JP4194302B2 - 現像装置及び現像処理方法 - Google Patents

現像装置及び現像処理方法 Download PDF

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Publication number
JP4194302B2
JP4194302B2 JP2002167565A JP2002167565A JP4194302B2 JP 4194302 B2 JP4194302 B2 JP 4194302B2 JP 2002167565 A JP2002167565 A JP 2002167565A JP 2002167565 A JP2002167565 A JP 2002167565A JP 4194302 B2 JP4194302 B2 JP 4194302B2
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JP
Japan
Prior art keywords
substrate
cleaning liquid
supply nozzle
liquid supply
developer
Prior art date
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Expired - Fee Related
Application number
JP2002167565A
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English (en)
Japanese (ja)
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JP2004014869A (ja
JP2004014869A5 (OSRAM
Inventor
修一 錦戸
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Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002167565A priority Critical patent/JP4194302B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to US10/515,635 priority patent/US7387455B2/en
Priority to KR1020047009165A priority patent/KR100935286B1/ko
Priority to KR1020097018280A priority patent/KR100959740B1/ko
Priority to AU2003234811A priority patent/AU2003234811A1/en
Priority to PCT/JP2003/006149 priority patent/WO2003105201A1/ja
Priority to TW092114445A priority patent/TWI253098B/zh
Publication of JP2004014869A publication Critical patent/JP2004014869A/ja
Publication of JP2004014869A5 publication Critical patent/JP2004014869A5/ja
Application granted granted Critical
Publication of JP4194302B2 publication Critical patent/JP4194302B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2002167565A 2002-06-07 2002-06-07 現像装置及び現像処理方法 Expired - Fee Related JP4194302B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002167565A JP4194302B2 (ja) 2002-06-07 2002-06-07 現像装置及び現像処理方法
KR1020047009165A KR100935286B1 (ko) 2002-06-07 2003-05-16 기판처리장치 및 현상장치
KR1020097018280A KR100959740B1 (ko) 2002-06-07 2003-05-16 기판처리장치
AU2003234811A AU2003234811A1 (en) 2002-06-07 2003-05-16 Substrate processing device, substrate processing method, and developing device
US10/515,635 US7387455B2 (en) 2002-06-07 2003-05-16 Substrate processing device, substrate processing method, and developing device
PCT/JP2003/006149 WO2003105201A1 (ja) 2002-06-07 2003-05-16 基板処理装置、基板処理方法及び現像装置
TW092114445A TWI253098B (en) 2002-06-07 2003-05-28 Substrate processing apparatus, substrate processing method and developing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002167565A JP4194302B2 (ja) 2002-06-07 2002-06-07 現像装置及び現像処理方法

Publications (3)

Publication Number Publication Date
JP2004014869A JP2004014869A (ja) 2004-01-15
JP2004014869A5 JP2004014869A5 (OSRAM) 2005-05-26
JP4194302B2 true JP4194302B2 (ja) 2008-12-10

Family

ID=30434773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002167565A Expired - Fee Related JP4194302B2 (ja) 2002-06-07 2002-06-07 現像装置及び現像処理方法

Country Status (1)

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JP (1) JP4194302B2 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4410076B2 (ja) 2004-10-07 2010-02-03 東京エレクトロン株式会社 現像処理装置
JP4641964B2 (ja) 2006-03-30 2011-03-02 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP4937772B2 (ja) * 2007-01-22 2012-05-23 東京エレクトロン株式会社 基板の処理方法
US20130108967A1 (en) * 2010-07-09 2013-05-02 Sumitomo Bakelite Co., Ltd. Method for forming cured film

Also Published As

Publication number Publication date
JP2004014869A (ja) 2004-01-15

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