A1 (en) 2005-05-05
US7834982B2 (en) 2010-11-16
US7295287B2 (en) 2007-11-13
JP2005136289A (ja) 2005-05-26
US20070252971A1 (en) 2007-11-01

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