JP4239170B2 - 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤 - Google Patents

高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤 Download PDF

Info

Publication number
JP4239170B2
JP4239170B2 JP2003510720A JP2003510720A JP4239170B2 JP 4239170 B2 JP4239170 B2 JP 4239170B2 JP 2003510720 A JP2003510720 A JP 2003510720A JP 2003510720 A JP2003510720 A JP 2003510720A JP 4239170 B2 JP4239170 B2 JP 4239170B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
formula
tert
butyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003510720A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004533529A (ja
JP2004533529A5 (cg-RX-API-DMAC10.html
Inventor
ラザーリ,ダリオ
レパード,デビット,ジョージ
サラ,マシーミリアノ
ビタリ,マヌエレ
ザグノニ,グラジアノ
フェリー,ジアンルカ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2004533529A publication Critical patent/JP2004533529A/ja
Publication of JP2004533529A5 publication Critical patent/JP2004533529A5/ja
Application granted granted Critical
Publication of JP4239170B2 publication Critical patent/JP4239170B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Cosmetics (AREA)
JP2003510720A 2001-07-02 2002-06-25 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤 Expired - Fee Related JP4239170B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP01810644 2001-07-02
EP01811163 2001-11-30
PCT/EP2002/007013 WO2003004557A1 (en) 2001-07-02 2002-06-25 Highly compatible hydroxyphenyltriazine uv-absorbers

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008239347A Division JP2009046496A (ja) 2001-07-02 2008-09-18 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤

Publications (3)

Publication Number Publication Date
JP2004533529A JP2004533529A (ja) 2004-11-04
JP2004533529A5 JP2004533529A5 (cg-RX-API-DMAC10.html) 2006-01-05
JP4239170B2 true JP4239170B2 (ja) 2009-03-18

Family

ID=26077399

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003510720A Expired - Fee Related JP4239170B2 (ja) 2001-07-02 2002-06-25 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤
JP2008239347A Pending JP2009046496A (ja) 2001-07-02 2008-09-18 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008239347A Pending JP2009046496A (ja) 2001-07-02 2008-09-18 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤

Country Status (8)

