JP2005317734A5 - - Google Patents

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Publication number
JP2005317734A5
JP2005317734A5 JP2004133372A JP2004133372A JP2005317734A5 JP 2005317734 A5 JP2005317734 A5 JP 2005317734A5 JP 2004133372 A JP2004133372 A JP 2004133372A JP 2004133372 A JP2004133372 A JP 2004133372A JP 2005317734 A5 JP2005317734 A5 JP 2005317734A5
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JP
Japan
Prior art keywords
substrate
cooling gas
processing chamber
boat
processing
Prior art date
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Granted
Application number
JP2004133372A
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English (en)
Japanese (ja)
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JP2005317734A (ja
JP4282539B2 (ja
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Application filed filed Critical
Priority to JP2004133372A priority Critical patent/JP4282539B2/ja
Priority claimed from JP2004133372A external-priority patent/JP4282539B2/ja
Publication of JP2005317734A publication Critical patent/JP2005317734A/ja
Publication of JP2005317734A5 publication Critical patent/JP2005317734A5/ja
Application granted granted Critical
Publication of JP4282539B2 publication Critical patent/JP4282539B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004133372A 2004-04-28 2004-04-28 基板処理装置および半導体装置の製造方法 Expired - Fee Related JP4282539B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004133372A JP4282539B2 (ja) 2004-04-28 2004-04-28 基板処理装置および半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004133372A JP4282539B2 (ja) 2004-04-28 2004-04-28 基板処理装置および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2005317734A JP2005317734A (ja) 2005-11-10
JP2005317734A5 true JP2005317734A5 (enExample) 2007-06-14
JP4282539B2 JP4282539B2 (ja) 2009-06-24

Family

ID=35444844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004133372A Expired - Fee Related JP4282539B2 (ja) 2004-04-28 2004-04-28 基板処理装置および半導体装置の製造方法

Country Status (1)

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JP (1) JP4282539B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007018016A1 (ja) * 2005-08-05 2007-02-15 Hitachi Kokusai Electric Inc. 基板処理装置、冷却ガス供給ノズルおよび半導体装置の製造方法
KR100929815B1 (ko) 2007-12-27 2009-12-07 세메스 주식회사 냉각 장치 및 이를 이용한 기판 냉각 방법
JP5658463B2 (ja) 2009-02-27 2015-01-28 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
JP6270575B2 (ja) * 2014-03-24 2018-01-31 株式会社日立国際電気 反応管、基板処理装置及び半導体装置の製造方法
KR101949060B1 (ko) 2014-09-30 2019-05-20 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 반도체 장치의 제조 방법 및 반응관
JP7275470B2 (ja) * 2020-03-24 2023-05-18 日新イオン機器株式会社 基板冷却装置
CN113451183B (zh) * 2020-06-03 2023-03-31 重庆康佳光电技术研究院有限公司 一种晶圆盒

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