JP4244229B2 - 静電チャック - Google Patents

静電チャック Download PDF

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Publication number
JP4244229B2
JP4244229B2 JP2006031545A JP2006031545A JP4244229B2 JP 4244229 B2 JP4244229 B2 JP 4244229B2 JP 2006031545 A JP2006031545 A JP 2006031545A JP 2006031545 A JP2006031545 A JP 2006031545A JP 4244229 B2 JP4244229 B2 JP 4244229B2
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JP
Japan
Prior art keywords
electrostatic chuck
titanium oxide
dielectric
alumina
volume resistivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2006031545A
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English (en)
Japanese (ja)
Other versions
JP2007214287A (ja
JP2007214287A5 (https=
Inventor
正美 安藤
淳 宮地
修 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
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Filing date
Publication date
Priority to JP2006031545A priority Critical patent/JP4244229B2/ja
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to PCT/JP2007/052175 priority patent/WO2007091619A1/ja
Priority to TW096104666A priority patent/TWI342059B/zh
Priority to US12/086,967 priority patent/US7907383B2/en
Priority to CN2007800045852A priority patent/CN101379607B/zh
Priority to KR1020087018298A priority patent/KR100989230B1/ko
Publication of JP2007214287A publication Critical patent/JP2007214287A/ja
Publication of JP2007214287A5 publication Critical patent/JP2007214287A5/ja
Application granted granted Critical
Publication of JP4244229B2 publication Critical patent/JP4244229B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C04B35/111—Fine ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C04B35/6455—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
    • C04B2235/3234—Titanates, not containing zirconia
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6582—Hydrogen containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74—Physical characteristics
    • C04B2235/77—Density
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74—Physical characteristics
    • C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
    • C04B2235/786—Micrometer sized grains, i.e. from 1 to 100 micron
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
    • C04B2235/85—Intergranular or grain boundary phases
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/963—Surface properties, e.g. surface roughness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Jigs For Machine Tools (AREA)
JP2006031545A 2005-11-15 2006-02-08 静電チャック Expired - Lifetime JP4244229B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006031545A JP4244229B2 (ja) 2006-02-08 2006-02-08 静電チャック
TW096104666A TWI342059B (en) 2006-02-08 2007-02-08 Electrostatic chuck
US12/086,967 US7907383B2 (en) 2005-11-15 2007-02-08 Electrostatic chuck
CN2007800045852A CN101379607B (zh) 2006-02-08 2007-02-08 静电卡盘
PCT/JP2007/052175 WO2007091619A1 (ja) 2006-02-08 2007-02-08 静電チャック
KR1020087018298A KR100989230B1 (ko) 2006-02-08 2007-02-08 정전척

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006031545A JP4244229B2 (ja) 2006-02-08 2006-02-08 静電チャック

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008201771A Division JP4623159B2 (ja) 2008-08-05 2008-08-05 静電チャック

Publications (3)

Publication Number Publication Date
JP2007214287A JP2007214287A (ja) 2007-08-23
JP2007214287A5 JP2007214287A5 (https=) 2008-09-18
JP4244229B2 true JP4244229B2 (ja) 2009-03-25

Family

ID=38345213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006031545A Expired - Lifetime JP4244229B2 (ja) 2005-11-15 2006-02-08 静電チャック

Country Status (5)

Country Link
JP (1) JP4244229B2 (https=)
KR (1) KR100989230B1 (https=)
CN (1) CN101379607B (https=)
TW (1) TWI342059B (https=)
WO (1) WO2007091619A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009004752A (ja) * 2007-05-18 2009-01-08 Toto Ltd 静電チャック
JP4786693B2 (ja) 2008-09-30 2011-10-05 三菱重工業株式会社 ウェハ接合装置およびウェハ接合方法
JP5872998B2 (ja) 2012-04-26 2016-03-01 日本特殊陶業株式会社 アルミナ焼結体、それを備える部材、および半導体製造装置
KR102119867B1 (ko) * 2013-10-21 2020-06-09 주식회사 미코세라믹스 정전척
CN107663080B (zh) * 2016-07-27 2020-05-08 北京华卓精科科技股份有限公司 应用于j-r型静电卡盘的氧化铝陶瓷及其制备方法
JP2022142421A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 静電チャック装置およびその製造方法
JP2022142151A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 セラミック膜およびその製造方法、静電チャック装置およびその製造方法
JP7801359B2 (ja) * 2021-10-18 2026-01-16 日本特殊陶業株式会社 アルミナ質焼結体、および静電チャック
JP7777008B2 (ja) * 2022-03-03 2025-11-27 株式会社巴川コーポレーション 静電チャック装置
JP7850571B2 (ja) * 2022-03-03 2026-04-23 株式会社巴川コーポレーション 静電チャック装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03204924A (ja) * 1989-10-30 1991-09-06 Sumitomo Metal Ind Ltd 試料保持装置
JPH09330974A (ja) * 1996-06-12 1997-12-22 Hitachi Ltd 静電吸着電極
JP4201502B2 (ja) * 2000-10-11 2008-12-24 独立行政法人産業技術総合研究所 静電チャックおよびその製造方法
US6483690B1 (en) * 2001-06-28 2002-11-19 Lam Research Corporation Ceramic electrostatic chuck assembly and method of making
JP2004352572A (ja) * 2003-05-29 2004-12-16 Kyocera Corp アルミナセラミックス及びその製造方法
TWI274394B (en) * 2003-11-14 2007-02-21 Advanced Display Proc Eng Co Electrostatic chuck with support balls as contact plane, substrate support, clamp for substrate fixation, and electrode structure, and fabrication method thereof
JP4722463B2 (ja) * 2004-12-03 2011-07-13 黒崎播磨株式会社 静電チャック用誘電体セラミックス及びその製造方法

Also Published As

Publication number Publication date
KR20080089444A (ko) 2008-10-06
JP2007214287A (ja) 2007-08-23
TWI342059B (en) 2011-05-11
WO2007091619A1 (ja) 2007-08-16
KR100989230B1 (ko) 2010-10-20
CN101379607A (zh) 2009-03-04
TW200737398A (en) 2007-10-01
CN101379607B (zh) 2010-04-21

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