Country Link
US (3) US20040241111A1 (cg-RX-API-DMAC10.html)
EP (1) EP1401942A1 (cg-RX-API-DMAC10.html)
JP (2) JP4239170B2 (cg-RX-API-DMAC10.html)
CN (1) CN1231530C (cg-RX-API-DMAC10.html)
AU (1) AU2002321111B2 (cg-RX-API-DMAC10.html)
CA (1) CA2452561A1 (cg-RX-API-DMAC10.html)
TW (2) TWI316513B (cg-RX-API-DMAC10.html)
WO (1) WO2003004557A1 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009046496A (ja) * 2001-07-02 2009-03-05 Ciba Holding Inc 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1308084A1 (en) * 2002-10-02 2003-05-07 Ciba SC Holding AG Synergistic UV absorber combination
DE602004010802T2 (de) * 2003-05-26 2008-12-11 Ciba Holding Inc. Hochverträglicher und nicht migrierender polymerer uv-absorber
CN100482726C (zh) * 2003-05-26 2009-04-29 西巴特殊化学品控股有限公司 高度兼容的和非渗移性的聚合物紫外线吸收剂
US20060252857A1 (en) * 2003-05-27 2006-11-09 Schaefer Thomas Aminoaryl-1-3-5-triazines and their use as uv absorbers
JP4666957B2 (ja) * 2004-06-16 2011-04-06 株式会社Adeka 耐候性の改善されたポリエステル樹脂製容器
JP4744841B2 (ja) * 2004-10-22 2011-08-10 株式会社Adeka 農業用フィルム組成物
JP2007217667A (ja) * 2006-01-17 2007-08-30 Sekisui Chem Co Ltd 熱可塑性樹脂フィルム、位相差フィルム及び偏光子保護フィルム
TWI432537B (zh) * 2006-09-26 2014-04-01 Akzo Nobel Coatings Int Bv 顏料濃縮物
KR101608094B1 (ko) * 2007-12-21 2016-03-31 바스프 에스이 나노 구조 uv 흡수제
US9062143B2 (en) 2008-02-08 2015-06-23 Dow Global Technologies Llc Water-redispersible polymer powder
US20110256510A1 (en) * 2009-01-10 2011-10-20 David Henry Pashley Use of Quaternary Ammonium Compounds to Inhibit Endogenous MMPs in Tooth Dentin
EP2387600B1 (en) 2009-01-19 2014-04-02 Basf Se Organic black pigments and their preparation
EP2380927B1 (en) * 2010-04-20 2014-07-16 Dow Global Technologies LLC Redispersible polymer powders prepared from low carboxylation styrene butadiene-based latex
EP2694573B1 (en) * 2011-04-01 2020-05-27 3M Innovative Properties Company Films comprising triazine-based ultraviolet absorbers
US8366822B2 (en) 2011-06-20 2013-02-05 Dow Global Technologies Llc Cementitious tile adhesives and method of applying the same to a tile substrate
WO2013135349A1 (en) 2012-03-12 2013-09-19 Renolit Belgium N.V. Backsheet and photovoltaic modules comprising it
JP6238283B2 (ja) 2013-10-02 2017-11-29 株式会社Adeka 紫外線吸収性ポリカーボネート
CN105332275B (zh) * 2014-05-30 2019-07-12 东丽纤维研究所(中国)有限公司 一种对位芳纶纤维
WO2017212816A1 (ja) 2016-06-09 2017-12-14 株式会社Adeka 樹脂組成物
EP3812421A4 (en) * 2018-06-21 2021-09-15 Toppan Printing Co., Ltd. PROTECTIVE FILM AND FILM
JP7088499B2 (ja) 2019-02-01 2022-06-21 エルジー・ケム・リミテッド ポリアミド樹脂フィルムおよびそれを用いた樹脂積層体
KR20220075336A (ko) 2019-10-02 2022-06-08 바스프 에스이 중합체성 또는 올리고머성 히드록시 페닐 트리아진 uv 필터를 갖는 조성물
JP6863502B1 (ja) * 2020-04-09 2021-04-21 凸版印刷株式会社 化粧部材、及び化粧部材の製造方法
US20240247157A1 (en) * 2021-05-03 2024-07-25 Basf Se Triazine based ultravolet absorption polymer
CN114409960B (zh) * 2022-01-21 2023-05-09 深圳市那鸿科技有限公司 一种阻燃/抗氧协同助剂及其合成方法和在回收pet中的应用
CN115304753B (zh) * 2022-10-10 2023-03-10 广东乔艺塑胶有限公司 一种共聚聚酯化妆品包装材料、制备方法以及挤出机
CN120813575A (zh) * 2023-03-02 2025-10-17 信越化学工业株式会社 三嗪化合物及其制造方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130993C (cg-RX-API-DMAC10.html) * 1963-02-07
US4826978A (en) * 1987-12-29 1989-05-02 Milliken Research Corporation Reactive, non-yellowing triazine compounds useful as UV screening agents for polymers
ATE151097T1 (de) 1989-12-05 1997-04-15 Ciba Geigy Stabilisiertes organisches material
US5736597A (en) * 1989-12-05 1998-04-07 Ciba-Geigy Corporation Stabilized organic material
EP0442847B2 (de) * 1990-02-16 2000-08-23 Ciba SC Holding AG Gegen Schädigung durch Licht, Wärme und Sauerstoff stabilisierte Ueberzugsmittel
DE59107052D1 (de) * 1990-03-30 1996-01-25 Ciba Geigy Ag Lackzusammensetzungen
US5354794A (en) * 1993-02-03 1994-10-11 Ciba-Geigy Corporation Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers
AU703967B2 (en) * 1994-10-10 1999-04-01 Ciba Specialty Chemicals Holding Inc. Bisresorcinyltriazines
BR9607477A (pt) * 1995-03-15 1997-12-23 Ciba Geigy Ag Triazinas substituídas por befenila como estabilazantes de luz
EP0743309B1 (de) * 1995-05-18 2003-09-10 Ciba Specialty Chemicals Holding Inc. o-Hydroxyphenyl-s-triazine als UV-Stabilisatoren
CH692739A5 (de) * 1996-03-26 2002-10-15 Ciba Sc Holding Ag Polymerzusammensetzungen enthaltend 2-Hydroxyphenyl-1,3,5-triazine als UV-Absorber sowie neue 2-Hydroxyphenyl-1,3,5-triazine
US6013704A (en) * 1996-09-13 2000-01-11 Ciba Specialty Chemicals Corporation Hydroxyphenyltriazines
GB2319523B (en) * 1996-11-20 2000-11-08 Ciba Sc Holding Ag Hydroxyphenyltriazines
US6166148A (en) * 1996-12-18 2000-12-26 Basf Corporation Durability enhancing agents, method therefore and cured coating compositions containing the same
US5824465A (en) * 1997-04-07 1998-10-20 Agfa-Gevaert, N.V. Polyalkylene naphthalate film comprising specific UV-absorber
EP0870797B1 (en) * 1997-04-07 2003-01-29 Agfa-Gevaert Polyalkylene naphtalate film comprising specific UV-absorber
TW432055B (en) * 1997-05-16 2001-05-01 Ciba Sc Holding Ag Resorcinyl-triazines, their preparation process and a cosmetic composition containing them
EP0878469B1 (de) * 1997-05-16 2004-10-27 Ciba SC Holding AG Resorcinyl-Triazine
JP4070157B2 (ja) * 1997-08-29 2008-04-02 株式会社Adeka トリアジン系化合物および紫外線吸収剤
ZA9810605B (en) * 1997-11-21 1999-05-25 Cytec Techonoly Corp Trisaryl-1,3,5-triazine ultraviolet light absorbers
US6242597B1 (en) * 1997-11-21 2001-06-05 Ciba Specialty Chemicals Corporation Trisaryl-1,3,5-triazine ultraviolet light absorbers
EP0941989B1 (en) * 1998-03-02 2009-07-08 Ciba Holding Inc. Process for the preparation of 2,4-diaryl-6-o-hydroxyphenyl-1,3,5-triazine derivatives in the presence of a protic acid catalyst
JP2000026435A (ja) * 1998-05-07 2000-01-25 Ciba Specialty Chem Holding Inc トリスレゾリシニルトリアジン
US6191199B1 (en) * 1999-05-03 2001-02-20 Ciba Speciatly Chemicals Corporation Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom
CO5231248A1 (es) 2000-07-26 2002-12-27 Ciba Sc Holding Ag Articulos transparentes de polimero de baja consistencia
TWI316513B (en) * 2001-07-02 2009-11-01 Ciba Sc Holding Ag Highly compatible hydroxyphenyltriazine uv-absorbers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009046496A (ja) * 2001-07-02 2009-03-05 Ciba Holding Inc 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤

