JP4237631B2 - 機能化主鎖高分子 - Google Patents
機能化主鎖高分子 Download PDFInfo
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- JP4237631B2 JP4237631B2 JP2003560104A JP2003560104A JP4237631B2 JP 4237631 B2 JP4237631 B2 JP 4237631B2 JP 2003560104 A JP2003560104 A JP 2003560104A JP 2003560104 A JP2003560104 A JP 2003560104A JP 4237631 B2 JP4237631 B2 JP 4237631B2
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- 239000005267 main chain polymer Substances 0.000 title description 2
- 229920000642 polymer Polymers 0.000 claims description 145
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- 125000000524 functional group Chemical group 0.000 claims description 32
- 239000002243 precursor Substances 0.000 claims description 31
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 30
- 239000002253 acid Substances 0.000 claims description 29
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- 239000001257 hydrogen Substances 0.000 claims description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims description 23
- 239000000446 fuel Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 22
- -1 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, 4,4′-biphenyl Chemical group 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 17
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical group [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 claims description 13
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
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- 239000000010 aprotic solvent Substances 0.000 claims description 4
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
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- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 7
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- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
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- OIQCMCUFGWKBBV-UHFFFAOYSA-N 2,3-diiodobutane Chemical compound CC(I)C(C)I OIQCMCUFGWKBBV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229920004459 Kel-F® PCTFE Polymers 0.000 description 2
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- 239000004693 Polybenzimidazole Substances 0.000 description 2
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- 230000029936 alkylation Effects 0.000 description 2
