JP4166476B2 - スロットをつけた基板の形成技術 - Google Patents

スロットをつけた基板の形成技術 Download PDF

Info

Publication number
JP4166476B2
JP4166476B2 JP2002011197A JP2002011197A JP4166476B2 JP 4166476 B2 JP4166476 B2 JP 4166476B2 JP 2002011197 A JP2002011197 A JP 2002011197A JP 2002011197 A JP2002011197 A JP 2002011197A JP 4166476 B2 JP4166476 B2 JP 4166476B2
Authority
JP
Japan
Prior art keywords
layer
substrate
thin film
slot
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002011197A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002248777A (ja
JP2002248777A5 (enExample
Inventor
ロバート・エイ・プグリース・ジュニア
マーク・エイチ・マッケンジー
トーマス・イー・ペティット
ビクトリオ・エイ・チャヴァリア
スティーブン・ピー・ストーム
アレン・エイチ・スミス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of JP2002248777A publication Critical patent/JP2002248777A/ja
Publication of JP2002248777A5 publication Critical patent/JP2002248777A5/ja
Application granted granted Critical
Publication of JP4166476B2 publication Critical patent/JP4166476B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1632—Manufacturing processes machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2002011197A 2001-01-30 2002-01-21 スロットをつけた基板の形成技術 Expired - Fee Related JP4166476B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/772752 2001-01-30
US09/772,752 US6648732B2 (en) 2001-01-30 2001-01-30 Thin film coating of a slotted substrate and techniques for forming slotted substrates

Publications (3)

Publication Number Publication Date
JP2002248777A JP2002248777A (ja) 2002-09-03
JP2002248777A5 JP2002248777A5 (enExample) 2005-04-07
JP4166476B2 true JP4166476B2 (ja) 2008-10-15

Family

ID=25096103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002011197A Expired - Fee Related JP4166476B2 (ja) 2001-01-30 2002-01-21 スロットをつけた基板の形成技術

Country Status (4)

Country Link
US (2) US6648732B2 (enExample)
EP (2) EP2000309A3 (enExample)
JP (1) JP4166476B2 (enExample)
DE (1) DE60229316D1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100335311B1 (ko) * 1994-09-13 2002-11-14 주식회사 디피아이 내가스체킹성아크릴수지조성물을포함하는도료조성물
US6648732B2 (en) * 2001-01-30 2003-11-18 Hewlett-Packard Development Company, L.P. Thin film coating of a slotted substrate and techniques for forming slotted substrates
JP2004130579A (ja) * 2002-10-09 2004-04-30 Sony Corp 液体吐出ヘッド、液体吐出装置及び液体吐出ヘッドの製造方法
JP2004230770A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd インクジェットヘッド
US7594328B2 (en) * 2003-10-03 2009-09-29 Hewlett-Packard Development Company, L.P. Method of forming a slotted substrate with partially patterned layers
US7784916B2 (en) * 2006-09-28 2010-08-31 Lexmark International, Inc. Micro-fluid ejection heads with multiple glass layers
CN102802958B (zh) * 2009-06-29 2015-11-25 录象射流技术公司 具有耐溶剂性的热喷墨印刷头
US8382253B1 (en) 2011-08-25 2013-02-26 Hewlett-Packard Development Company, L.P. Fluid ejection device and methods of fabrication
US8727499B2 (en) 2011-12-21 2014-05-20 Hewlett-Packard Development Company, L.P. Protecting a fluid ejection device resistor
US9016836B2 (en) 2013-05-14 2015-04-28 Stmicroelectronics, Inc. Ink jet printhead with polarity-changing driver for thermal resistors
US9016837B2 (en) 2013-05-14 2015-04-28 Stmicroelectronics, Inc. Ink jet printhead device with compressive stressed dielectric layer

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2989046A (en) * 1958-06-05 1961-06-20 Paramount Pictures Corp Method for drilling finished holes in glass
DE2604939C3 (de) 1976-02-09 1978-07-27 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen von wenigstens einem Durchgangsloch insbesondere einer Düse für Tintenstrahldrucker
US4239954A (en) * 1978-12-11 1980-12-16 United Technologies Corporation Backer for electron beam hole drilling
US4894664A (en) 1986-04-28 1990-01-16 Hewlett-Packard Company Monolithic thermal ink jet printhead with integral nozzle and ink feed
US4862197A (en) 1986-08-28 1989-08-29 Hewlett-Packard Co. Process for manufacturing thermal ink jet printhead and integrated circuit (IC) structures produced thereby
IT1234800B (it) * 1989-06-08 1992-05-27 C Olivetti & C Spa Sede Via Je Procedimento di fabbricazione di testine termiche di stampa a getto d'inchiostro e testine cosi' ottenute
GB2241186A (en) 1990-02-24 1991-08-28 Rolls Royce Plc Anti-sputtercoating
US5105588A (en) * 1990-09-10 1992-04-21 Hewlett-Packard Company Method and apparatus for simultaneously forming a plurality of openings through a substrate
US5703631A (en) 1992-05-05 1997-12-30 Compaq Computer Corporation Method of forming an orifice array for a high density ink jet printhead
JP3196796B2 (ja) 1992-06-24 2001-08-06 セイコーエプソン株式会社 インクジェット記録ヘッドのノズル形成方法
US5308442A (en) 1993-01-25 1994-05-03 Hewlett-Packard Company Anisotropically etched ink fill slots in silicon
BE1007894A3 (nl) * 1993-12-20 1995-11-14 Philips Electronics Nv Werkwijze voor het vervaardigen van een plaat van niet-metallisch materiaal met een patroon van gaten en/of holten.
JPH08267753A (ja) * 1995-03-29 1996-10-15 Brother Ind Ltd ノズルの製造方法
US5658471A (en) 1995-09-22 1997-08-19 Lexmark International, Inc. Fabrication of thermal ink-jet feed slots in a silicon substrate
JP3984689B2 (ja) 1996-11-11 2007-10-03 キヤノン株式会社 インクジェットヘッドの製造方法
US6238269B1 (en) * 2000-01-26 2001-05-29 Hewlett-Packard Company Ink feed slot formation in ink-jet printheads
FR2811588B1 (fr) * 2000-07-13 2002-10-11 Centre Nat Rech Scient Tete d'injection et de dosage thermique, son procede de fabrication et systeme de fonctionnalisation ou d'adressage la comprenant
US6648732B2 (en) * 2001-01-30 2003-11-18 Hewlett-Packard Development Company, L.P. Thin film coating of a slotted substrate and techniques for forming slotted substrates

Also Published As

Publication number Publication date
EP2000309A3 (en) 2009-12-16
EP1226947A1 (en) 2002-07-31
US6945634B2 (en) 2005-09-20
JP2002248777A (ja) 2002-09-03
US20040067319A1 (en) 2004-04-08
DE60229316D1 (de) 2008-11-27
EP2000309A2 (en) 2008-12-10
US6648732B2 (en) 2003-11-18
US20020102918A1 (en) 2002-08-01
EP1226947B1 (en) 2008-10-15

Similar Documents

Publication Publication Date Title
CN1997519B (zh) 具有高阻加热膜的微流体喷射装置
US20100321447A1 (en) Protective layers for micro-fluid ejection devices and methods for depositing same
JP4166476B2 (ja) スロットをつけた基板の形成技術
US6786575B2 (en) Ink jet heater chip and method therefor
US6513913B2 (en) Heating element of a printhead having conductive layer between resistive layers
JP3408292B2 (ja) プリントヘッド
US6929349B2 (en) Thin film ink jet printhead adhesion enhancement
CN101346235B (zh) 微流喷头及延长其热喷射致动器使用寿命的方法
US7198358B2 (en) Heating element, fluid heating device, inkjet printhead, and print cartridge having the same and method of making the same
CN101607472A (zh) 喷墨打印头的加热器及该加热器的制造方法
EP1270233B1 (en) Slotted substrate and slotting process
US20030098900A1 (en) Ink-jet head, and method for manufacturing the same
KR100553912B1 (ko) 잉크젯 프린트헤드 및 그 제조방법
US7594328B2 (en) Method of forming a slotted substrate with partially patterned layers
JPH07125210A (ja) サーマルインクジェットヘッド
WO2009005489A1 (en) Protective layers for micro-fluid ejection devices
JP2007276150A (ja) インクジェット記録ヘッドおよびインクジェット記録ヘッドの製造方法
JPH10181019A (ja) 液体噴射記録ヘッド
JP2003226021A (ja) インクジェットヘッドおよびインクジェットヘッドの製造方法
JPH06320730A (ja) サーマルインクジェットヘッド
JPH05293966A (ja) サーマルインクジェットヘッドチップの製造方法
JPH05330047A (ja) インクジェット記録ヘッド用基板、インクジェット記録ヘッドおよびインクジェット記録装置
HK1105181B (en) Micro-fluid ejection device having high resistance heater film

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040527

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040527

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070824

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070911

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20071210

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20071213

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080109

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080205

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080604

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20080612

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080701

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080730

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110808

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees