JP4243546B2 - 空間的光変調器(slm)の可動素子のアドレス指定方法 - Google Patents
空間的光変調器(slm)の可動素子のアドレス指定方法 Download PDFInfo
- Publication number
- JP4243546B2 JP4243546B2 JP2003577037A JP2003577037A JP4243546B2 JP 4243546 B2 JP4243546 B2 JP 4243546B2 JP 2003577037 A JP2003577037 A JP 2003577037A JP 2003577037 A JP2003577037 A JP 2003577037A JP 4243546 B2 JP4243546 B2 JP 4243546B2
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- force
- deflection
- movable element
- electrode
- electrostatic
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Micromachines (AREA)
- Liquid Crystal (AREA)
- Mechanical Optical Scanning Systems (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE0200787A SE0200787D0 (sv) | 2002-03-15 | 2002-03-15 | Improved addressing method |
| PCT/SE2003/000427 WO2003079090A1 (en) | 2002-03-15 | 2003-03-14 | IMPROVED ADDRESSING METHOD OF MOVABLE ELEMENTS IN A SPATIAL LIGHT MODULATOR (slm) |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005521078A JP2005521078A (ja) | 2005-07-14 |
| JP2005521078A5 JP2005521078A5 (enExample) | 2009-01-22 |
| JP4243546B2 true JP4243546B2 (ja) | 2009-03-25 |
Family
ID=20287276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003577037A Expired - Fee Related JP4243546B2 (ja) | 2002-03-15 | 2003-03-14 | 空間的光変調器(slm)の可動素子のアドレス指定方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US7075693B2 (enExample) |
| EP (1) | EP1485746B1 (enExample) |
| JP (1) | JP4243546B2 (enExample) |
| CN (1) | CN1324344C (enExample) |
| AT (1) | ATE403175T1 (enExample) |
| AU (1) | AU2003215999A1 (enExample) |
| DE (1) | DE60322517D1 (enExample) |
| SE (1) | SE0200787D0 (enExample) |
| WO (1) | WO2003079090A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE0100336L (sv) | 2001-02-05 | 2002-08-06 | Micronic Laser Systems Ab | Adresseringsmetod och apparat som använder densamma tekniskt område |
| US7410736B2 (en) | 2003-09-30 | 2008-08-12 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
| US6876440B1 (en) | 2003-09-30 | 2005-04-05 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| US7023526B2 (en) | 2003-09-30 | 2006-04-04 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation |
| US7839561B2 (en) * | 2007-02-26 | 2010-11-23 | Silicon Quest Kabushiki-Kaisha | Micromirror device with a single address electrode |
| US20090033878A1 (en) * | 2003-11-01 | 2009-02-05 | Akira Shirai | System configurations and methods for controlling image projection apparatuses and mirror device |
| US7336290B2 (en) | 2004-01-07 | 2008-02-26 | Texas Instruments Incorporated | Method and apparatus for increasing a perceived resolution of a display |
| JP4073886B2 (ja) * | 2004-03-30 | 2008-04-09 | アンリツ株式会社 | 可変波長光源 |
| US7072090B2 (en) * | 2004-04-22 | 2006-07-04 | Micronic Laser Systems Ab | Addressing of an SLM |
| US7499146B2 (en) * | 2005-03-14 | 2009-03-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping |
| US7372617B2 (en) * | 2005-07-06 | 2008-05-13 | Peter Enoksson | Hidden hinge MEMS device |
| JP2007033787A (ja) * | 2005-07-26 | 2007-02-08 | Fujifilm Corp | 微小薄膜可動素子および微小薄膜可動素子アレイ並びに微小薄膜可動素子アレイの駆動方法 |
| US7443568B2 (en) * | 2006-05-04 | 2008-10-28 | Miradia Inc. | Method and system for resonant operation of a reflective spatial light modulator |
| US7505195B2 (en) | 2006-05-04 | 2009-03-17 | Miradia Inc. | Reflective spatial light modulator with high stiffness torsion spring hinge |
| US20080231936A1 (en) * | 2007-03-02 | 2008-09-25 | Taro Endo | Display system comprising a mirror device with micromirrors controlled to operate in intermediate oscillating state |
| US7961161B2 (en) * | 2007-03-02 | 2011-06-14 | Silicon Quest Kabushiki-Kaisha | Display system comprising a mirror device with micromirrors controlled to operate in intermediate oscillating state |
| US9250536B2 (en) | 2007-03-30 | 2016-02-02 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US8937706B2 (en) * | 2007-03-30 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and method |
| JP5239594B2 (ja) * | 2008-07-30 | 2013-07-17 | 富士通株式会社 | クリップ検出装置及び方法 |
| US8861066B2 (en) | 2009-02-16 | 2014-10-14 | Micronic Ab | Oversized micro-mechanical light modulator with redundant elements, device and method |
| NL2006625A (en) * | 2010-05-26 | 2011-11-29 | Asml Netherlands Bv | Illumination system and lithographic apparatus. |