- 238000005804 alkylation reaction Methods 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical compound FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- QPOWUYJWCJRLEE-UHFFFAOYSA-N dipyridin-2-ylmethanone Chemical compound C=1C=CC=NC=1C(=O)C1=CC=CC=N1 QPOWUYJWCJRLEE-UHFFFAOYSA-N 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
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- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
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- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
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- BCTWNMTZAXVEJL-UHFFFAOYSA-N phosphane;tungsten;tetracontahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.P.[W].[W].[W].[W].[W].[W].[W].[W].[W].[W].[W].[W] BCTWNMTZAXVEJL-UHFFFAOYSA-N 0.000 description 2
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- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
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- 239000002244 precipitate Substances 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- QJZUKDFHGGYHMC-UHFFFAOYSA-N pyridine-3-carbaldehyde Chemical compound O=CC1=CC=CN=C1 QJZUKDFHGGYHMC-UHFFFAOYSA-N 0.000 description 1
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- 239000012047 saturated solution Substances 0.000 description 1
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- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
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Description
本発明に従う高分子が、本発明および応用に従い酸強度が増加したスルホン酸、ホスホン酸、および/または炭酸等のプロトン交換基を有する高分子であれば、共有結合性および/またはイオン結合性の架橋は必須ではない。
a)一般式(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)または(4R):
これらには中でも以下が含まれる。
−ドープした高分子膜は低い固有の体積抵抗を有し、好ましくは20℃で100Ωcmまたはそれ未満である。
−ドープした高分子膜は水素、酸素、ならびにメタノールに関して、非常に低い透過性を有する。
−本発明の高分子は全厚さが10〜100μmの間と極めて薄く、60℃〜82℃での十分によい物性を有し、特に機械的安定性に非常に優れ、水素、酸素およびメタノールに対する浸透性が低い。
−ドープした高分子膜は80℃以上、ある場合には100℃以上、時には110℃以上の燃料電池への用途に適する。
−特に標準圧力下で、ドープした高分子膜は82℃以上の燃料電池への用途に適する。
−ドープした高分子膜は、工業スケールで生産され得る。
適切な焼成温度範囲は、60℃からドープされる高分子の分解温度までである。フッ素化高分子およびポリベンズイミダゾールに対しては300℃以上となる。特に好ましい温度範囲は、100℃から300℃である。
ここでR6基は互いに独立して、同一または異なって、1,2−フェニレン、1,3−フェニレン、1,4−フェニレン、4,4'−ビフェニル、複素環式芳香族化合物の二価の基、C10芳香族化合物の二価の基、C14芳香族化合物の二価の基および/または二価のピレン基である。C10芳香族化合物の例としてはナフタリン;C14芳香族化合物の例は、フェナントレンである。芳香族化合物および/または複素環芳香族化合物の置換反応のパターンは任意で、フェニレンの場合、例えばR6はオルト−、メタ−、パラ−フェニレンである。
本発明における特に好ましい実施形態では、R1は、メチレン基(−CH2−)、および/または部分フッ化メチレン基(−CFH−)もしくは全フッ化メチレン基(−CF2−)である。前記で定義される構造に加え、さらに好ましい実施形態では、R1は結合である。