Also Published As

Publication number Publication date
JP2004533529A (ja) 2004-11-04
AU2002321111B2 (en) 2006-12-21
CN1522275A (zh) 2004-08-18
US20040241111A1 (en) 2004-12-02
US20070161726A1 (en) 2007-07-12
TW200942523A (en) 2009-10-16
CA2452561A1 (en) 2003-01-16
US7638626B2 (en) 2009-12-29
US20080032078A1 (en) 2008-02-07
TWI318208B (en) 2009-12-11
JP2009046496A (ja) 2009-03-05
US7294714B2 (en) 2007-11-13
CN1231530C (zh) 2005-12-14
TWI316513B (en) 2009-11-01
EP1401942A1 (en) 2004-03-31
WO2003004557A1 (en) 2003-01-16

Similar Documents

Publication Publication Date Title
JP2009046496A (ja) 高い相溶性のヒドロキシフェニルトリアジン紫外線吸収剤
ES2297438T3 (es) Absorbedor uv polimerico altamente compatible y no migratorio.
JP5489383B2 (ja) 薄い厚さの透明ポリマー製品
JP4461319B2 (ja) 温室中でのバイオマス生産を増進するための組成物及び方法
AU2002321111A1 (en) Highly compatible hydroxyphenyltriazine UV-absorbers
JP4314614B2 (ja) 薄肉フィルム用途の高分子量ヒドロキシフェニルベンゾトリアゾール紫外線吸収剤
JP2010535257A (ja) ポリマーおよびそれを含むポリマー物品用分解促進剤
CN100482726C (zh) 高度兼容的和非渗移性的聚合物紫外线吸收剂
GB2384486A (en) Bridged hydroxyphenyl triazine compounds

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050601

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050601

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080609

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080618

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080918

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20081112

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081211

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120109

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees