JP2003076022A5 - - Google Patents
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- Publication number
- JP2003076022A5 JP2003076022A5 JP2001267428A JP2001267428A JP2003076022A5 JP 2003076022 A5 JP2003076022 A5 JP 2003076022A5 JP 2001267428 A JP2001267428 A JP 2001267428A JP 2001267428 A JP2001267428 A JP 2001267428A JP 2003076022 A5 JP2003076022 A5 JP 2003076022A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alicyclic hydrocarbon
- general formula
- alkyl group
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 description 11
- 125000002723 alicyclic group Chemical group 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001267428A JP4240857B2 (ja) | 2001-09-04 | 2001-09-04 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001267428A JP4240857B2 (ja) | 2001-09-04 | 2001-09-04 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003076022A JP2003076022A (ja) | 2003-03-14 |
| JP2003076022A5 true JP2003076022A5 (https=) | 2006-01-19 |
| JP4240857B2 JP4240857B2 (ja) | 2009-03-18 |
Family
ID=19093561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001267428A Expired - Fee Related JP4240857B2 (ja) | 2001-09-04 | 2001-09-04 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4240857B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4145075B2 (ja) * | 2002-05-27 | 2008-09-03 | 富士フイルム株式会社 | 感放射線性樹脂組成物 |
| JP4498690B2 (ja) * | 2002-05-30 | 2010-07-07 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 新規樹脂およびそれを含有するフォトレジスト組成物 |
| US8722306B2 (en) | 2007-06-05 | 2014-05-13 | Jsr Corporation | Radiation-sensitive resin composition |
| JP6596306B2 (ja) * | 2015-11-02 | 2019-10-23 | 株式会社カネカ | ポジ型硬化性組成物、硬化物および薄膜トランジスタ |
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2001
- 2001-09-04 JP JP2001267428A patent/JP4240857B2/ja not_active Expired - Fee Related