式中、R 2 は、互いに独立して結合または1〜40の炭素原子を含む分岐状もしくは直鎖状のアルキレン基またはシクロアルキレン基、またはアルキル化されていてもよいアリーレン基であり、R3、R4およびR5は互いに独立して水素、1〜40の炭素原子を含む分岐状もしくは直鎖状のアルキル基またはシクロアルキル基、またはアルキル化されていてもよいアリール基であり、R2、R3およびR4基の少なくとも二つは閉環して任意の芳香環を形成していてもよい。
1)官能基a)を有する少なくとも一つの前駆体高分子、
2)官能基b)を有する少なくとも一つの前駆体高分子、および
3)官能基d)を有する少なくとも一つの前駆体高分子
からなる高分子混合物が用いられる。
1)官能基a)およびb)を有する少なくとも一つの前駆体高分子、および
2)官能基d)を有する少なくとも一つの前駆体高分子
からなる高分子混合物が用いられる。
1)官能基a)およびd)を有する少なくとも一つの前駆体高分子、および
2)官能基b)を有する少なくとも一つの前駆体高分子
からなる高分子混合物が用いられる。
1)官能基a)を有する少なくとも一つの前駆体高分子、および
2)官能基b)およびd)を有する少なくとも一つの前駆体高分子
からなる高分子混合物の使用方法も、本発明の特に好ましい実施形態を構成する。
ここで、Subst.は導入されるべき置換基で;ケトンおよび/またはアルデヒドを有し、それらが対応するアルコキシドと反応する;および/またはカルボン酸エステルおよび/またはカルボニルハロゲン化物を有し、それらが対応するケトンと反応する。スルフィナート基の導入はリチュートされた高分子とSO3と反応させ、および酸化リチウム化高分子をSO2との反応によるスルフィナート基の導入により生じる。
a)前記高分子溶液を基板に、好ましくはガラス板、織布、または不織布に、薄膜状に塗布し、
b)好ましくは25℃より高められた温度で、および/または1,000mbar未満の減圧下で溶媒を蒸発させ、高分子膜を得るのであれば、もたらされ得る。
a)第一の段階で、高分子を酸で処理し、また
b)次の段階で、高分子を脱イオン水で処理する、ことによっても高められる。
ここで、第一の段階より先に、該高分子を水溶性アルカリで適切に処理する。
イオン交換容量、IECを測定するため、プロトン化イオノマー膜の一片を一定重量にまで乾燥させた。前記の膜1mgを約50mlの飽和NaCl溶液に添加した。その結果、H+イオンが該飽和溶液へ移動するとともに、スルホナート基にイオン交換があった。膜の入った該溶液を、約24時間、振り混ぜるか、または攪拌した。その後、該溶液にブロモチモールブルーの指示薬を2滴加え、0.1標準NaOH溶液で黄色から青へ色が変わるまで滴定した。IECは次のように算出した:
IEC[meq/g]=(NaOHのNaOH[ml]*ファクターのNaOH[meq/ml]*の消費量の規定度)/膜質量[g]
Q=(mswollen−mdry)/mdry
a−1)PSU Udel(登録商標)
PSU P1800(Amoco)
スルホナートポリエーテルケトンPEKのリチウム塩;
製造:
1.8meqSO3H/g高分子のイオン交換容量を有する100gのPEK−SO3Hを1000mlの10重量%強度の水溶性LiOH溶液で24時間、攪拌した。その後、Li−交換したPEK−SO3Liを濾過し、中性反応になるまで水で洗浄し、100℃で、48時間、乾燥した。生じた高分子は繰り返し単位(イオン化形状のイオン交換容量(IEC)=1.8meqSO3H/g)あたり0.4SO3Li単位を含んでいた。
スルフィナート化されたポリエーテルスルホンのリチウム塩
PSU Udel(登録商標)
は、US4,833,219またはJ.Kerres、W.Cui、S.Reichle;New sulfonated engineering polymers via the melation route.1.Sulfonated poly−(ethersulfone)PSU Udel(登録商標)via metalation−sulfination−oxidation"J.Polym.Sci:Part A:Polym.Chem.34、2421−2438(1996)に従って得られた。イオン化形状のIEC=1.95meqSO2Li/g
は、2,2 '−ジピリジルケトンとリチュートされたPSU Udelを反応させることで得られる(WO00/09588A1に従った);
繰り返し単位あたり一つの2,2'−ジピリジルケトンである。
PEK−SO3Li、PSU−P3−SO2Li、PSU−EBD−SO2Li、PSU−DPKおよび/またはPSUSO2Liを表2に表すようにNMP中に溶解し、濾過した。高分子溶液を真空中で脱気し、ついで1,4−ジヨードブタンと混ぜた。その後、それをガラス板上に注ぎ、ドクターブレードで引き延ばした。ガラス板を60℃の乾燥器で乾燥させ、そしてさらに一時間、90℃にし、最後に一晩中、真空下、120℃にした。板を室温まで冷却し、水浴に置いた。膜をガラス板から分離し、一日中、90℃の乾燥器中で10%HClに貯蔵した。その後60℃の脱イオン水中で、調節した。
高分子−(2J)
高分子−(2K)
こうして(4A)〜(4I)等の残基は、望ましい官能基を有する。隣接するスルホ基により、酸強度は顕著に上昇する。スルホン酸等のスルホ基とプロトン交換基の間には、少なくとも1つの炭素原子、好ましくはメチレン基−CH2−およびエチレン基−CH2−CH2−が存在する。プロトン交換基へ繋がる直線上の最大二つの炭素原子で、酸強度の増大は明確に確認され得る。本発明の高分子から製造された膜は、直接芳香族環に結合したプロトン交換基を有する高分子のものと比べ、より高いプロトン伝導性を示す。隣接した水素原子の1つがさらにフッ素で置換された場合、酸強度がさらに増大する。
