JP4293318B2 - 圧力制御異常検出方法、異常表示方法および半導体製造装置 - Google Patents

圧力制御異常検出方法、異常表示方法および半導体製造装置 Download PDF

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Publication number
JP4293318B2
JP4293318B2 JP28632697A JP28632697A JP4293318B2 JP 4293318 B2 JP4293318 B2 JP 4293318B2 JP 28632697 A JP28632697 A JP 28632697A JP 28632697 A JP28632697 A JP 28632697A JP 4293318 B2 JP4293318 B2 JP 4293318B2
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Japan
Prior art keywords
abnormality
valve opening
valve
pressure
cause
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Expired - Fee Related
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JP28632697A
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English (en)
Japanese (ja)
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JPH11119839A (ja
JPH11119839A5 (enExample
Inventor
剛 斎藤
和弘 横川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
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Priority to JP28632697A priority Critical patent/JP4293318B2/ja
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Publication of JPH11119839A5 publication Critical patent/JPH11119839A5/ja
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JP28632697A 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置 Expired - Fee Related JP4293318B2 (ja)

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JP28632697A JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28632697A JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

Publications (3)

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JPH11119839A JPH11119839A (ja) 1999-04-30
JPH11119839A5 JPH11119839A5 (enExample) 2005-06-16
JP4293318B2 true JP4293318B2 (ja) 2009-07-08

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JP28632697A Expired - Fee Related JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002089189A1 (en) * 2001-04-27 2002-11-07 Tokyo Electron Limited Remote maintenance system and remote maintenance method for semiconductor manufacturing apparatus
JP4335085B2 (ja) * 2004-07-05 2009-09-30 シーケーディ株式会社 真空圧力制御システム
JP6424500B2 (ja) * 2014-07-11 2018-11-21 株式会社島津製作所 圧力制御装置および真空システム
JP6790356B2 (ja) * 2015-12-22 2020-11-25 横河電機株式会社 フィールド機器、設定装置、及び設定プログラム
JP6681452B1 (ja) * 2018-10-19 2020-04-15 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置及び半導体装置の製造方法
JP2023132914A (ja) * 2022-03-11 2023-09-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、管理装置、基板処理装置、基板処理装置管理方法および基板処理装置管理プログラム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0668698B2 (ja) * 1984-12-07 1994-08-31 株式会社東芝 プロセス状態監視装置
JP2906624B2 (ja) * 1990-09-27 1999-06-21 株式会社島津製作所 薄膜形成装置
JPH0736539A (ja) * 1993-07-20 1995-02-07 Fuji Electric Co Ltd プロセス異常原因推定方法

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JPH11119839A (ja) 1999-04-30

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