JP4240857B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4240857B2
JP4240857B2 JP2001267428A JP2001267428A JP4240857B2 JP 4240857 B2 JP4240857 B2 JP 4240857B2 JP 2001267428 A JP2001267428 A JP 2001267428A JP 2001267428 A JP2001267428 A JP 2001267428A JP 4240857 B2 JP4240857 B2 JP 4240857B2
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JP
Japan
Prior art keywords
group
general formula
alkyl group
carbon atoms
alicyclic hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001267428A
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English (en)
Japanese (ja)
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JP2003076022A (ja
JP2003076022A5 (https=
Inventor
一也 上西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JP2001267428A priority Critical patent/JP4240857B2/ja
Publication of JP2003076022A publication Critical patent/JP2003076022A/ja
Publication of JP2003076022A5 publication Critical patent/JP2003076022A5/ja
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Publication of JP4240857B2 publication Critical patent/JP4240857B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2001267428A 2001-09-04 2001-09-04 ポジ型レジスト組成物 Expired - Fee Related JP4240857B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001267428A JP4240857B2 (ja) 2001-09-04 2001-09-04 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001267428A JP4240857B2 (ja) 2001-09-04 2001-09-04 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003076022A JP2003076022A (ja) 2003-03-14
JP2003076022A5 JP2003076022A5 (https=) 2006-01-19
JP4240857B2 true JP4240857B2 (ja) 2009-03-18

Family

ID=19093561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001267428A Expired - Fee Related JP4240857B2 (ja) 2001-09-04 2001-09-04 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4240857B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4145075B2 (ja) * 2002-05-27 2008-09-03 富士フイルム株式会社 感放射線性樹脂組成物
JP4498690B2 (ja) * 2002-05-30 2010-07-07 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 新規樹脂およびそれを含有するフォトレジスト組成物
US8722306B2 (en) 2007-06-05 2014-05-13 Jsr Corporation Radiation-sensitive resin composition
JP6596306B2 (ja) * 2015-11-02 2019-10-23 株式会社カネカ ポジ型硬化性組成物、硬化物および薄膜トランジスタ

Also Published As

Publication number Publication date
JP2003076022A (ja) 2003-03-14

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