スルフィナート化ポリスルホンPSU−SO2−Liは、下記a−3)で説明されるように調製される。イオン化形状のIECは1.95meqSO2Li/gである。NMPに溶解した後、臭素メタンスルホン酸塩のナトリウム塩の等量を添加する。加熱すると、NMPに溶解した化合物PSU−SO2−CH2−SO3−Na+が得られ、IECは1,95meqSO3Li/gである。
次の実施例では、臭素メタンスルホン酸塩の代わりに臭素エタンスルホン酸塩(ナトリウム塩)をPSU−SO2−Liと反応させた。反応終了後、溶媒の蒸発と再結晶の結果、純化合物PSU−SO2−CH2CH2−SO3−Na+を得た。この実施例において臭素エタンスルホン酸塩(ナトリウム塩)を等量ではなくその半分のみを添加した場合は、得られるPSU−SO2−CH2CH2−SO3−Na+のIECは0.9meqSO3Li/gであり、IEC1,0meqSO2Li/gは同分子に留まった。溶媒は、溶液の濃度が約10〜15重量%となるまで、約80℃の乾燥器で蒸発させた。次に、室温(25℃)まで冷却し、ジヨードブタンを等量添加した。ジヨードブタンの量は、自由なスルフィナート基の架橋に基づいて算出された。次に溶液をガラス板上で膜状にし、残余溶媒NMPを乾燥器中で蒸発させた。対照よりもプロトン交換基が極めて高い酸強度を有する共有結合性架橋膜が得られた。また、余分なスルフィナート基のスルホン酸基への酸化は、対照の場合と同様有効に行われた。PSU−SO2−CH2CH2−SO3Hを用いた膜のプロトン伝導性は、プロトン交換基としてPSU−SO3Hのみを有する対照より20%低かった。
R30は(4A)、(4B)、(4C)、(4F)、(4G)、(4H)および/または
であり、
式中窒素上のHはアリール基またはアルキル基で置換されていてもよい。R1はさらに、(4A)から(4R)までの官能基、および(5A)から(5H)までの基を含有してもよい。
式中Pは9〜16ページで説明される高分子である。R1は、前述の説明に従い、(4A)、(4B)、(4C)、(4D)、(4E)、(4F)、(4G)、(4H)、(4I)、(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)および/または(4R)の置換基として定義される。
R55は(4A)、(4B)、(4C)、(4D)、(4E)、(4F)、(4G)、(4H)、(4I)、(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)および/または(4R)の置換基のうちの一つである。
式中Pは9〜16ページで説明される高分子である。R1は、前述の説明に従い、(4A)、(4B)、(4C)、(4D)、(4E)、(4F)、(4G)、(4H)、(4I)、(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)および/または(4R)の置換基として定義される。
R55は(4A)、(4B)、(4C)、(4D)、(4E)、(4F)、(4G)、(4H)、(4I)、(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)および/または(4R)の置換基のうちの一つである。
Guiverによる方法等で、従来技術に従いブチルリチウムを用いて−60℃でポリスルホンのメタレーションを行う。そして、等量のヨウ化メチルを添加する。ポリスルホンを完全にメチル化するために、−10℃まで温度を上昇させる。メチル化されたポリスルホンを再び−60℃に冷却し、等量のブチルリチウムを加えてメタレーションを生じさせる。次に、最低一回メタレーションを行ったメチル基あたり一つのSO2Cl2分子の等量を添加し、THF中に溶解したヨウ素を注入する。調製法は特許出願DE3636854A1に詳細に説明されている。生成した高分子は、一般に知られるFinkelstein反応によりフッ化し、溶媒を除去する。次に、高分子を水、酸および/または塩基で加水分解させ、スルホン酸を解放する。
PSU−Li+CH3J−>PSU−CH3+LiJ
Claims (22)
- 下記一般式(1A)、(1B)、(1C)、(1D)、(1E)、(1F)、(1G)、(1H)、(1I)、(1J)、(1K)、(1L)、(1M)、(1N)、(1O)、(1P)、(1Q)、(1R)、(1S)および(1T):
下記a)及び/又はb)を満たす、非架橋高分子、共有結合性および/またはイオン結合性架橋高分子。
a)一般式(4J)、(4K)、(4L)、(4M)、(4N)、(4O)、(4P)、(4Q)または(4R):
b)一般式(5E)および/または(5F):
- 酸でドープされてなることを特徴とする、請求項1に記載の高分子。
- 25℃で、100Ωcm以下の固有の体積抵抗を有することを特徴とする、請求項1または2に記載の高分子。
- 90℃の脱イオン水中、100%未満、膨潤することを特徴とする、請求項1〜3のいずれか1項に記載の高分子。
- それぞれの場合において、高分子の全質量を基にして、0.5meq/g〜1.9meq/gのイオン交換容量を有することを特徴とする、請求項1〜4のいずれか1項に記載の高分子。
- 一つまたは複数の前駆体高分子が、個々にまたは全部で官能基a)、b)、およびd)を含み、a)およびb)は請求項1で定義したものであり、一般式(6)のスルフィナート基を意味するd)
