JP4207311B2 - サイドウォール除去液 - Google Patents
サイドウォール除去液 Download PDFInfo
- Publication number
- JP4207311B2 JP4207311B2 JP15003299A JP15003299A JP4207311B2 JP 4207311 B2 JP4207311 B2 JP 4207311B2 JP 15003299 A JP15003299 A JP 15003299A JP 15003299 A JP15003299 A JP 15003299A JP 4207311 B2 JP4207311 B2 JP 4207311B2
- Authority
- JP
- Japan
- Prior art keywords
- sidewall
- wiring material
- photoresist
- chemical reaction
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15003299A JP4207311B2 (ja) | 1999-05-28 | 1999-05-28 | サイドウォール除去液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15003299A JP4207311B2 (ja) | 1999-05-28 | 1999-05-28 | サイドウォール除去液 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000338686A JP2000338686A (ja) | 2000-12-08 |
| JP2000338686A5 JP2000338686A5 (enExample) | 2006-04-06 |
| JP4207311B2 true JP4207311B2 (ja) | 2009-01-14 |
Family
ID=15488020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15003299A Expired - Fee Related JP4207311B2 (ja) | 1999-05-28 | 1999-05-28 | サイドウォール除去液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4207311B2 (enExample) |
-
1999
- 1999-05-28 JP JP15003299A patent/JP4207311B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000338686A (ja) | 2000-12-08 |
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