JP4323078B2 - 高純度鉄およびその製造方法ならびに高純度鉄ターゲット - Google Patents

高純度鉄およびその製造方法ならびに高純度鉄ターゲット Download PDF

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Publication number
JP4323078B2
JP4323078B2 JP2000301295A JP2000301295A JP4323078B2 JP 4323078 B2 JP4323078 B2 JP 4323078B2 JP 2000301295 A JP2000301295 A JP 2000301295A JP 2000301295 A JP2000301295 A JP 2000301295A JP 4323078 B2 JP4323078 B2 JP 4323078B2
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Japan
Prior art keywords
iron
copper
purity
aqueous
concentration
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Expired - Lifetime
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JP2000301295A
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English (en)
Japanese (ja)
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JP2002105598A (ja
Inventor
雅仁 打越
紀夫 横山
ケケシ タマス
実 一色
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Sony Corp
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Sony Corp
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Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2000301295A priority Critical patent/JP4323078B2/ja
Priority to KR1020010059914A priority patent/KR100813816B1/ko
Priority to US09/966,425 priority patent/US20020117022A1/en
Publication of JP2002105598A publication Critical patent/JP2002105598A/ja
Priority to US10/446,427 priority patent/US20030206822A1/en
Priority to KR1020070109027A priority patent/KR100854264B1/ko
Application granted granted Critical
Publication of JP4323078B2 publication Critical patent/JP4323078B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/44—Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/16—Remelting metals
    • C22B9/22—Remelting metals with heating by wave energy or particle radiation
    • C22B9/226—Remelting metals with heating by wave energy or particle radiation by electric discharge, e.g. plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Manufacture Of Iron (AREA)
  • Physical Vapour Deposition (AREA)
JP2000301295A 2000-09-29 2000-09-29 高純度鉄およびその製造方法ならびに高純度鉄ターゲット Expired - Lifetime JP4323078B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2000301295A JP4323078B2 (ja) 2000-09-29 2000-09-29 高純度鉄およびその製造方法ならびに高純度鉄ターゲット
KR1020010059914A KR100813816B1 (ko) 2000-09-29 2001-09-27 고순도 철 및 고순도 철 타겟
US09/966,425 US20020117022A1 (en) 2000-09-29 2001-09-28 High purity iron, method of manufacturing thereof, and high purity iron targets
US10/446,427 US20030206822A1 (en) 2000-09-29 2003-05-28 High purity iron, method of manufacturing thereof, and high purity iron targets
KR1020070109027A KR100854264B1 (ko) 2000-09-29 2007-10-29 고순도 철의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000301295A JP4323078B2 (ja) 2000-09-29 2000-09-29 高純度鉄およびその製造方法ならびに高純度鉄ターゲット

Publications (2)

Publication Number Publication Date
JP2002105598A JP2002105598A (ja) 2002-04-10
JP4323078B2 true JP4323078B2 (ja) 2009-09-02

Family

ID=18782856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000301295A Expired - Lifetime JP4323078B2 (ja) 2000-09-29 2000-09-29 高純度鉄およびその製造方法ならびに高純度鉄ターゲット

Country Status (3)

Country Link
US (2) US20020117022A1 (ko)
JP (1) JP4323078B2 (ko)
KR (2) KR100813816B1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4323078B2 (ja) * 2000-09-29 2009-09-02 ソニー株式会社 高純度鉄およびその製造方法ならびに高純度鉄ターゲット
JP4954479B2 (ja) * 2004-01-30 2012-06-13 ソニー株式会社 高純度電解鉄の製造方法および高純度電解コバルトの製造方法
JP4664719B2 (ja) * 2005-03-31 2011-04-06 鶴見曹達株式会社 塩化銅エッチング廃液の精製方法及び精製塩化銅溶液
JP5247986B2 (ja) * 2006-03-03 2013-07-24 株式会社田中化学研究所 高純度酸化鉄の製造方法
JP4723629B2 (ja) * 2008-11-13 2011-07-13 Ｊｘ日鉱日石金属株式会社 陰イオン交換樹脂を用いた銀の回収方法
KR101403281B1 (ko) * 2012-12-26 2014-06-03 재단법인 포항산업과학연구원 니켈 습식 제련 공정 부산물 회수 장치
US9738966B2 (en) * 2014-09-04 2017-08-22 Northwestern University Chemically pure zero-valent iron nanofilms from a low-purity iron source

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3959096A (en) * 1975-01-17 1976-05-25 Langer Stanley H Electrochemical recovery of copper from alloy scrap
US4366129A (en) * 1981-04-08 1982-12-28 Tatabanyai Szenbanyak Process for producing alumina and ferric oxide from aluminium carriers with high iron and silicon content
US4666683A (en) * 1985-11-21 1987-05-19 Eco-Tec Limited Process for removal of copper from solutions of chelating agent and copper
JPS62161977A (ja) * 1986-01-08 1987-07-17 Showa Denko Kk 高純度鉄の製法
JPH0413819A (ja) * 1990-05-07 1992-01-17 Nikko Kyodo Co Ltd 高純度鉄の製造方法
CA2167026C (en) * 1995-01-12 2004-08-17 Atsushi Fukui Method of recovering antimony and bismuth from copper electrolyte
SE504959C2 (sv) * 1995-03-03 1997-06-02 Kemira Kemi Ab Förfarande för rening av metallinnehållande lösningar, som innehåller järn- och zinksalter
JPH08253888A (ja) * 1995-03-14 1996-10-01 Japan Energy Corp 高純度コバルトの製造方法
JPH11335821A (ja) * 1998-05-20 1999-12-07 Japan Energy Corp 磁性薄膜形成用Ｎｉ−Ｆｅ合金スパッタリングターゲット、磁性薄膜および磁性薄膜形成用Ｎｉ−Ｆｅ合金スパッタリングターゲットの製造方法
JP2000144305A (ja) * 1998-11-12 2000-05-26 Japan Energy Corp 薄膜形成用高純度鉄材料及びその製造方法
US6514414B1 (en) * 2000-09-08 2003-02-04 Clariant Finance (Bvi) Limited Process for separation and removal of iron ions from basic zinc solution
JP4323078B2 (ja) * 2000-09-29 2009-09-02 ソニー株式会社 高純度鉄およびその製造方法ならびに高純度鉄ターゲット

Also Published As

Publication number Publication date
KR100813816B1 (ko) 2008-03-17
JP2002105598A (ja) 2002-04-10
US20030206822A1 (en) 2003-11-06
KR20020025752A (ko) 2002-04-04
KR100854264B1 (ko) 2008-08-26
US20020117022A1 (en) 2002-08-29
KR20070108502A (ko) 2007-11-12

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