| DE102011081042B4 (de) * | 2011-08-16 | 2021-05-27 | Robert Bosch Gmbh | Steuervorrichtung für einen Mikrospiegel, Verfahren zum Ansteuern eines Mikrospiegels und Bildprojektionssystem |
| CN102354050B (zh) * | 2011-09-28 | 2013-01-02 | 哈尔滨工业大学 | 柔性辅助臂跟随超高角灵敏度高频响微角摆控制反射镜 |
| US20130286463A1 (en) * | 2011-10-24 | 2013-10-31 | Texas Instruments Incorporated | Dynamic actuation waveform for a digital micromirror device |
| FR2985320B1 (fr) * | 2011-12-29 | 2014-02-14 | Alpao | Systeme a etalonnage commun et procede correspondant |
| DE102015205404A1 (de) * | 2015-03-25 | 2016-09-29 | Carl Zeiss Smt Gmbh | Vielspiegel-Anordnung |
| CN109557661B (zh) * | 2018-10-15 | 2021-02-26 | 武汉光迅科技股份有限公司 | 驱动光学转镜转动的方法及用于驱动光学转镜转动的装置 |
| CN111552072B (zh) * | 2020-04-28 | 2022-07-12 | 安徽中科米微电子技术有限公司 | 大尺寸mems垂直梳齿微镜及其制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5032924A (en) * | 1989-04-10 | 1991-07-16 | Nilford Laboratories, Inc. | System for producing an image from a sequence of pixels |
| US5285196A (en) * | 1992-10-15 | 1994-02-08 | Texas Instruments Incorporated | Bistable DMD addressing method |
| US5526172A (en) * | 1993-07-27 | 1996-06-11 | Texas Instruments Incorporated | Microminiature, monolithic, variable electrical signal processor and apparatus including same |
| US5488862A (en) * | 1993-10-18 | 1996-02-06 | Armand P. Neukermans | Monolithic silicon rate-gyro with integrated sensors |
| US6044705A (en) * | 1993-10-18 | 2000-04-04 | Xros, Inc. | Micromachined members coupled for relative rotation by torsion bars |
| US5949570A (en) * | 1995-06-20 | 1999-09-07 | Matsushita Electric Industrial Co., Ltd. | Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator |
| US5771116A (en) | 1996-10-21 | 1998-06-23 | Texas Instruments Incorporated | Multiple bias level reset waveform for enhanced DMD control |
| US6323982B1 (en) * | 1998-05-22 | 2001-11-27 | Texas Instruments Incorporated | Yield superstructure for digital micromirror device |
| KR100311032B1 (ko) * | 1999-10-29 | 2001-11-02 | 윤종용 | 마이크로미러 가동장치 |
| JP2001228552A (ja) * | 2000-02-17 | 2001-08-24 | Fuji Photo Film Co Ltd | プリンタ |
| US6600591B2 (en) * | 2001-06-12 | 2003-07-29 | Network Photonics, Inc. | Micromirror array having adjustable mirror angles |
| US7190509B2 (en) * | 2001-11-07 | 2007-03-13 | Trex Enterprises Corp. | Optically addressed MEMS |
| US6757092B2 (en) * | 2001-12-10 | 2004-06-29 | Nayef M. Abu-Ageel | Micro-machine electrostatic actuator, method and system employing same, and fabrication methods thereof |
| KR100630029B1 (ko) * | 2002-11-06 | 2006-09-27 | 마츠시타 덴끼 산교 가부시키가이샤 | 변위 검출 기능을 구비한 마이크로 액츄에이터, 및 당해마이크로 액츄에이터를 구비한 가변형 미러 |
| US6956683B2 (en) * | 2003-06-11 | 2005-10-18 | Texas Instruments Incorporated | Pivoting platform having a piezoelectric drive |
| US20070132681A1 (en) * | 2005-12-09 | 2007-06-14 | Chih-Liang Chen | Passive micro-mirror-array spatial light modulation |
-
2002
- 2002-03-15 SE SE0200787A patent/SE0200787D0/xx unknown
-
2003
- 2003-03-14 WO PCT/SE2003/000427 patent/WO2003079090A1/en not_active Ceased
- 2003-03-14 AT AT03744576T patent/ATE403175T1/de not_active IP Right Cessation
- 2003-03-14 DE DE60322517T patent/DE60322517D1/de not_active Expired - Lifetime
- 2003-03-14 EP EP03744576A patent/EP1485746B1/en not_active Expired - Lifetime
- 2003-03-14 AU AU2003215999A patent/AU2003215999A1/en not_active Abandoned
- 2003-03-14 JP JP2003577037A patent/JP4243546B2/ja not_active Expired - Fee Related
- 2003-03-14 US US10/507,554 patent/US7075693B2/en not_active Expired - Fee Related
- 2003-03-14 CN CNB038061686A patent/CN1324344C/zh not_active Expired - Fee Related
-
2006
- 2006-04-14 US US11/404,340 patent/US20060187517A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| ATE403175T1 (de) | 2008-08-15 |
| WO2003079090A1 (en) | 2003-09-25 |
| US20050122558A1 (en) | 2005-06-09 |
| CN1324344C (zh) | 2007-07-04 |
| EP1485746B1 (en) | 2008-07-30 |
| SE0200787D0 (sv) | 2002-03-15 |
| AU2003215999A1 (en) | 2003-09-29 |
| DE60322517D1 (de) | 2008-09-11 |
| US20060187517A1 (en) | 2006-08-24 |
| US7075693B2 (en) | 2006-07-11 |
| EP1485746A1 (en) | 2004-12-15 |
| JP2005521078A (ja) | 2005-07-14 |
| CN1643432A (zh) | 2005-07-20 |
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