JP4165844B2 - 除振装置 - Google Patents

除振装置 Download PDF

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Publication number
JP4165844B2
JP4165844B2 JP34363898A JP34363898A JP4165844B2 JP 4165844 B2 JP4165844 B2 JP 4165844B2 JP 34363898 A JP34363898 A JP 34363898A JP 34363898 A JP34363898 A JP 34363898A JP 4165844 B2 JP4165844 B2 JP 4165844B2
Authority
JP
Japan
Prior art keywords
pressure
displacement
air spring
compensator
vibration isolation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP34363898A
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English (en)
Japanese (ja)
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JP2000154843A5 (enExample
JP2000154843A (ja
Inventor
宏昭 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP34363898A priority Critical patent/JP4165844B2/ja
Publication of JP2000154843A publication Critical patent/JP2000154843A/ja
Publication of JP2000154843A5 publication Critical patent/JP2000154843A5/ja
Application granted granted Critical
Publication of JP4165844B2 publication Critical patent/JP4165844B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Fluid-Damping Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP34363898A 1998-11-18 1998-11-18 除振装置 Expired - Fee Related JP4165844B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34363898A JP4165844B2 (ja) 1998-11-18 1998-11-18 除振装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34363898A JP4165844B2 (ja) 1998-11-18 1998-11-18 除振装置

Publications (3)

Publication Number Publication Date
JP2000154843A JP2000154843A (ja) 2000-06-06
JP2000154843A5 JP2000154843A5 (enExample) 2008-04-10
JP4165844B2 true JP4165844B2 (ja) 2008-10-15

Family

ID=18363083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34363898A Expired - Fee Related JP4165844B2 (ja) 1998-11-18 1998-11-18 除振装置

Country Status (1)

Country Link
JP (1) JP4165844B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731372B2 (en) * 2001-03-27 2004-05-04 Nikon Corporation Multiple chamber fluid mount
JP2003202051A (ja) * 2002-01-04 2003-07-18 Canon Inc 除振装置
WO2005085671A1 (ja) * 2004-03-08 2005-09-15 Nikon Corporation 防振装置、露光装置、及び防振方法
JP2006250291A (ja) * 2005-03-11 2006-09-21 Tokyo Univ Of Agriculture & Technology 防振装置
JP5002759B2 (ja) * 2005-10-13 2012-08-15 国立大学法人東京工業大学 除振装置および除振方法
JP4113960B2 (ja) * 2006-04-28 2008-07-09 国立大学法人東京工業大学 気体バネ式除振装置及び該装置の制御方法
DE102009009562A1 (de) * 2009-02-19 2010-09-09 Integrated Dynamics Engineering Gmbh Kombinierter Bewegungssensor zum Einsatz in Feedback-Regelsystemen zur Schwingungsisolation
CN101818777B (zh) * 2010-05-07 2011-08-10 华中科技大学 一种自适应变阻尼超精密减振器
JP6278676B2 (ja) * 2013-11-29 2018-02-14 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
CN108425378A (zh) * 2018-04-08 2018-08-21 北京航天希尔测试技术有限公司 一种大型气浮减振地基
CN112197927A (zh) * 2020-10-10 2021-01-08 北京航宇振控科技有限责任公司 一种应用于振动模拟装置的自动气浮支撑系统

Also Published As

Publication number Publication date
JP2000154843A (ja) 2000-06-06

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