JP4282539B2 - 基板処理装置および半導体装置の製造方法 - Google Patents
基板処理装置および半導体装置の製造方法 Download PDFInfo
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- JP4282539B2 JP4282539B2 JP2004133372A JP2004133372A JP4282539B2 JP 4282539 B2 JP4282539 B2 JP 4282539B2 JP 2004133372 A JP2004133372 A JP 2004133372A JP 2004133372 A JP2004133372 A JP 2004133372A JP 4282539 B2 JP4282539 B2 JP 4282539B2
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004133372A JP4282539B2 (ja) | 2004-04-28 | 2004-04-28 | 基板処理装置および半導体装置の製造方法 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004133372A JP4282539B2 (ja) | 2004-04-28 | 2004-04-28 | 基板処理装置および半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005317734A JP2005317734A (ja) | 2005-11-10 |
| JP2005317734A5 JP2005317734A5 (enExample) | 2007-06-14 |
| JP4282539B2 true JP4282539B2 (ja) | 2009-06-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004133372A Expired - Fee Related JP4282539B2 (ja) | 2004-04-28 | 2004-04-28 | 基板処理装置および半導体装置の製造方法 |
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| JP (1) | JP4282539B2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101814243B1 (ko) * | 2014-03-24 | 2018-01-02 | 가부시키가이샤 히다치 고쿠사이 덴키 | 반응관, 기판 처리 장치 및 반도체 장치의 제조 방법 |
| US20210305072A1 (en) * | 2020-03-24 | 2021-09-30 | Nissin Ion Equipment Co., Ltd. | Substrate cooling device |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5117856B2 (ja) * | 2005-08-05 | 2013-01-16 | 株式会社日立国際電気 | 基板処理装置、冷却ガス供給ノズルおよび半導体装置の製造方法 |
| KR100929815B1 (ko) | 2007-12-27 | 2009-12-07 | 세메스 주식회사 | 냉각 장치 및 이를 이용한 기판 냉각 방법 |
| JP5658463B2 (ja) * | 2009-02-27 | 2015-01-28 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
| JP6257000B2 (ja) * | 2014-09-30 | 2018-01-10 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法および反応管 |
| CN113451183B (zh) * | 2020-06-03 | 2023-03-31 | 重庆康佳光电技术研究院有限公司 | 一种晶圆盒 |
-
2004
- 2004-04-28 JP JP2004133372A patent/JP4282539B2/ja not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101814243B1 (ko) * | 2014-03-24 | 2018-01-02 | 가부시키가이샤 히다치 고쿠사이 덴키 | 반응관, 기판 처리 장치 및 반도체 장치의 제조 방법 |
| US20210305072A1 (en) * | 2020-03-24 | 2021-09-30 | Nissin Ion Equipment Co., Ltd. | Substrate cooling device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005317734A (ja) | 2005-11-10 |
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