JP4167248B2 - シャドウマスクの付着方法 - Google Patents
シャドウマスクの付着方法 Download PDFInfo
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- JP4167248B2 JP4167248B2 JP2005199319A JP2005199319A JP4167248B2 JP 4167248 B2 JP4167248 B2 JP 4167248B2 JP 2005199319 A JP2005199319 A JP 2005199319A JP 2005199319 A JP2005199319 A JP 2005199319A JP 4167248 B2 JP4167248 B2 JP 4167248B2
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- 238000000151 deposition Methods 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 21
- 238000003466 welding Methods 0.000 claims description 18
- 238000005304 joining Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 12
- 230000005540 biological transmission Effects 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Description
このような真空蒸着法は、蒸着が行われる基板上に特定のパターンを有するシャドウマスクを利用し、前記シャドウマスクによって遮蔽された部分以外のみに蒸着行われるようにしたものである。
図1に示されたように、シャドウマスク10は、遮断領域11と、基板(図示せず)の蒸着領域に対応される透過領域12のパターンを形成して構成される。
図2は、一般的なシャドウマスクを利用して金属配線が形成された表示素子基板に蒸着物質を蒸着する過程が示された図である。
11 遮断領域
12 透過領域
20 マスクフレーム
30 基板
50 磁石
70 引き張りシステム
72 固定部材
90 溶接機
L/W レーザワータジェット
W 溶接部
Claims (7)
- マスクフレームを鉛直配置する段階と、
シャドウマスクを前記マスクフレーム上に付着する段階と、からなることを特徴とするシャドウマスクの付着方法。 - 前記シャドウマスクを前記マスクレーム上に付着する段階は、
前記シャドウマスクを前記マスクフレーム上に隣接させる段階と、
前記シャドウマスクに外力を加える段階と、
前記マスクフレーム上に外力が加えられた前記シャドウマスクを接合させる段階と、
からなることを特徴とする請求項1に記載のシャドウマスクの付着方法。 - 前記シャドウマスクに加えられた外力は、前端引張力によって行われることを特徴とする請求項2に記載のシャドウマスクの付着方法。
- 前記シャドウマスクを前記マスクフレーム上に付着する接合は、溶接によって行われることを特徴とする請求項2に記載のシャドウマスクの付着方法。
- 前記溶接は、複数の点溶接によって行われることを特徴とする請求項4に記載のシャドウマスクの付着方法。
- 前記マスクフレームを鉛直配置する段階は、前記シャドウマスクにパターンを形成する前段階をさらに含んでなることを特徴とする請求項1に記載のシャドウマスクの付着方法。
- 前記シャドウマスクを前記マスクフレーム上に付着する段階は、前記シャドウマスクにパターンを形成する後段階をさらに含んでなることを特徴とする請求項1に記載のシャドウマスクの付着方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050000961A KR100700840B1 (ko) | 2005-01-05 | 2005-01-05 | 섀도우마스크 부착방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006188746A JP2006188746A (ja) | 2006-07-20 |
JP4167248B2 true JP4167248B2 (ja) | 2008-10-15 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2005199319A Active JP4167248B2 (ja) | 2005-01-05 | 2005-07-07 | シャドウマスクの付着方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4167248B2 (ja) |
KR (1) | KR100700840B1 (ja) |
CN (1) | CN1800431A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110133075A (ko) * | 2010-06-04 | 2011-12-12 | 주성엔지니어링(주) | 마스크 장치와 이를 이용한 박막 패턴의 제조 장치 및 제조 방법 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100922045B1 (ko) * | 2007-11-20 | 2009-10-19 | 삼성모바일디스플레이주식회사 | 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법 |
KR100947442B1 (ko) * | 2007-11-20 | 2010-03-12 | 삼성모바일디스플레이주식회사 | 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법 |
KR100922046B1 (ko) * | 2007-11-20 | 2009-10-19 | 삼성모바일디스플레이주식회사 | 수직 증착형 마스크 제조장치 |
TWI401832B (zh) * | 2008-12-15 | 2013-07-11 | Hitachi High Tech Corp | Organic electroluminescent light making device, film forming apparatus and film forming method, liquid crystal display substrate manufacturing apparatus, and calibration apparatus and calibration method |
KR101107159B1 (ko) | 2009-12-17 | 2012-01-25 | 삼성모바일디스플레이주식회사 | 평판 표시장치의 박막 증착용 마스크 조립체 |
CN103695841A (zh) * | 2013-11-28 | 2014-04-02 | 昆山允升吉光电科技有限公司 | 一种掩模组件的组装方法 |
CN106148892B (zh) * | 2016-07-25 | 2019-04-02 | 京东方科技集团股份有限公司 | 一种子掩膜版的张网方法及掩膜版、基板、显示装置 |
CN107641786B (zh) * | 2017-09-27 | 2020-04-14 | 京东方科技集团股份有限公司 | 掩模板及掩模板制作方法 |
KR20200040474A (ko) * | 2018-10-10 | 2020-04-20 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
CN110172673B (zh) * | 2019-07-03 | 2021-01-26 | 京东方科技集团股份有限公司 | 蒸镀基板及蒸镀设备 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW490714B (en) | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
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2005
- 2005-01-05 KR KR1020050000961A patent/KR100700840B1/ko active IP Right Grant
- 2005-07-07 JP JP2005199319A patent/JP4167248B2/ja active Active
- 2005-08-29 CN CNA2005100923402A patent/CN1800431A/zh active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110133075A (ko) * | 2010-06-04 | 2011-12-12 | 주성엔지니어링(주) | 마스크 장치와 이를 이용한 박막 패턴의 제조 장치 및 제조 방법 |
KR101676367B1 (ko) | 2010-06-04 | 2016-11-15 | 주성엔지니어링(주) | 마스크 장치와 이를 이용한 박막 패턴의 제조 장치 및 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN1800431A (zh) | 2006-07-12 |
KR100700840B1 (ko) | 2007-03-27 |
JP2006188746A (ja) | 2006-07-20 |
KR20060080479A (ko) | 2006-07-10 |
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