- 1)官能基a)を有する少なくとも一つの前駆体高分子、
2)官能基b)を有する少なくとも一つの前駆体高分子、および
3)官能基d)を有する少なくとも一つの前駆体高分子
からなる高分子混合物を用いることを特徴とする、請求項6に記載の製造方法。 - 1)官能基a)およびb)を有する少なくとも一つの前駆体高分子、および
2)官能基d)を有する少なくとも一つの前駆体高分子
を用いることを特徴とする、請求項6に記載の製造方法。 - 1)官能基a)およびd)を有する少なくとも一つの前駆体高分子、および
2)官能基b)を有する少なくとも一つの前駆体高分子
を用いることを特徴とする、請求項6に記載の製造方法。 - 1)官能基a)を有する少なくとも一つの前駆体高分子、および
2)官能基b)およびd)を有する少なくとも一つの前駆体高分子
を用いることを特徴とする、請求項6に記載の製造方法。 - 一般式a)、b)、およびd)の官能基を有する少なくとも一つの高分子を用いることを特徴とする、請求項6に記載の製造方法。
- 前駆体高分子または高分子を、二極性非プロトン溶媒に溶解し、該溶液を攪拌しながら、ハロゲン化合物と反応させることを特徴とする、請求項6〜11のいずれか1項に記載の製造方法。
- 前記二極性非プロトン溶媒が、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、ジメチルスルホキシド、またはスルホランであることを特徴とする、請求項12に記載の製造方法。
- a)第一の段階で、前記高分子を酸で処理し、および
b)次の段階で、該高分子を脱イオン水で処理し、
第一の段階より先に、水溶性アルカリで該高分子を処理する
ことを特徴とする、請求項6〜13のいずれか1項に記載の製造方法。 - 前記高分子が酸でドープされてなることを特徴とする、請求項6〜14のいずれか1項に記載の製造方法。
- 前記高分子がリン酸でドープされてなることを特徴とする、請求項6〜15のいずれか1項に記載の製造方法。
- a)請求項6〜16のいずれか1項に記載の高分子の製造方法で得られた高分子溶液を基板に薄膜状に塗布し、
b)溶媒を蒸発させ、高分子膜を得る
ことを特徴とする、高分子膜の製造方法。 - 電気化学的電池における、請求項1〜5のいずれか1項に記載の高分子の使用。
- 二次電池、セル、および高分子電解質膜燃料電池における、請求項1〜5のいずれか1項に記載の高分子の使用。
- 水素燃料電池、および直接メタノール燃料電池における、請求項1〜5のいずれか1項に記載の高分子の使用。
- 膜分離作用における、請求項1〜5のいずれか1項に記載の高分子の使用。
- ガス分離、パーベーパレーション、パーストラクション、逆透析、ナノフィルトレーション、電気透析、および拡散透析における、請求項1〜5のいずれか1項に記載の高分子の使用。
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2016
- 2016-08-15 US US15/237,537 patent/US20170095809A1/en not_active Abandoned
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009035743A (ja) * | 2001-11-22 | 2009-02-19 | Haering Rima | 機能化主鎖高分子 |
JP2012162732A (ja) * | 2001-11-22 | 2012-08-30 | Haering Rima | 機能化主鎖高分子 |
Also Published As
Publication number | Publication date |
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AU2002363823A8 (en) | 2003-07-30 |
AU2002363823A1 (en) | 2003-07-30 |
JP5715085B2 (ja) | 2015-05-07 |
US20120004330A1 (en) | 2012-01-05 |
EP1481027A1 (de) | 2004-12-01 |
JP2012162732A (ja) | 2012-08-30 |
AU2002361930A1 (en) | 2003-07-30 |
JP2005530860A (ja) | 2005-10-13 |
US20170266652A1 (en) | 2017-09-21 |
WO2003060011A3 (de) | 2003-11-13 |
US20170095809A1 (en) | 2017-04-06 |
US10328425B2 (en) | 2019-06-25 |
JP2009035743A (ja) | 2009-02-19 |
US8710175B2 (en) | 2014-04-29 |
US20140155502A1 (en) | 2014-06-05 |
WO2003060011A2 (de) | 2003-07-24 |
DE10296279D2 (de) | 2004-12-23 |
DE10296292D2 (de) | 2004-12-23 |
WO2003060012A1 (de) | 2003-07-24 |
JP2015057496A (ja) | 2015-03-26 |
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